초록 ▼

An enlargement projection type exposure method includes the steps of deforming the shape of a substrate so as to eliminate distortion in an enlarged image of the pattern, which is formed on a mask and projected onto the substrate through an enlargement projection system. The pattern is exposed with

An enlargement projection type exposure method includes the steps of deforming the shape of a substrate so as to eliminate distortion in an enlarged image of the pattern, which is formed on a mask and projected onto the substrate through an enlargement projection system. The pattern is exposed with the use of an enlargement projection optical system. An apparatus for the method comprises an enlargement projection optical system for enlarging the pattern formed on the mask, and a substrate deforming device for deforming by adsorption the substrate in shape so as to eliminate the distortion in the enlarged image of the pattern through the enlargement projection optical system.

대표청구항 ▼

An enlargement projection type exposure method comprising the steps of: a. projecting a circuit pattern of a mask through a lens system onto a substrate before exposure to form a pattern; b. comparing the projected pattern on the substrate with design values therefor; c. measuring an image distortio

An enlargement projection type exposure method comprising the steps of: a. projecting a circuit pattern of a mask through a lens system onto a substrate before exposure to form a pattern; b. comparing the projected pattern on the substrate with design values therefor; c. measuring an image distortion of the projected circuit pattern inherent in the lens system; d. storing the measured image distortion in means for storing; e. calculating control deviations of a surface level of the substrate to correct the measured image distortion stored in the storing means; f. generating a fine displacement to elastically deform a shape of the substrate in accordance with the calculated control deviations; and g. exposing the circuit pattern of the mask onto the substrate by projecting and enlarging the pattern through the lens system.