초록 ▼

A wafer cleaning system which cleans semiconductor wafers by sand blasting them with ice particles is disclosed. In this system a stream of gas is conducted by a conduit to the semiconductor wafer while a spray of water is frozen into the ice particles by a number of cooling coil systems which protr

A wafer cleaning system which cleans semiconductor wafers by sand blasting them with ice particles is disclosed. In this system a stream of gas is conducted by a conduit to the semiconductor wafer while a spray of water is frozen into the ice particles by a number of cooling coil systems which protrude into the conduit. After the semiconductor wafer is sandblasted with ice, any residual ice is removed simply by evaporating it. This results in a clean wafer without the contamination that can accompany chemical solvents of other semiconductor cleaning and etching systems.

대표청구항 ▼

A semiconductor wafer cleaning system which cleans a semiconductor wafer by sandblasting the semiconductor wafer with ice particles such that when said semiconductor wafer has been cleaned, any residual ice particles may be evaporated from the semiconductor\s surface without leaving any contaminatio

A semiconductor wafer cleaning system which cleans a semiconductor wafer by sandblasting the semiconductor wafer with ice particles such that when said semiconductor wafer has been cleaned, any residual ice particles may be evaporated from the semiconductor\s surface without leaving any contamination on said semiconductor wafer, said semiconductor wafer cleaning system comprising: a source of pressurized gas which emits a stream of gas with a flow rate that is adjustable; a conduit which is fixed to said source of pressurized gas so that the conduit receives and conducts said stream of gas to said semiconductor wafer; a source of pressurized water which emits to a stream of water; a spray head which is connected to said source of pressurized water and which protrudes into said conduit so that the spray head receives and converts said stream of water into a spray of water which is conducted by said stream of gas through said conduit; and a means for cooling said spray of water to temperatures which are below a point at which water freezes, said cooling means thereby converting said spray of water into said ice particles which sandblast and clean said semiconductor wafer as they are conducted to the semiconductor wafer by said stream of gas in said conduit.