초록 ▼

An apparatus and method for reprocessing waste oxidant solution containing contaminated H2SO4 from, for example, a semiconductor processing operation to supply reprocessed ultrapure H2SO4 and ozone is described. The apparatus and method include a two distillation flasks which are maintained under a

An apparatus and method for reprocessing waste oxidant solution containing contaminated H2SO4 from, for example, a semiconductor processing operation to supply reprocessed ultrapure H2SO4 and ozone is described. The apparatus and method include a two distillation flasks which are maintained under a substantial vacuum. The first distillation flask includes a first column with a column packing means and a reflux means to retard loss of H2SO4 in the first distillation. The second distillation flask boils off substantially pure H2SO4 through a column which is coupled to a condenser which condenses substantially pure H2SO4. The apparatus and method further include an ozone generator and ozone addition module to saturate the substantially pure H2SO4 with ozone to provide an oxidant solution for the semiconductor processing operation. The apparatus and method further includes an ozone destruction unit which destroys the ozone in the waste oxidant solution that is removed from the semiconductor processing operation.

대표청구항 ▼

A process for the regeneration and repurification of ultrapure oxidant solution comprising ultrapure sulfuric acid (H2SO4) and ozone which is used in a chemical process at a chemical processing center, comprising: withdrawing at least a portion of said oxidant solution used in said chemical process;

A process for the regeneration and repurification of ultrapure oxidant solution comprising ultrapure sulfuric acid (H2SO4) and ozone which is used in a chemical process at a chemical processing center, comprising: withdrawing at least a portion of said oxidant solution used in said chemical process; distilling said withdrawn oxidant to remove particles and dissolved impurities to form H2SO4; generating ozone and introducing said ozone into said H2SO4 to produce said ultrapure oxidant solution for use at said chemical processing center.