$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Illumination system and inspection apparatus including same

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G02B-006/32
출원번호 US-0565489 (1990-08-10)
발명자 / 주소
  • Katzir Yigal (Holon ILX)
출원인 / 주소
  • Orbot Systems Ltd. (ILX 03)
인용정보 피인용 횟수 : 78  인용 특허 : 0

초록

An illumination system particularly useful for inspecting a workpiece by an optic scanner includes darkfield illumination produced mainly by two elongate light sources each having a reflector focussing member and a lenticular lens sheet spreading the light from its light source over its reflector fo

대표청구항

An illumination system for an optic scanner particularly useful for illuminating a line to be scanned on the surface of a workpiece and aligned with the scanner optic axis, comprising: darkfield illumination means and brightfield illumination means for illuminating the line to be scanned; said darkf

이 특허를 인용한 특허 (78)

  1. Albert D. Edgar, Apparatus and method for defect channel nulling.
  2. Eidelman, Doron; Fisch, David; Noy, Amir; Gross, Avi, Apparatus and method for fabricating flat workpieces.
  3. Lebens, Gary A.; Bourn, Charles T.; Lemaire, Charles A., Apparatus and method for pulsed L.E.D. illumination.
  4. Martin Potucek ; Albert D. Edgar ; Darryl R. Polk, Apparatus and methods for capturing defect data.
  5. Nicolaides, Lena; Mahadevan, Mohan; Salnik, Alex; Young, Scott A., Apparatus and methods for combined brightfield, darkfield, and photothermal inspection.
  6. Lebens, Gary A.; Bourn, Charles T.; Lemaire, Charles A., Apparatus for L.E.D. illumination.
  7. Furman, Dov; Neumann, Gad; Wagner, Mark; Dotan, Noam; Segal, Ram; Silberstein, Shai, Apparatus for determining optimum position of focus of an imaging system.
  8. Berman Michael J., Automated endpoint detection system during chemical-mechanical polishing.
  9. Berman Michael J., Automated inspection system for residual metal after chemical-mechanical polishing.
  10. Gerber H. Joseph (West Hartford CT) Straayer Ronald J. (South Windsor CT) Davidson Bruce L. (East Hartford CT) Snietka Scott P. (Andover CT) Walsh Peter M. (South Windsor CT) Seniff Dana W. (South Gl, Automatic optical inspection system having a weighted transition database.
  11. Chuang, Yung-Ho; Armstrong, J. Joseph, Beam delivery system for laser dark-field illumination in a catadioptric optical system.
  12. Chuang,Yung Ho; Armstrong,J. Joseph, Beam delivery system for laser dark-field illumination in a catadioptric optical system.
  13. Gary A. Lebens ; Charles T. Bourn ; Charles A. Lemaire, Color-adjusted camera light and method.
  14. Haugan, Carl E.; Case, Steven K.; Kranz, David M.; Rose, Steven A.; Schoeneck, Mark R., Dark field illuminator with large working area.
  15. Gastaldo, Philippe; Pernot, Frederic, Dark-field semiconductor wafer inspection device.
  16. Ford,Gordon D.; Lester,Leland A.; Iglehart,David C., Distinguishing positive and negative films system and method.
  17. Furman, Dov; Neumann, Gad; Dotan, Noam, Fiber optical illumination system.
  18. Furman,Dov, Fiber optical illumination system.
  19. Furman,Dov; Neumann,Gad; Dotan,Noam, Fiber optical illumination system.
  20. Albert D. Edgar, Four color trilinear CCD scanning.
  21. Case, Steven K.; Liberty, Todd D.; Skunes, Timothy A.; Haugan, Carl E.; Chen, Chuanqi, High speed distributed optical sensor inspection system.
  22. Haugan, Carl E.; Case, Steven K.; Skunes, Timothy A., High speed optical inspection system with adaptive focusing.
  23. Case, Steven K.; Haugan, Carl E.; Rose, Steven A.; Kranz, David M., High speed optical inspection system with camera array and compact, integrated illuminator.
  24. Haugan, Carl E.; Skunes, Timothy A.; Haugen, Paul R.; Rudd, Eric P.; Caruso, Beverly, High speed, high resolution, three dimensional solar cell inspection system.
  25. Katzir, Yigal; Teichman, Eyal; Wechsler, Idit; Negry, Shabtai; Gross, Avraham; Arnon, Oded, Illuminator for inspecting substantially flat surfaces.
  26. Katzir,Yigal; Teichman,Eyal; Wechsler,Idit; Negry,Shabtai; Gross,Avraham; Arnon,Oded, Illuminator for inspecting substantially flat surfaces.
  27. Albert D. Edgar, Image defect correction in transform space.
  28. Lipson,Pamela R.; Ratan,Aparna; Srinivas,Chukka; Sinha,Pawan, Image processing system for use with inspection systems.
  29. Furman, Dov; Kaner, Roy; Gonen, Ori; Mandelik, Daniel; Tal, Eran; Silberstein, Shai, Image splitting in optical inspection systems.
  30. Furman, Dov; Silberstein, Shai; Miklatzky, Effy; Mandelik, Daniel; Abraham, Martin, Image splitting in optical inspection systems.
  31. Williamson James B., Imaging system using a compound elliptical concentrator.
  32. Ford, Gordon D., Lens focusing device, system and method for use with multiple light wavelengths.
  33. Edgar, Albert D., Luminance-priority electronic color image sensor.
  34. Lebens, Gary A.; Bourn, Charles T.; Lemaire, Charles A., Method and apparatus for a pulsed L.E.D. illumination source.
  35. Leonard, Patrick F., Method and apparatus for circuit pattern inspection.
  36. Ford, Gordon D., Method and apparatus for correcting heavily damaged images.
  37. Ford, Gordon D.; Lester, Leland A., Method and apparatus for correcting large defects in digital images.
  38. Sali, Erez; Yanir, Tomer; Wagner, Mark; Dotan, Noam; Dorfan, Yuval; Zaslavsky, Ran, Method and apparatus for detecting defects in wafers.
  39. Dorphan, Yuval; Zaslavsky, Ran; Wagner, Mark; Furman, Dov; Silberstein, Shai, Method and apparatus for detecting defects in wafers including alignment of the wafer images so as to induce the same smear in all images.
  40. Martin Potucek ; Albert D. Edgar ; Thomas A. Dundon, Method and apparatus for differential illumination image-capturing and defect handling.
  41. Ford, Gordon D.; Lester, Leland A.; Iglehart, David C., Method and apparatus for reducing the effect of bleed-through on captured images.
  42. Edgar, Albert D.; Penn, Steven C., Method and apparatus for scanning images.
  43. Albert D. Edgar ; Raymond S. Lee, Method and system for altering defects in a digital image.
  44. Edgar, Albert D.; Lee, Raymond S., Method and system for altering defects in a digital image.
  45. Lee, Raymond S., Method and system for altering defects in digital image.
  46. Ford, Gordon D.; Dundon, Thomas A.; Edgar, Albert D.; Potucek, Martin; Lee, Raymond S., Method and system for multi-sensor signal detection.
  47. Bareket, Noah; Desplat, Christian G.; Glasser, Lance A., Method for inspecting a reticle.
  48. Bradburn Graham,GBX, Method of illuminating a digital representation of an image.
  49. Edgar,Albert D., Method, system and software for correcting image defects.
  50. Shortt, David; Biellak, Stephen; Belyaev, Alexander, Methods and systems for inspection of a wafer.
  51. Furman,Dov; Dotan,Noam; Miklatzky,Efraim, Multi mode inspection method and apparatus.
  52. Edgar, Albert D.; Penn, Steven C., Multilinear array sensor with an infrared line.
  53. Anderson Charles H., Non-invasive inspection platen.
  54. Gold,Uri; Parente,Eli; Gilat Bernshtein,Tally; Baranovsky,Edward; Margalit,Tamir, Optical inspection system.
  55. Markwort, Lars; Chhibber, Rajeshwar, Optical inspection system and method.
  56. Markwort, Lars; Chhibber, Rajeshwar; Eckerl, Klaus; Harendt, Norbert, Optical inspection system and method.
  57. Markwort, Lars; Chhibber, Rajeshwar; Eckerl, Klaus; Harendt, Norbert, Optical inspection system and method.
  58. Schmidt, Peter E.; Lipson, Pamela R.; Bowman, John C., Optical system.
  59. Savareigo, Nissim, Post etch inspection system.
  60. Fuchs, Dan T.; Silberstein, Shai, Printed fourier filtering in optical inspection tools.
  61. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
  62. Lebens, Gary A.; Bourn, Charles T.; Lemaire, Charles A., Pulsed L.E.D. illumination.
  63. Mehdi Vaez-Iravani ; Stanley Stokowski ; Guoheng Zhao, Sample inspection system.
  64. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  65. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  66. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  67. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  68. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  69. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  70. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  71. Edgar, Albert D.; Dundon, Thomas A., System and method for correcting defects in digital images through selective fill-in from surrounding areas.
  72. Furman, Dov; Neumann, Gad; Wagner, Mark; Dotan, Noam; Segal, Ram; Silberstein, Shai, System for detection of wafer defects.
  73. Furman,Dov; Neumann,Gad; Wagner,Mark; Dotan,Noam; Segal,Ram; Silberstein,Shai, System for detection of wafer defects.
  74. Neumann,Gad; Dotan,Noam, System for detection of wafer defects.
  75. Furman, Dov; Neumann, Gad; Wagner, Mark; Dotan, Noam; Segal, Ram; Silberstein, Shai, System for detection of water defects.
  76. Biellak, Steve; Stokowski, Stanley E.; Vaez-Iravani, Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
  77. Biellak,Steve; Stokowski,Stanley E.; Vaez Iravani,Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
  78. Kurosawa, Toshirou; Katsuki, Yuzo; Takebayashi, Jun, Wafer defect inspection machine having a dual illumination system.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트