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Method and apparatus for in situ cleaning of excimer laser optics 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24B-001/00
  • B24C-001/00
  • B08B-007/00
  • H01S-003/00
출원번호 US-0371103 (1989-06-26)
발명자 / 주소
  • Rufin Denis A. (Hinsdale IL)
출원인 / 주소
  • American Air Liquide (New York NY 02)
인용정보 피인용 횟수 : 109  인용 특허 : 4

초록

A method and apparatus for cleaning the optical elements in an excimer laser in situ. A source of high pressure carbon dioxide gas is allowed to escape through a nozzle facing the surface of the optical elements. The escaping gas expands and cools sufficiently to form a carbon dioxide ice jet. The i

대표청구항

A method for in situ cleaning of optical elements in a laser, comprising the steps of: providing a nozzle in said laser, facing each optical element; connecting a source of cleaning material to each nozzle; producing an ice jet of said cleaning material from each nozzle which strikes the correspondi

이 특허에 인용된 특허 (4)

  1. Whitlock Walter H. (Peapack NJ) Weltmer ; Jr. William R. (Murray Hill NJ) Clark James D. (Mountainside NJ), Apparatus and method for removing minute particles from a substrate.
  2. Steffen Jrg (Sigriswil CHX), Gas laser equipped with triple function valves.
  3. Wang Shing Chung (Temple City CA) Hamerdinger Randolph W. (Glendora CA) Hug William F. (Pasadena CA), Metal vapor laser having cataphoresis means.
  4. Hayashi Chikara (Chigasaki JPX), Process for removing covering film and apparatus therefor.

이 특허를 인용한 특허 (109)

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  82. Freeman, Dominique; Alden, Don, Self optimizing lancing device with adaptation means to temporal variations in cutaneous properties.
  83. Jackson Robert S. ; Boberg Arne B., System and method for CO.sub.2 cleaning of data storage disks.
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