[특허]Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations

Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	G02B-001/10 G02B-017/08 G02B-027/14 G02B-013/26
출원번호	US-0575043 (1990-08-28)
발명자 / 주소	Singh Rama N. (Bethel CT) Wilczynski Janusz S. (Ossining NY)
출원인 / 주소	International Business Machines Corporation (Armonk NY 02)
인용정보	피인용 횟수 : 74 인용 특허 : 0

초록 ▼

An optical system having a substantially flat image field is disclosed. The optical system is formed from optical subsystems wherein an input optical subsystem forms an intermediate image which is the object of an output optical system. The intermediate image has a curvature which compensates that from the remaining optical components of the system to result in a substantially flat image for the optical system. Preferably, the optical elements preceding the intermediate image and the optical elements succeeding the intermediate image are separately corrected for odd aberrations. The optical elements preceding the intermediate image and the optical elements succeeding the intermediate image compensate for each other and result in a substantially aberration free flat image for the optical system. The optical system preferably contains an input optical subsystem and an output optical subsystem wherein the input optical subsystem is a catadioptric system and wherein the output optical system is a dioptric system. Most preferably the input optical system is a 1X catadioptric system and the output optical system is an NX dioptric system. The optical systems of the present invention are used for subquarter micron photolithography tools for microelectronic fabrication, such as scanners and steppers.

대표청구항 ▼

An optical system for projecting a substantially flat image of an object comprising: an input subsystem; an output subsystem; the input subsystem and the output subsystem each being separately substantially corrected for odd aberrations; the even aberrations of the input subsystem substantially comp

이 특허를 인용한 특허 (74)

Shafer, David R.; Chuang, Yung-Ho, Broad band DUV, VUV long-working distance catadioptric imaging system.
상세보기
Shafer,David R.; Chuang,Yung Ho, Broad band DUV, VUV long-working distance catadioptric imaging system.
상세보기
Shafer, David R.; Chuang, Yung Ho; Armstrong, J. Joseph, Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system.
상세보기
Shafer David R. ; Chuang Yung-Ho ; Tsai Bin-Ming B., Broad spectrum ultraviolet catadioptric imaging system.
상세보기
Shafer David R. ; Chuang Yung-Ho ; Tsai Bin-Ming B., Broad spectrum ultraviolet catadioptric imaging system.
상세보기
Shafer David R. ; Chuang Yung-Ho ; Tsai Bin-Ming B., Broad spectrum ultraviolet inspection methods employing catadioptric imaging.
상세보기
Shafer David R. ; Chuang Yung-Ho ; Tsai Bin-Ming B., Broad spectrum ultraviolet inspection methods employing catadioptric imaging.
상세보기
Shafer, David R.; Chuang, Yung-Ho; Tsai, Bin-Ming B., Broad spectrum ultraviolet inspection systems employing catadioptric imaging.
상세보기
Shafer,David R.; Beierl,Helmut; F체rter,Gerhard; Schuster,Karl Heinz; Ulrich,Wilhelm, Catadioptric optical system and exposure apparatus having the same.
상세보기
Takahashi Tomowaki (Yokohama JPX), Catadioptric optical system and exposure apparatus having the same.
상세보기
Takahashi Tomowaki (Yokohama JPX), Catadioptric optical system and exposure apparatus having the same.
상세보기
Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Buenau, Rudolf Von; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
상세보기
Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Buenau, Rudolf Von; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
상세보기
Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Buenau, Rudolf Von; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
상세보기
Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
상세보기
Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
상세보기
Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
상세보기
Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
상세보기
Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective.
상세보기
Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Catadioptric projection objective.
상세보기
Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; Von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective including an aspherized plate.
상세보기
Wagner,Cristian; Gerhard,Michael; Richter,Gerald, Catadioptric projection objective with adaptive mirror and projection exposure method.
상세보기
Shafer,David R.; Epple,Alexander; Dodoc,Aurelian; Beierl,Helmut; Ulrich,Wilhelm, Catadioptric projection objective with geometric beam splitting.
상세보기
Shafer,David R.; Epple,Alexander; Dodoc,Aurelian; Beierl,Helmut; Ulrich,Wilhelm, Catadioptric projection objective with geometric beam splitting.
상세보기
Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
상세보기
Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
상세보기
Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
상세보기
Dodoc, Aurelian; Ulrich, Wilhelm; Epple, Alexander, Catadioptric projection objective with intermediate images.
상세보기
Shafer, David; Ulrich, Wilhelm; Dodoc, Aurelian; von Buenau, Rudolf Murai; Mann, Hans-Juergen; Epple, Alexander, Catadioptric projection objective with parallel, offset optical axes.
상세보기
Hudyma,Russell, Catadioptric projection system for 157 nm lithography.
상세보기
Hudyma,Russell, Catadioptric projection system for 157 nm lithography.
상세보기
Takahashi,Tomowaki, Catadioptric projection systems.
상세보기
Epple, Alexander; Beierl, Helmut, Catadioptric reduction lens.
상세보기
Epple,Alexander; Beierl,Helmut, Catadioptric reduction lens.
상세보기
Perrin, Jean Claude; Epple, Alexander; Ulrich, Wilhelm, Catadioptric reduction lens.
상세보기
Ulrich,Wilhelm; Shafer,David R.; Epple,Alexander; Beierl,Helmut; Dodoc,Aurelian, Catadioptric reduction lens.
상세보기
Ishiyama Toshiro (Kawasaki JPX) Suenaga Yutaka (Yokohama JPX), Catadioptric reduction projection optical system and exposure apparatus employing the same.
상세보기
Takahashi, Tomowaki, Catadioptric reduction projection optical system and exposure apparatus having the same.
상세보기
Thomas Perelli ; Craig J. Demko, Dolly having two supports hingedly joined together.
상세보기
Takahashi, Tomowaki, Dual-imaging optical system.
상세보기
Takahashi Tomowaki,JPX, Exposure apparatus having catadioptric projection optical system.
상세보기
Takahashi, Tomowaki, Exposure apparatus having catadioptric projection optical system.
상세보기
Takahashi,Tomowaki, Exposure apparatus having catadioptric projection optical system.
상세보기
Oskotsky,Mark L; Smirnov,Stanislav, High numerical aperture projection system and method for microlithography.
상세보기
Shafer, David R.; Chuang, Yung-Ho; Armstrong, J. Joseph, High performance catadioptric imaging system.
상세보기
Shafer,David R.; Chuang,Yung Ho; Armstrong,J. Joseph, High performance catadioptric imaging system.
상세보기
Shafer, David R.; Ulrich, Wilhelm; Dodoc, Aurelian; von Buenau, Rudolf M.; Mann, Hans-Juergen; Epple, Alexander; Beder, Susanne; Singer, Wolfgang, Immersion catadioptric projection objective having two intermediate images.
상세보기
Von Der Goenna, Gordon; Poehl, Karin; Martin, Regina; Parthier, Lutz, Method of testing optical materials by irradiating with high energy density radiation, optical materials selected by said method and uses thereof.
상세보기
Shafer, David R., Microlithographic reduction projection catadioptric objective.
상세보기
Shafer, David R.; Hudyma, Russell; Ulrich, Wilhelm, Microlithographic reduction projection catadioptric objective.
상세보기
Shafer, David R.; Hudyma, Russell; Ulrich, Wilhelm, Microlithographic reduction projection catadioptric objective.
상세보기
Shafer,David R.; Hudyma,Russell; Ulrich,Wilhelm, Microlithographic reduction projection catadioptric objective.
상세보기
Wagner,Cristian; Gerhard,Michael; Richter,Gerald, Microlithography projection objective including deformable mirror with adjusting elements and systems and methods using the same.
상세보기
Omura Yasuhiro,JPX ; Takahashi Tetsuo,JPX ; Ikeda Masatoshi,JPX ; Li Shiwen,JPX ; Ichihara Yutaka,JPX, Projection exposure apparatus and method.
상세보기
Omura, Yasuhiro, Projection exposure apparatus and method.
상세보기
Omura, Yasuhiro; Takahashi, Tetsuo; Ikeda, Masatoshi; Li, Shiwen, Projection exposure apparatus and method.
상세보기
Yasuhiro Omura JP; Yutaka Ichihara JP; Tetsuo Takahashi JP, Projection exposure apparatus and method.
상세보기
Omura, Yasuhiro; Ozawa, Toshihiko; Mori, Takashi; Komatsuda, Hideki, Projection exposure apparatus with a catadioptric projection optical system.
상세보기
Yasuhiro Omura JP; Toshihiko Ozawa JP; Takashi Mori JP; Hideki Komatsuda JP, Projection exposure apparatus with a catadioptric projection optical system.
상세보기
Mueller, Ralf, Projection objective and projection exposure apparatus for microlithography.
상세보기
Geh, Bernd, Projection objective for microlithography.
상세보기
Geh, Bernd, Projection objective for microlithography.
상세보기
Geh, Bernd, Projection objective for microlithography.
상세보기
Mann,Hans Juergen; Hudyma,Russell; Epple,Alexander, Projection objectives including a plurality of mirrors with lenses ahead of mirror M3.
상세보기
Mann,Hans Jurgen; Hudyma,Russell; Epple,Alexander, Projection objectives including a plurality of mirrors with lenses ahead of mirror M3.
상세보기
Hitoshi Matsuzawa JP; Misako Kobayashi JP; Kazumasa Endo JP; Yutaka Suenaga JP, Projection optical system and exposure apparatus using the same.
상세보기
Sasaya, Toshihiro; Ushida, Kazuo; Suenaga, Yutaka; Mercado, Romeo I., Projection optical system and projection exposure apparatus.
상세보기
Terasawa,Chiaki; Ishii,Hiroyuki; Kato,Takashi, Projection optical system and projection exposure apparatus.
상세보기
Terasawa,Chiaki; Ishii,Hiroyuki; Kato,Takashi, Projection optical system and projection exposure apparatus.
상세보기
Terasawa,Chiaki; Ishii,Hiroyuki; Kato,Takashi, Projection optical system and projection exposure apparatus.
상세보기
Terasawa,Chiaki; Ishii,Hiroyuki; Kato,Takashi, Projection optical system and projection exposure apparatus.
상세보기
Shafer,David, Projection system, in particular for a microlithographic projection exposure apparatus.
상세보기
Nakagiri Kunie (Hachioji JPX), Reduction projection lens system including refractive and diffractive optical elements.
상세보기
Ulrich,Wilhelm; Shafer,David; Bader,Dieter; Epple,Alexander, Refractive optical imaging system, in particular projection objective for microlithography.
상세보기

IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

내보내기 구분	파일저장 인쇄 메일전송
구성항목	기본정보 상세정보 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표IPC 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 공고번호, 공고일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표출원인, 출원인국적, 출원인주소, 발명자, 발명자E, 발명자코드, 발명자주소, 발명자 우편번호, 발명자국적, 대표IPC, IPC코드, 요약, 미국특허분류, 대리인주소, 대리인코드, 대리인(한글), 대리인(영문), 국제공개일자, 국제공개번호, 국제출원일자, 국제출원번호, 우선권, 우선권주장일, 우선권국가, 우선권출원번호, 원출원일자, 원출원번호, 지정국, Citing Patents, Cited Patents
저장형식	Text(ASCII format) Excel format PIAS분석(.xls)
메일정보	받는사람 (필수) @ 보내는사람 (선택) @ 제목 내용 KISTI 검색결과 이메일 서비스
안내	총 건의 자료가 검색되었습니다. 다운받으실 자료의 인덱스를 입력하세요. (1-10,000) 검색결과의 순서대로 최대 10,000건 까지 다운로드가 가능합니다. 데이타가 많을 경우 속도가 느려질 수 있습니다.(최대 2~3분 소요) 다운로드 파일은 UTF-8 형태로 저장됩니다. 파일의 내용이 제대로 보이지 않을실 때는 웹브라우저 상단의 보기 -> 인코딩 -> 자동선택 여부를 확인하십시오. ~ Text(ASCII format) Excel format

연합인증

Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

이 특허를 인용한 특허 (74)

관련 콘텐츠

특허 원문 보기

IPC 상위 출원인

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트

연합인증

Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

전체(0) 논문(0) 특허(0) 보고서(0)

전체(0) 논문(0) 특허(0) 보고서(0)

이 특허를 인용한 특허 (74)

관련 콘텐츠

특허 원문 보기

IPC 상위 출원인

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트