초록 ▼

A method and an apparatus for rinsing materials or articles to remove deposits attached onto the surfaces of those materials or articles and humidity from the them by vapor of rinsing solvent which is evaporated by heating and filled in a rinsing chamber. In the method or the apparatus when it is de

A method and an apparatus for rinsing materials or articles to remove deposits attached onto the surfaces of those materials or articles and humidity from the them by vapor of rinsing solvent which is evaporated by heating and filled in a rinsing chamber. In the method or the apparatus when it is detected that the vapor having been cooled to a temperature lower than that of the predetermined reference level, occurence or generation of failure in rinsing operation can be grasped.

대표청구항 ▼

A method of vapor-rinsing semiconductor wafers comprising the steps of: superheating and evaporating a rinsing solvent located in a rinsing chamber so as to fill an inside of said rinsing chamber with a steam of said rinsing solvent, said steam rinsing from a bottom of said chamber toward a top of s

A method of vapor-rinsing semiconductor wafers comprising the steps of: superheating and evaporating a rinsing solvent located in a rinsing chamber so as to fill an inside of said rinsing chamber with a steam of said rinsing solvent, said steam rinsing from a bottom of said chamber toward a top of said chamber; disposing said wafers at a first level inside said rinsing chamber above said rinsing solvent between said bottom and said top of said chamber, said rinsing chamber constantly being filled with said steam at said first level; forming condensates of said rinsing solvent on surfaces of said wafers thereby rinsing said wafers; measuring the vapor temperature at said first level inside said rinsing chamber; measuring the vapor temperature at a second level inside said rinsing chamber near said top of said chamber, said vapor temperature at said second level temporarily dropping below a reference value after said wafers are initially disposed inside said chamber at said first level indicating said steam has dropped below said second level within said chamber; detecting when said vapor temperature at said second level recovers to said reference value which signifies completion of rinsing of said articles; and removing said wafers from said chamber.