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Method and apparatus for handling and processing wafer-like materials 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-065/00
출원번호 US-0222327 (1988-07-20)
발명자 / 주소
  • Hurwitt Steven D. (Park Ridge NJ) Eror Miroslav (Old Tappan NJ) Biehl Richard E. (Pearl River NY)
출원인 / 주소
  • Materials Research Corporation (Orangeburg NY 02)
인용정보 피인용 횟수 : 63  인용 특허 : 13

초록

The apparatus is provided with a main chamber divided into two chamber halves by a rotatable index plate. The plate rotates through a load lock station, through which wafer-like articles are inserted into and removed from the main chamber, and a series of processing stations, at each of which a proc

대표청구항

Apparatus for transporting a wafer-like article and subjecting the article to at least one process step comprising: means defining a first chamber maintained substantially continuously at a vacuum or pressure level; aperture means in said first chamber through which an article to be subjected to the

이 특허에 인용된 특허 (13)

  1. Uehara Akira (Yokohama JPX) Kiyota Hiroyuki (Hiratsuka JPX) Miyazaki Shigekazu (Sagamihara JPX) Nakane Hisashi (Kawasaki JPX), Apparatus for automatic semi-batch sheet treatment of semiconductor wafers by plasma reaction.
  2. Redeker Werner (Brnsen DEX) Uhlig Uwe (Buchholz DEX), Apparatus for manipulating workpieces having plane parallel surfaces.
  3. Tateishi Hideki (Yokohama JPX) Kamei Tsuneaki (Kanagawa JPX) Abe Katsuo (Yokosuka JPX) Kobayashi Shigeru (Kawasaki JPX) Aiuchi Susumu (Yokohama JPX) Nakatsukasa Masashi (Tama JPX) Takahashi Nobuyuki , Apparatus for performing continuous treatment in vacuum.
  4. Weigand Robert E. (6456 Bancroft Way San Jose CA 95129), Article handling apparatus and method.
  5. Jacoby Hans-Dieter (Werdorf DEX) Schmidt Peter (Huettenberg DEX), Device for automatically transporting disk shaped objects.
  6. Bouchaib Pierre (L\Etang la Ville FRX), Installation for treatment of materials for the production of semi-conductors.
  7. Morton Dale E. (Farmers Branch TX), Optical thin film coater.
  8. Allen Ronald (San Jose CA) Chen Tu (Saratoga CA), Robotic disk handler system.
  9. Drews Klaus (Halstenbek DT) Krumme Jens-Peter (Hamburg DT), Substrate holder for etching thin films.
  10. Hutchinson, Martin A.; Shaw, R. Howard; Coad, George, Transfer plate rotation system.
  11. Brooks Norman B. (391 East St. Carlisle MA 01741) Brooks Frank P. (5 Inverness Rd. Winchester MA 01890), Transport apparatus.
  12. Bednorz Johannes G. (Adliswil CHX) Gueret Pierre L. (Richterswil CHX) Nievergelt Hermann E. (Adliswil CHX) Ott Hanspeter (Thalwil CHX) Pohl Wolfgang D. (Adliswil CHX) Widmer Daniel F. (Hirzel CHX), Vacuum transfer device.
  13. Burkhalter David W. (Redwood City CA) Kain Maurits R. (Redwood City CA), Wafer handling mechanism.

이 특허를 인용한 특허 (63)

  1. Hurwitt Steven ; Jelinek Vaclav, Apparatus and method for clamping a substrate.
  2. Stevens, Craig L.; Levy, Karl B., Architecture for high throughput semiconductor processing applications.
  3. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Conveying system for a vacuum processing apparatus.
  4. Huo David Datong, Restrictor shield having a variable effective throughout area.
  5. Lawson, John; Irwin, Dale; Chervenak, Steve, Single piece pod shield for vertical plenum wafer processing machine.
  6. Namiki Shigeru,JPX ; Kawa Hidetoshi,JPX, Sputtering apparatus.
  7. Hurwitt Steven (Park Ridge NJ), Sputtering apparatus having an on board service module.
  8. Lawson,John; Irwin,Dale; Chervenak,Steve; McIntee,John, Sputtering cathode adapter assembly and method.
  9. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Substrate changing-over mechanism in a vaccum tank.
  10. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Substrate changing-over mechanism in vacuum tank.
  11. Akira Izumi JP, Substrate processing apparatus.
  12. Morimoto Toru (Kyoto JPX) Hashinoki Kenji (Kyoto JPX) Hamada Tetsuya (Kyoto JPX) Kamei Kenji (Kyoto JPX), Substrate processing apparatus and method.
  13. Maher Joseph A. ; Vowles E. John ; Napoli Joseph D. ; Zafiropoulo Arthur W. ; Miller Mark W., System for processing substrates.
  14. Shigekazu Kato JP; Kouji Nishihata JP; Tsunehiko Tsubone JP; Atsushi Itou JP, Transferring device for a vacuum processing apparatus and operating method therefor.
  15. Wagner Rudolf (Fontnas CHX) Martin Bader (Balzers LIX) Eberhard Moll (Schellenberg LIX) Zanardo Renzo (Balzers LIX) Van Agtmaal J. G. (Hilversum NLX), Vacuum apparatus.
  16. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing and operating method.
  17. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing and operating method.
  18. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing and operating method using a vacuum chamber.
  19. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing and operating method with wafers, substrates and/or semiconductors.
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  21. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing apparatus.
  22. Kato, Shigekazu; Nishihata, Kouji; Tsubone, Tsunehiko; Itou, Atsushi, Vacuum processing apparatus.
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  35. Kato Shigekazu,JPX ; Nishihata Kouji,JPX ; Tsubone Tsunehiko,JPX ; Itou Atsushi,JPX, Vacuum processing apparatus and operating method therefor.
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  43. Kato, Shigekazu; Nishihata, Kouji; Tsubone, Tsunehiko; Itou, Atsushi, Vacuum processing apparatus and operating method therefor.
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