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Reticle conveying device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03B-027/04
출원번호 US-0528903 (1990-05-29)
우선권정보 JP-0162131 (1986-07-11); JP-0162132 (1986-07-11); JP-0162133 (1986-07-11); JP-0162134 (1986-07-11); JP-0162135 (1986-07-11); JP-0162136 (1986-07-11); JP-0162137 (1986-07-11); JP-0162138 (1986-07-11); JP-0162
발명자 / 주소
  • Iizuka Kazuo (Yokohama JPX)
출원인 / 주소
  • Canon Kabushiki Kaisha (Tokyo JPX 03)
인용정보 피인용 횟수 : 25  인용 특허 : 16

초록

A reticle conveying system includes a reticle keeping shelf for keeping therein a plurality of reticles; a first conveying portion for selecting and extracting a desired reticle out of the reticle keeping shelf and for conveying the extracted reticle to a predetermined position; and a second conveyi

대표청구항

A reticle conveying system usable with a reticle keeping shelf having a plurality of supports for supporting a plurality of reticles, for conveying a reticle between the keeping shelf and an exposure station, said system comprising: a first conveying mechanism for conveying a reticle along a first p

이 특허에 인용된 특허 (16)

  1. Tanimoto Akikazu (Yokohama JPX) Matsuura Toshio (Koshigaya JPX) Murakami Seiro (Tokyo JPX) Uehara Makoto (Tokyo JPX) Suwa Kyoichi (Yokohama JPX), Alignment apparatus.
  2. Matsumura Takashi (Yokohama JPX), Alignment system allowing alignment when alignment marks are absent.
  3. Weidanz Herbert (Kursiefener Str. 16a 5074 Odenthal-Globusch DEX) Auf Dem Graben Horst (Auf dem Steitacker ; 24 5000 Cologne 90 DEX), Cassette for stack of single films.
  4. Tsutsui Shinji (Kawasaki JPX), Cassette-type container for a sheet-like member.
  5. Jacoby Hans-Dieter (Werdorf DEX) Schmidt Peter (Huettenberg DEX), Device for automatically transporting disk shaped objects.
  6. Munnig Schmidt Robert H. (Drachten NLX), Device for exchanging masks.
  7. Takeuchi Kiyoyuki (Otawara JPX), Film containing magazine.
  8. Spence-Bate Harry A. H. (Morley AUX) Smith Timothy B. (Wickens Manor GB2), Film lamina handling.
  9. Iizuka Kazuo (Yokohama JPX) Tokuda Yukio (Kawasaki JPX) Kosugi Masao (Yokohama JPX), Mask storing mechanism.
  10. Bahnck, Norman; Kloap, Philip, Methods of and apparatus for handling semiconductor devices.
  11. Hidding Gerhard (Venlo NLX), Original feed system for copying machine.
  12. Imai Shunzo (Yamato JPX) Sato Hiroshi (Tokyo JPX) Iizuka Kazuo (Kawasaki JPX), Original feeding apparatus and a cassette for containing the original.
  13. Kitai Makoto (Kyoto JPX) Omori Takashi (Kyoto JPX), Photographic contact printing apparatus for duplicating of original color picture.
  14. Nakazawa Kiwao (Tokyo JPX) Suwa Kyoichi (Kawasaki JPX) Yoshida Shoichiro (Tokyo JPX), Positioning apparatus.
  15. Davis Cecil J. (Greenville TX) Matthews Robert (Plano TX) Hildenbrand Randall C. (Richardson TX), Vacuum processing system.
  16. Layman Frederick P. (Fremont CA) Hobson Phillip M. (Los Altos CA) Dick Paul H. (San Jose CA), Valve incorporating wafer handling arm.

이 특허를 인용한 특허 (25)

  1. Lafond Andre,FRX, Automatic assembler/disassembler apparatus adapted to pressurized sealable transportable containers.
  2. Lafond Andre,FRX, Automatic assembler/disassembler apparatus adapted to pressurized sealable transportable containers.
  3. French ; Jr. Norman L., Circuit and apparatus for verifying a chamber seal, and method of depositing a material onto a substrate using the same.
  4. Norman L. French, Jr., Circuit and apparatus for verifying a chamber seal, and method of depositing a material onto a substrate using the same.
  5. Miwa, Yoshinori, Exposure apparatus and exposure method.
  6. Miwa,Yoshinori, Exposure apparatus and exposure method.
  7. Miwa, Yoshinori; Yamane, Yukio, Exposure apparatus and manufacturing method using the same.
  8. Nishi,Kenji, Exposure method, exposure apparatus, and method for producing device.
  9. Rebstock, Lutz, Integrated gripper for workpiece transfer.
  10. Doede Kuiper NL; Jan J. Kuit NL, Mask handling apparatus for lithographic projection apparatus.
  11. Nakahara Kanefumi,JPX ; Endo Yutaka,JPX ; Nishikata Akio,JPX, Master plate transporting system.
  12. Nakamura Gen,JPX, Method and apparatus for manufacture of semiconductor devices.
  13. Kanefumi Nakahara JP, Method of manufacturing exposure apparatus and method for exposing a pattern on a mask onto a substrate.
  14. Akagawa Masayuki,JPX ; Kimura Yoshihiro,JPX, Pellicle pasting system and method.
  15. Cheng, Lin, Reticle box transport cart.
  16. Blattner, Jakob; Federici, Rudy; Fosnight, William; Haris, Clint, Reticle manipulating device.
  17. Blattner, Jakob; Federici, Rudy; Fosnight, William; Harris, Clint, Reticle manipulation device.
  18. Ryan Patrick J. ; Conboy Michael R. ; Hovestol Stephen P., Reticle sorter.
  19. Ryan, Patrick J.; Conboy, Michael R.; Hovestol, Stephen P., Reticle sorter.
  20. Foulke, Richard F.; Foulke, Jr., Richard F.; Ohlenbusch, Cord W.; Lui, Takman, Reticle storage system.
  21. Matsutori,Chiaki; Yanagihara,Koichi, Reticle-processing system.
  22. Kawakami, Katsuya; Tsunoda, Masahiro; Gunji, Takashi; Sato, Hidetoshi, Sample conveying mechanism.
  23. Matsumoto,Ken, Substrate transfer apparatus, semiconductor manufacturing apparatus, and semiconductor device manufacturing method.
  24. Hirakawa, Shinichi, Substrate treating device and method, and exposure device and method.
  25. Babbs, Daniel J.; Fosnight, William J.; Cosentino, Tim; Sammut, Mark; Pinna, Pascal; Zemen, Russell, Workpiece sorter operating with modular bare workpiece stockers and/or closed container stockers.
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