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Integrated circuit processing system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-049/05
출원번호 US-0143918 (1988-01-13)
발명자 / 주소
  • Davis Cecil J. (Greenville TX) Matthews Robert (Plano TX) Bowling Robert A. (Garland TX)
출원인 / 주소
  • Texas Instruments Incorporated (Dallas TX 02)
인용정보 피인용 횟수 : 78  인용 특허 : 0

초록

A vacuum-tight wafer carrier, and a load lock suitable for use with this wafer carrier. The wafers are supported at each side by a slightly sloping shelf, so that minimal contact (line contact) is made between the wafer surface and the surface of the shelf. This reduces generation of particulates by

대표청구항

A method for fabricating integrated circuits, comprising the steps of: providing a plurality of wafers in a vacuum sealable wafer carrier, said wafer carrier comprising a bell jar shape cover which is vacuum sealable to a body thereof, said bell jar shape cover being removable from said body in a di

이 특허를 인용한 특허 (78)

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  3. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  4. van der Meulen, Peter, Batch wafer alignment.
  5. Babbs, Daniel; Fosnight, William, Carrier gas system and coupling substrate carrier to a loadport.
  6. Phillips, Alton H., Contact material and system for ultra-clean applications.
  7. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  8. Boris Fishkin ; Seiji Sato ; Robert B. Lowrance, Controlled environment enclosure and mechanical interface.
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  10. Fishkin Boris ; Sato Seiji ; Lowrance Robert B., Controlled environment enclosure and mechanical interface.
  11. Murata Masanao (Ise JPX) Yamashita Teppei (Ise JPX) Tanaka Tsuyoshi (Ise JPX) Morita Teruya (Ise JPX) Oyobe Hiroyuki (Ise JPX), Conveying system.
  12. Lee,Jae Chull; Berkstresser,David, Curved slit valve door with flexible coupling.
  13. Lee, Jae-Chull; Kurita, Shinichi; White, John M.; Anwar, Suhail, Decoupled chamber body.
  14. Lindner, Friedrich Paul; Hangweier, Peter Oliver, Device and method for processing of wafers.
  15. Lindner, Friedrich Paul; Hangweier, Peter-Oliver, Device and method for processing wafers.
  16. Kurita, Shinichi; Blonigan, Wendell T., Double dual slot load lock chamber.
  17. Avi Tepman ; Donald J. K. Olgado ; Allen L. D'Ambra, Dual buffer chamber cluster tool for semiconductor wafer processing.
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  19. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  20. Kraus, Joseph Arthur; Strassner, James David, Dual wafer load lock.
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  22. Salzman Philip M. (San Jose CA), Enclosure for load lock interface.
  23. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  24. Rigali Louis A. ; Hoffman David E. ; Wang Keda, High Throughput plasma treatment system.
  25. Jones, William D., High pressure fourier transform infrared cell.
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  27. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  28. Rigali, Louis A.; Hoffman, David E.; Wang, Keda; Smith, III, William F., High throughput plasma treatment system.
  29. Rigali,Louis A.; Hoffman,David E.; Wang,Keda; Smith, III,William F., High throughput plasma treatment system.
  30. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  31. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  32. Tyler, James Scott, High-speed symmetrical plasma treatment system.
  33. Kurita, Shinichi; Blonigan, Wendell T.; Tanase, Yoshiaki, Large area substrate transferring method for aligning with horizontal actuation of lever arm.
  34. Kurita,Shinichi; Blonigan,Wendell T.; Tanase,Yoshiaki, Load lock chamber for large area substrate processing system.
  35. Kurita,Shinichi; Blonigan,Wendell T., Load lock chamber having two dual slot regions.
  36. Lee, Jae-Chull; Anwar, Suhail; Kurita, Shinichi, Load lock chamber with decoupled slit valve door seal compartment.
  37. Condrashoff, Robert S.; Fazio, James P.; Hoffman, David E.; Tyler, James S., Material handling system and method for a multi-workpiece plasma treatment system.
  38. Condrashoff, Robert Sergel; Fazio, James Patrick; Hoffman, David Eugene; Tyler, James Scott, Material handling system and methods for a multichamber plasma treatment system.
  39. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  40. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  41. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  42. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  43. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  44. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  45. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  46. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
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  48. Kurita,Shinichi; Blonigan,Wendell T., Method for transferring substrates in a load lock chamber.
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  50. Ku, Shao-Yen; Chen, Ming-Jung; Chung, Tzu Yang; Tseng, Chi-Yun; Chuang, Rui-Ping, Methods for transporting wafers between wafer holders and chambers.
  51. Kurita, Shinichi; Anwar, Suhail; Lee, Jae-Chull, Multiple slot load lock chamber and method of operation.
  52. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  53. Murata, Tatsuya, Optical disk device and optical disk processing system having optical disk device.
  54. Murata, Tatsuya, Optical disk device and optical disk processing system having optical disk device.
  55. Straemke, Siegfried, Plasma treatment installation.
  56. Rush John M. ; Ulander Torben ; Verdon Michael T., Pod loader interface.
  57. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  58. Wuester,Christopher D., Process flow thermocouple.
  59. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  60. Dobbs Michael E. (Brighton MI) Jones Donald B. (Ann Arbor MI), Robotic substrate manipulator.
  61. Tepolt Gary B., Robotic wafer handler.
  62. van der Meulen, Peter, Semiconductor manufacturing systems.
  63. Gallagher Gary M. (Colorado Springs CO) Wittman Boyd C. (Colorado Springs CO) Neumann Edmund B. (Corvallis OR), Semiconductor wafer cassette transport box.
  64. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
  65. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
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  67. van der Meulen, Peter; Kiley, Christopher C.; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling transport.
  68. Babbs, Daniel; Fosnight, William; May, Robert C.; Weaver, William, Side opening unified pod.
  69. Babbs, Daniel; Fosnight, William; May, Robert C.; Weaver, William, Side opening unified pod.
  70. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  71. Tony R. Kroeker, Three chamber load lock apparatus.
  72. Thibado, Paul M.; LaBella, Vincent P.; Bullock, Daniel W., Tool and method for in situ vapor phase deposition source material reloading and maintenance.
  73. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  74. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  75. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
  76. Kim, Sam Hyungsam; Lee, Jae-Chull; Sterling, William N.; Brown, Paul, Valve door with ball coupling.
  77. Scudder, Lance A.; Washington, Lori; Callaghan, Lori A.; Curelop, Bradley M., Wafer carrier.
  78. Nelson, Gordon R.; Davis, Jeffry A.; Thompson, Raymon F.; Bergman, Eric J., Wafer handling system.
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