초록 ▼

A system for the fluid treatment of semiconductor wafers includes a treatment vessel having opposed first and second ports, and means for holding wafers in a flow path therebetween. A flow segment comprising in sequence, a first vent, a first valve, an inlet, a second valve and a second vent extends

A system for the fluid treatment of semiconductor wafers includes a treatment vessel having opposed first and second ports, and means for holding wafers in a flow path therebetween. A flow segment comprising in sequence, a first vent, a first valve, an inlet, a second valve and a second vent extends between the first and the second port so as to constitute, together with the vessel, a closed fluid loop. A fluid delivery system for the delivery of a sequence of high purity treatment fluids to a treatment vessel includes a measuring tank having opposed ports and configured for plug flow between the ports, and a metering pump having its inlet connected to a said port for withdrawing metered amounts of fluid from the tank. A plurality of reservoirs of treatment fluid are each connected via a respective associated valve to one of the said ports. The tank is maintained hydraulically full, so that actuating the pump to withdraw a metered volume of fluid from the tank, and opening a valve associated with a selected treatment fluid draws the metered volume of the selected treatment fluid into the tank. Passive or non-mechanical means is provided for delivering the contents of the tank to a treatment vessel. A mixing tank may be provided, between the measuring tank and the treatment vessel. Mixing may be accomplished by bubbling a gas through the fluid held in the mixing tank.

대표청구항 ▼

Apparatus for treatment of semiconductor wafers with a fluid comprising: a treatment vessel having means for receiving a flow of fluid and means for supporting at least one wafer in contact with the fluid, fluid supply means for providing a measured supply of treatment fluid to the vessel, the fluid

Apparatus for treatment of semiconductor wafers with a fluid comprising: a treatment vessel having means for receiving a flow of fluid and means for supporting at least one wafer in contact with the fluid, fluid supply means for providing a measured supply of treatment fluid to the vessel, the fluid supply means including (a) a measuring tank having opposed tank ports (b) a metering pump having its inlet connected to a said tank port for withdrawing metered amounts of fluid from the tank (c) a plurality of reservoirs of treatment fluids, each reservoir being connected through an associated valve to a said tank port, and (d) means for delivering fluid from the tank to the means for receiving of the treatment vessel said fluid supply means being maintained in a hydraulically full condition, whereby when the metering pump withdraws a metered volume of fluid via a said port from the tank, an identical volume of a treatment fluid is drawn into the tank through the associated valve connecting that treatment fluid to the opposing port.