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Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C09C-001/68
출원번호 US-0285435 (1989-03-07)
발명자 / 주소
  • Carr Jeffrey W. (Fishkill NY) David Lawrence D. (Wappingers Falls NY) Guthrie William L. (Hopewell Junction NY) Kaufman Frank B. (Amawalk NY) Patrick William J. (Newburgh NY) Rodbell Kenneth P. (Poug
출원인 / 주소
  • International Business Machines Corporation (Armonk NY 02)
인용정보 피인용 횟수 : 194  인용 특허 : 9

초록 ▼

Disclosed is a method of chem-mech polishing an electronic component substrate. The method includes the following steps; obtaining a substrate having at least two features thereon or therein which have a different etch rate with respect to a particular etchant; and contacting the substrate with a po

대표청구항

A chem-mech polishing slurry comprising: abrasive particles; a transition metal chelated salt; and a solvent for said salt.

이 특허에 인용된 특허 (9)

  1. Hori Saburo (Iwaki JPX) Watanabe Nobuhiro (Iwaki JPX), Composite abrasive particles for magnetic abrasive polishing and process for preparing the same.
    상세보기
  2. Williamson John P. H. (Chester GB2) Moilliet John L. (Abberley GB2), Glass polishing processes.
    상세보기
  3. Rea William V. (Newark CA), Metal polishing composition and process.
    상세보기
  4. Koshiyama Isamu (Nagoya JPX) Naitou Yoshisuke (Aichi JPX), Method for polishing a single crystal or gadolinium gallium garnet.
    상세보기
  5. Chow Ming-Fea (Poughquagh NY) Guthrie William L. (Hopewell Junction NY) Kaufman Frank B. (Amawalk NY), Method of forming fine conductive lines, patterns and connectors.
    상세보기
  6. Kitano Hirohito (Aichi JPX) Oowaki Toshiki (Aichi JPX) Baba Takashi (Aichi JPX), Polishing composition.
    상세보기
  7. Senda Tetsuji (Aichi JPX) Baba Takashi (Aichi JPX), Polishing composition for memory hard disc.
    상세보기
  8. Senda Tetsuji (Aichi JPX) Baba Takashi (Aichi JPX), Process for polishing surface of memory hard disc.
    상세보기
  9. Khaladji Jean (Paris FRX) Peltier Marcel (La Rochelle FRX), Rare earth polishing compositions.
    상세보기

이 특허를 인용한 특허 (194)

  1. Uchida, Takeshi; Matsuzawa, Jun; Hoshino, Tetsuya; Kamigata, Yasuo; Terazaki, Hiroki; Honma, Yoshio; Kondoh, Seiichi, Abrasive liquid for metal and method for polishing.
    상세보기
  2. Uchida, Takeshi; Matsuzawa, Jun; Hoshino, Tetsuya; Kamigata, Yasuo; Terazaki, Hiroki; Honma, Yoshio; Kondoh, Seiichi, Abrasive liquid for metal and method for polishing.
    상세보기
  3. Uchida, Takeshi; Matsuzawa, Jun; Hoshino, Tetsuya; Kamigata, Yasuo; Terazaki, Hiroki; Honma, Yoshio; Kondoh, Seiichi, Abrasive liquid for metal and method for polishing.
    상세보기
  4. Uchida, Takeshi; Matsuzawa, Jun; Hoshino, Tetsuya; Kamigata, Yasuo; Terazaki, Hiroki; Honma, Yoshio; Kondoh, Seiichi, Abrasive liquid for metal and method for polishing.
    상세보기
  5. Robinson Karl M., Abrasive polishing pad with covalently bonded abrasive particles.
    상세보기
  6. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Ootuki, Yuuto; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  7. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Ootuki, Yuuto; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  8. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Ootuki, Yuuto; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  9. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Ootuki, Yuuto; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
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