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Method for measuring surface temperature of semiconductor wafer substrate, and heat-treating apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01J-005/00
출원번호 US-0380026 (1989-07-14)
우선권정보 JP-0176343 (1988-07-15)
발명자 / 주소
  • Arima Jiro (Osaka JPX) Tsujimura Hiroji (Osaka JPX) Narita Tomonori (Tokyo JPX) Takebuchi Hiroki (Kawasaki JPX)
출원인 / 주소
  • Minolta Camera Kabushiki Kaisha (Osaka JPX 03) Tokyo Electron Limited (Tokyo JPX 03)
인용정보 피인용 횟수 : 39  인용 특허 : 11

초록 ▼

A method for measuring the surface temperature of a wafer substrate and a heat-treating apparatus are both used in a semiconductor device-manufacturing process wherein a reference light including infrared rays is intermittently emitted toward a wafer substrate. Infrared rays of a plurality of differ

대표청구항 ▼

An apparatus for heat-treating a semiconductor wafer substrate, comprising: means for heating the wafer substrate; means for intermittently emitting infrared rayincluding reference light toward the wafer substrate; means for selectively detecting infrared rays of a plurality of kinds whose wavelengt

이 특허에 인용된 특허 (11)

  1. Stein Alexander (Secaucus NJ), Apparatus for remote measurement of temperatures.
    상세보기
  2. Sinnar Abbas M. (6111 Triangle Dr. Columbia MD 21044), Compositional state detection system and method.
    상세보기
  3. Maki August H. (Davis CA) Taherian Mohammad-Reza (San Carlos CA), Cryogenic thermometer employing molecular luminescence.
    상세보기
  4. Brouwer Nicholaas L. (Allegheny Township ; Allegheny County PA) Urbanic John M. (Churchill Borough PA) Anderson Albert R. (White Valley PA), Emissivity error correcting method for radiation thermometer.
    상세보기
  5. Angel S. Michael (Livermore CA) Hirschfeld Tomas B. (Livermore CA), Method and apparatus for optical temperature measurements.
    상세보기
  6. Cashdollar Kenneth L. (Bethel Park PA) Hertzberg Martin (Pittsburgh PA) Litton Charles D. (Pittsburgh PA), Multichannel infrared pyrometer.
    상세보기
  7. Kemeny Gabor J. (Manhattan KS) Wetzel David L. (Manhattan KS), Optical analysis method and apparatus having programmable rapid random wavelength access.
    상세보기
  8. Suarez-Gonzalez Ernesto (Tequesta FL), Reflection corrected radiosity optical pyrometer.
    상세보기
  9. Nishizawa, Jun-ichi; Ohmi, Tadahiro, Semiconductor fabricating apparatus.
    상세보기
  10. Anderson, Alan S., Temperature measuring apparatus.
    상세보기
  11. Jensen Stephen C. (Edina MN), Turbine blade temperature detecting pyrometer.
    상세보기

이 특허를 인용한 특허 (39)

  1. Ish-Shalom Yaron,ILX ; Baharav Yael, Active pyrometry with emissivity extrapolation and compensation.
    상세보기
  2. Busche, Matthew J.; Parkhe, Vijay D.; Rice, Michael R., Apparatus and method for measurement of the thermal performance of an electrostatic wafer chuck.
    상세보기
  3. Yam Mark ; Hunter Aaron M., Apparatus and method for measuring substrate temperature.
    상세보기
  4. Jennings Dean, Apparatus and methods for measuring substrate temperature.
    상세보기
  5. Aronowitz Sheldon ; Eib Nicholas ; Owyang Jon S., Apparatus for rapid thermal processing of a wafer.
    상세보기
  6. Adams Bruce ; Hunter Aaron ; Rubinchik Alex ; Yam Mark ; O'Brien Paul A., Apparatus for substrate temperature measurement using a reflecting cavity and detector.
    상세보기
  7. Camm,David Malcolm; Bumbulovic,Mladen; Cibere,Joseph; Elliott,J. Kiefer; McCoy,Steve; Stuart,Greg, Apparatuses and methods for suppressing thermally-induced motion of a workpiece.
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  8. O'Neill James Anthony ; Singh Jyothi, Combined emissivity and radiance measurement for the determination of the temperature of a radiant object.
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  9. Bevan,Edward James; Briggs,Max Michael; DiDomenico,John; Gedridge, Jr.,Robert W., Compact emissivity and temperature measuring infrared detector.
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  10. O'Neill James Anthony ; Singh Jyothi, Control of etch selectivity.
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  11. O\Neill James Anthony (New City NY) Singh Jyothi (Hopewell Junction NY), Control of etch selectivity.
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  12. Peck, Kevin B.; Johnson, Noel H.; McEntire, William D.; Berdner, Thomas J, Heating element condition monitor.
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  13. Peck,Kevin B.; Johnson,Noel H.; Berdner,Thomas J., Heating element condition monitor.
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  14. Shrinivasan, Krishnan; Shimanovich, Arkadiy; Gadgil, Prasad N., Measurement of substrate temperature in a process chamber using non-contact filtered infrared pyrometry.
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  15. Peuse Bruce W. ; Miner Gary E. ; Yam Mark ; Hunter Aaron ; Knoot Peter ; Mershon Jason, Method and apparatus for measuring substrate temperatures.
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  16. Alexander Gurary ; Vadim Boguslavskiy ; Ameesh N. Patel ; Jeffrey C. Ramer, Method and apparatus for measuring the temperature of objects on a fast moving holder.
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  17. Vandenabeele Peter M. N. (Herent BEX) Maex Karen I. J. (Herent BEX), Method and device for measuring temperature radiation using a pyrometer wherein compensation lamps are used.
    상세보기
  18. Peuse Bruce W. ; Miner Gary E. ; Yam Mark, Method of calibrating a temperature measurement system.
    상세보기
  19. Aronowitz Sheldon ; Eib Nicholas ; Owyang Jon S., Method of forming a layer and semiconductor substrate.
    상세보기
  20. Camm, David Malcolm; Sempere, Guillaume; Kaludjercic, Ljubomir; Stuart, Gregory; Bumbulovic, Mladen; Tran, Tim; Dets, Sergiy; Komasa, Tony; Rudolph, Marc; Cibere, Joseph, Methods and systems for supporting a workpiece and for heat-treating the workpiece.
    상세보기
  21. Camm, David Malcolm; Sempere, Guillaume; Kaludjercic, Ljubomir; Stuart, Gregory; Bumbulovic, Mladen; Tran, Tim; Dets, Sergiy; Komasa, Tony; Rudolph, Marc; Cibere, Joseph, Methods and systems for supporting a workpiece and for heat-treating the workpiece.
    상세보기
  22. Daniel, William E.; Woskov, Paul P.; Sundaram, Shanmugavelayutham K., Milliwave melter monitoring system.
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  23. Cabib Dario,ILX ; Buckwald Robert A.,ILX ; Adel Michael E.,ILX, Multipoint temperature monitoring apparatus for semiconductor wafers during processing.
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  24. Schietinger Charles W. ; Adams Bruce E., Non-contact optical techniques for measuring surface conditions.
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  25. Markus Hauf DE, Optical radiation measurement apparatus.
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  26. Vikram Singh ; Robert J. Whiting ; Paul K. Shufflebotham ; Ajay Saproo, Predictive wafer temperature control system and method.
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  27. Yam Mark, Self-calibrating temperature probe.
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  28. Malone, Christopher G.; Bash, Cullen E.; Patel, Chandrakant D., Spray cooling system with cooling regime detection.
    상세보기
  29. Duffer Charles E. ; Alcoz Jorge J., System and method for controlling process temperatures for a semi-conductor wafer.
    상세보기
  30. William M. Glasheen ; Charles DeMilo ; Helmar R. Steglich, System and method for determining combustion temperature using infrared emissions.
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  31. William M. Glasheen ; Charles DeMilo ; Helmar R. Steglich, System and method for determining combustion temperature using infrared emissions.
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  32. Yudaya Raju Sivathanu, System and method for determining combustion temperature using infrared emissions.
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  33. Yudaya Raju Sivathanu, System and method for determining combustion temperature using infrared emissions.
    상세보기
  34. Camm, David Malcolm; Cibere, Joseph; Bumbulovic, Mladen, Systems and methods for supporting a workpiece during heat-treating.
    상세보기
  35. Camm,David M.; Kervin,Shawna; Lefrancois,Marcel Edmond; Stuart,Greg, Temperature measurement and heat-treating methods and system.
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  36. Camm, David M.; Kervin, Shawna; Lefrancois, Marcel Edmond; Stuart, Greg, Temperature measurement and heat-treating methods and systems.
    상세보기
  37. Aderhold Wolfgang ; Mayur Abhilash J. ; Knoot Peter A., Tuning a substrate temperature measurement system.
    상세보기
  38. Okamoto Akira,JPX ; Kobayashi Shigeru,JPX ; Shimamura Hideaki,JPX ; Tsuzuku Susumu,JPX ; Nishitani Eisuke,JPX ; Kisimoto Satosi,JPX ; Yoneoka Yuji,JPX, Vacuum processing apparatus, and a film deposition apparatus and a film deposition method both using the vacuum processing apparatus.
    상세보기
  39. Camm, David Malcolm; Cibere, Joseph; Stuart, Greg; McCoy, Steve, Workpiece breakage prevention method and apparatus.
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