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Titanium nitride and zirconium nitride coating compositions, coated articles and methods of manufacture

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B32B-015/18
  • C23C-015/00
출원번호 US-0905510 (1986-09-10)
발명자 / 주소
  • Sue Jiinjen A. (Indianapolis IN) Troue Harden H. (Plainfield IN)
출원인 / 주소
  • Union Carbide Corporation (Danbury CT 02)
인용정보 피인용 횟수 : 21  인용 특허 : 14

초록

The present invention is directed to polycrystalline titanium nitride and zirconium nitride coating compositions and coated articles with a I(111)/I(200) x-ray diffraction intensity ratio of at least about 75 for the titanium nitride composition and at least about 15 for the zirconium nitride compos

대표청구항

A polycrystalline zirconium nitride coating composition having a highly oriented crystallographic structure consisting of an I(111)/I(200) x-ray diffraction intensity ratio of at least about 15. A polycrystalline titanium nitride coating composition having a highly oriented crystallographic structur

이 특허에 인용된 특허 (14)

  1. King Robert D. (Solihull GB2) Hiscutt Robert (Birmingham GB2), Apparatus for producing metal oxide films.
  2. Bergman Clark (Roseville MN) Vergason Gary E. (Minneapolis MN) Clark Robert (Vadnais Heights MN) Bosak Shannon (Minneapolis MN), Arc-initiating trigger apparatus and method for electric arc vapor deposition coating systems.
  3. Nakae Hiroyuki (14-7 ; Kamiasao 1 chome Asao-ku ; Kawasaki-shi ; Kanagawa JPX) Matsuda Toshitsugu (67-4 ; Futamatagawa 1 chome Asahi-ku ; Yokohama-shi ; Kanagawa JPX) Uno Naoki (Furukawa Denko Kiboga, Boron nitride containing titanium nitride, method of producing the same and composite ceramics produced therefrom.
  4. Kobayashi Mitsunori (Itami JPX) Doi Yoshihiko (Itami JPX) Tobioka Masaaki (Itami JPX) Yamamoto Takaharu (Itami JPX), Coated tool steel and machining tool formed therefrom.
  5. Ramalingam Subbiah (Roseville MN) Qi Cai B. (Beijing MN CNX) Kim Kyunghoon (St. Paul MN), Controlled vacuum arc material deposition, method and apparatus.
  6. Aisenberg Sol (Natick MA), Film deposition.
  7. Kobayashi Mitsunori (Itami JPX) Doi Yoshihiko (Itami JPX), Highly hard material coated articles.
  8. Cuomo Jerome J. (Lincolndale NY) Dibble Eric P. (Endicott NY) Levine Solomon L. (Vestal NY), Low contact electrical resistant composition, substrates coated therewith, and process for preparing such.
  9. Andreev Anatoly A. (ulitsa Danilevskogo ; 31 ; kv. 47 Kharkov SUX) Romanov Anatoly A. (ulitsa Valtera ; 7 ; kv. 135 Kharkov SUX), Method and apparatus for controlling plasma generation in vapor deposition.
  10. Moll Eberhard (Balzers LIX) Daxinger Helmut (Wangs CHX), Method and apparatus for evaporating materials in a vacuum coating plant.
  11. Vukanovic Vladimir (Rochester NY) Butler Susannah M. (Rochester NY) Fazekas George (Rochester NY) Miller John R. (Rochester NY), Method for the deposition of coatings upon substrates utilizing a high pressure, non-local thermal equilibrium arc plasm.
  12. Kieferle Wolfgang (Lindenstrasse 23 D 7981 Grnkraut DEX) Wschle Franz (Brucknerstrasse 16 D 7987 Weingarten DEX), Process for forming a metal or alloy layer and device for executing same.
  13. Carson Donald R. (Barberton OH) Holden Calvin B. (Doylestown OH), Process for preparing finely-divided refractory powders.
  14. Porat Reuven (Nahariya ILX), Sintered hard metal products having a multi-layer wear-resistant coating.

이 특허를 인용한 특허 (21)

  1. Bryan William J. (Granby CT), Anodic vacuum arc deposition.
  2. Schmitt, Jason; Lu, Peng; Jones, Jeremy, Bulk diffusion crystal growth of nitride crystal.
  3. Christy Ronald, Cathodic arc cathode.
  4. Yamada Minoru (Kurobe JPX) Kawamura Shingo (Toyama-ken JPX), Hard multilayer film formed material of titanium and carbon/silicon.
  5. Nygren, Lea A.; Knowles, Shawn D., Implantable electrodes having zirconium nitride coatings.
  6. Jin Sungho ; Mavoori Hareesh, Low thermal expansion composite comprising bodies of negative CTE material disposed within a positive CTE matrix.
  7. Yamamoto, Youichi; Fukumaki, Naomi; Sakamoto, Misato; Kato, Yoshitake, MIM capacitor device.
  8. Sakamoto, Misato; Yamamoto, Youichi; Tachikawa, Masayuki; Kato, Yoshitake, Manufacturing method of semiconductor device.
  9. Yamamoto, Youichi; Fukumaki, Naomi; Sakamoto, Misato; Kato, Yoshitake, Manufacturing method of semiconductor device comprising a capacitor element.
  10. Kevin G. Donohoe, Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks.
  11. Rice, Derek A.; Lamm, Adrienne, Multilayered erosion resistant coating for gas turbines.
  12. Sekiya, Takuma; Murayama, Yuuichi; Sato, Masayuki; Shima, Yuji; Takahashi, Junya; Moronuki, Masaki, Piston ring.
  13. Donohoe, Kevin G., Plasma reactor.
  14. Kevin G. Donohoe, Plasma reactor.
  15. Jeffrey T. Boehler, Spark plug having a protective titanium thereon, and methods of making the same.
  16. Groll,William A., Stick resistant ceramic coating for cookware.
  17. William A. Groll, Stick resistant coating for cookware.
  18. Yadav,Tapesh, Titanium comprising nanoparticles and related nanotechnology.
  19. Braendle, Hans; Shima, Nobuhiko, Tool with tool body and protective layer system.
  20. Barthel, Bernd; Groos, Heinrich; Hermanni, Hans, Wire electrode and process for producing a wire electrode, particular for a spark erosion process.
  21. Bernd Barthel DE; Heinrich Groos DE; Hans Hermanni DE, Wire electrode and process for producing a wire electrode, particular for a spark erosion process.
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