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Device and method to measure a short radiation pulse or an electric pulse 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01R-031/26
출원번호 US-0300086 (1989-01-19)
우선권정보 FR-0000694 (1988-01-22)
발명자 / 주소
  • Cuzin Marc (La Tronche FRX) Rossa Edouard (Gex FRX)
출원인 / 주소
  • Commissariat a l\Energie Atomique (Paris FRX 07)
인용정보 피인용 횟수 : 62  인용 특허 : 4

초록

A device for measuring a single short pulse includes at least one measuring unit (D1, Dn) comprising a conductive line (L) connected to a set of photoconductors (A, B1-Bp), the line and photoconductors being placed between two nonconductors forming a single support in which the length of the line (x

대표청구항

A device for measuring a single short pulse comprising at least one measuring unit suitable for carrying out p measurement points of a pulse to be analyzed of duration qqt10% of the period of the pulse to be analyzed, the device thus making it possible to introduce a delay between each photoconducto

이 특허에 인용된 특허 (4)

  1. Auston David H. (Mountainside NJ) Smith Peter R. (New York NY), Apparatus and method for measuring electronic response of high speed devices and materials.
  2. Nees John A. (Rochester NY) Mourou Gerard A. (Rochester NY) Jackson Todd A. (Rochester NY), Electro-optic measurement (network analysis) system.
  3. Bailey Andrew T. J. (The Pinnacles Harlow ; Essex CH19 5BB GB2) Vanlint Roy W. (The Pinnacles Harlow ; Essex CH19 5BB GB2), Measurement of pulse duration.
  4. Albrecht Georg F. (Rochester NY) Mourou Gerard (Rochester NY), Optical pulse correlation measurement.

이 특허를 인용한 특허 (62)

  1. Koichi Asai JP; Shinsuke Suhara JP, Apparatus for positioning electronic component holder head and apparatus for transferring electronic component.
  2. Dunklee, John, Chuck for holding a device under test.
  3. Dunklee, John, Chuck for holding a device under test.
  4. Dunklee, John, Chuck for holding a device under test.
  5. Dunklee,John, Chuck for holding a device under test.
  6. Dunklee,John, Chuck for holding a device under test.
  7. Dunklee,John, Chuck for holding a device under test.
  8. Stewart, Craig; Lord, Anthony; Spencer, Jeff; Burcham, Terry; McCann, Peter; Jones, Rod; Dunklee, John; Lesher, Tim; Newton, David, Chuck for holding a device under test.
  9. Stewart,Craig; Lord,Anthony; Spencer,Jeff; Burcham,Terry; McCann,Peter; Jones,Rod; Dunklee,John; Lesher,Tim; Newton,David, Chuck for holding a device under test.
  10. Andrews, Peter; Froemke, Brad; Dunklee, John, Chuck with integrated wafer support.
  11. Andrews,Peter; Froemke,Brad; Dunklee,John, Chuck with integrated wafer support.
  12. Andrews,Peter; Froemke,Brad; Dunklee,John, Chuck with integrated wafer support.
  13. Noe,Reinhold, Device for detecting polarization mode dispersion.
  14. Komatsu Fumio,JPX ; Okumura Katsuya,JPX ; Miyoshi Motosuke,JPX, Electron beam irradiating apparatus and electric signal detecting apparatus.
  15. Asai Koichi,JPX ; Suhara Sinsuke,JPX, Electronic component transferring device and method, and electronic component mounting system and method.
  16. Dunklee, John; Norgden, Greg; Cowan, C. Eugene, Guarded tub enclosure.
  17. Dunklee,John; Norgden,Greg; Cowan,C. Eugene, Guarded tub enclosure.
  18. Pfaff, Paul L., Holographic condition assessment system for a structure including a semiconductor material.
  19. Andrews, Peter; Hess, David; New, Robert, Interface for testing semiconductors.
  20. McFadden,Bruce, Localizing a temperature of a device for testing.
  21. Pfaff, Paul L., Method for optically testing semiconductor devices.
  22. Pfaff,Paul, Method for optically testing semiconductor devices.
  23. Pfaff, Paul; Russell, Kevin L., Method for testing a device under test including the interference of two beams.
  24. Pfaff, Paul L., Methods and processes for optical interferometric or holographic test in the development, evaluation, and manufacture of semiconductor and free-metal devices utilizing anisotropic and isotropic materials.
  25. Pfaff, Paul L., Methods for obtaining and analyzing digital interferometric data for computer testing and developing semiconductor and anisotropic devices and materials.
  26. Pfaff, Paul L., Methods for optically enhanced holographic interferometric testing for test and evaluation of semiconductor devices and materials.
  27. Pfaff, Paul L., Multiple beam transmission interferometric testing methods for the development and evaluation of subwavelength sized features within semiconductor and anisotropic devices.
  28. Pfaff, Paul L., Multiple optical wavelength interferometric testing methods for the development and evaluation of subwavelength sized features within semiconductor devices and materials, wafers, and monitoring all phases of development and manufacture.
  29. Pfaff,Paul; Mauck,Michael, Non-destructive testing system using a laser beam.
  30. Harris,Daniel L.; McCann,Peter R., Optical testing device.
  31. Pfaff, Paul L., Optical to optical methods enhancing the sensitivity and resolution of ultraviolet, electron beam and ion beam devices.
  32. Pfaff, Paul L., Optically enhanced holographic interferometric testing methods for the development and evaluation of semiconductor devices, materials, wafers, and for monitoring all phases of development and manufacture.
  33. Nordgren, Greg; Dunklee, John, Probe station.
  34. Nordgren, Greg; Dunklee, John, Probe station.
  35. Peters, Ron A.; Hayden, Leonard A.; Hawkins, Jeffrey A.; Dougherty, R. Mark, Probe station having multiple enclosures.
  36. Peters,Ron A.; Hayden,Leonard A.; Hawkins,Jeffrey A.; Dougherty,R. Mark, Probe station having multiple enclosures.
  37. Peters,Ron A.; Hayden,Leonard A.; Hawkins,Jeffrey A.; Dougherty,R. Mark, Probe station having multiple enclosures.
  38. Cowan, Clarence E.; Tervo, Paul A.; Dunklee, John L., Probe station thermal chuck with shielding for capacitive current.
  39. Cowan,Clarence E.; Tervo,Paul A.; Dunklee,John L., Probe station thermal chuck with shielding for capacitive current.
  40. Cowan,Clarence E.; Tervo,Paul A.; Dunklee,John L., Probe station thermal chuck with shielding for capacitive current.
  41. Dunklee,John; Cowan,Clarence E., Probe station with low inductance path.
  42. Dunklee,John; Cowan,Clarence E., Probe station with low inductance path.
  43. Lesher, Timothy; Miller, Brad; Cowan, Clarence E.; Simmons, Michael; Gray, Frank; McDonald, Cynthia L., Probe station with low noise characteristics.
  44. Lesher,Timothy; Miller,Brad; Cowan,Clarence E.; Simmons,Michael; Gray,Frank; McDonald,Cynthia L., Probe station with low noise characteristics.
  45. Lesher,Timothy; Miller,Brad; Cowan,Clarence E.; Simmons,Michael; Gray,Frank; McDonald,Cynthia L., Probe station with low noise characteristics.
  46. Navratil,Peter; Froemke,Brad; Stewart,Craig; Lord,Anthony; Spencer,Jeff; Runbaugh,Scott; Fisher,Gavin; McCann,Pete; Jones,Rod, Probe station with two platens.
  47. Lesher, Timothy E., Probe testing structure.
  48. Lesher,Timothy E., Probe testing structure.
  49. Dunklee,John, Switched suspended conductor and connection.
  50. Dunklee,John, Switched suspended conductor and connection.
  51. Strid,Eric W.; Schappacher,Jerry B.; Carlton,Dale E.; Gleason,K. Reed, System for evaluating probing networks.
  52. Strid,Eric W.; Schappacher,Jerry B.; Carlton,Dale E.; Gleason,K. Reed, System for evaluating probing networks.
  53. Andrews, Peter; Hess, David, System for testing semiconductors.
  54. Negishi, Kazuki; Hansen, Mark, Test apparatus for measuring a characteristic of a device under test.
  55. Rumbaugh,Scott, Thermal optical chuck.
  56. Rumbaugh,Scott, Thermal optical chuck.
  57. Pfaff,Paul; Russell,Kevin L., Voltage testing and measurement.
  58. Schwindt, Randy J.; Harwood, Warren K.; Tervo, Paul A.; Smith, Kenneth R.; Warner, Richard H., Wafer probe station having a skirting component.
  59. Schwindt,Randy J.; Harwood,Warren K.; Tervo,Paul A.; Smith,Kenneth R.; Warner,Richard H., Wafer probe station having a skirting component.
  60. Schwindt,Randy J.; Harwood,Warren K.; Tervo,Paul A.; Smith,Kenneth R.; Warner,Richard H., Wafer probe station having a skirting component.
  61. Harwood, Warren K.; Tervo, Paul A.; Koxxy, Martin J., Wafer probe station having environment control enclosure.
  62. Harwood,Warren K.; Tervo,Paul A.; Koxxy,Martin J., Wafer probe station having environment control enclosure.
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