IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0286028
(1988-12-16)
|
발명자
/ 주소 |
- Lubowitz Hyman R. (Rolling Hills Estates CA) Sheppard Clyde H. (Bellevue WA) Stephenson Ronald R. (Kirkland WA)
|
출원인 / 주소 |
- The Boeing Company (Seattle WA 02)
|
인용정보 |
피인용 횟수 :
15 인용 특허 :
0 |
초록
▼
High thermal stabilities are achievable in linear or multidimensional sulfone, solvent resistant oligomers by incorporating oxazole, thiazole, or imidazole linkages into the oligomer backbone. Blended oligomers of crosslinking oligomers and noncrosslinking compatible polymers are also described. The
High thermal stabilities are achievable in linear or multidimensional sulfone, solvent resistant oligomers by incorporating oxazole, thiazole, or imidazole linkages into the oligomer backbone. Blended oligomers of crosslinking oligomers and noncrosslinking compatible polymers are also described. The oligomers include residues of four-functional compounds of the formula: [Figure] (or isomers thereof) wherein M=-CO-, -S-, -O-, -SO2-or -(CF3)2C-; and Y=-OH, -SH, or -NH2. In an improved method, the reactants are condensed at or below ambient temperature in the presence of pyridine in a suitable solvent such as N,N′-dimethylacetamide (DMAC).
대표청구항
▼
A blend comprising an oligomer and a compatible noncrosslinking polymer, wherein the oligomer is formed by reacting: (a) 2 moles of an unsaturated, crosslinking, phenylimide carboxylic acid halide of the general formula: [Figure] wherein [Figure] is a radical selected from the group consisting of: [
A blend comprising an oligomer and a compatible noncrosslinking polymer, wherein the oligomer is formed by reacting: (a) 2 moles of an unsaturated, crosslinking, phenylimide carboxylic acid halide of the general formula: [Figure] wherein [Figure] is a radical selected from the group consisting of: [Figure] [Figure] [Figure] [Figure] [Figure] [Figure] R1=lower alkyl, lower alkoxy, aryl, aryloxy, substituted alkyl, substituted aryl, halogen, or mixtures thereof; j=2, 1, or 2; G=-CH2-, -O-, -S-, or -SO2-; T=methallyl or allyl; Me=methyl; i=1 or 2; and X=halogen; (b) n moles of a diacid halide that includes terminal carboxylic acid halide functionalities attached at the ends of a compound residue selected from the group consisting of: (I) phenyl; (II) naphthyl; (III) biphenyl; (IV) a polyaryl “sulfone”divalent radical of the general formula: [Figure] [Figure] [Figure] wherein D1=-S-, -O-, -CO-, -SO2, -(CH3)2C-, -(CH3)2C-, or mixtures thereof throughout the chain; (V) a divalent radical having conductive linkages, illustrated by Schiff base compounds selected from the group consisting of: [Figure] [Figure] [Figure] [Figure] [Figure] wherein R2 is selected from the group consisting of: phenyl; biphenyl; naphthyl; or a divalent radical of the general formula: [Figure] wherein W=-SO2--CH2-; and q=0-4; or (VI) a divalent radical of the general formula: [Figure] wherein R1=a C2 to C12 divalent aliphatic, alicyclic, or aromatic radical; and (c) n+1 moles of at least one four-functional compound of the general formula: [Figure] wherein R is selected from the group consisting of compounds of the general formula: [Figure] wherein M=-CO-, -SO2-, -(CF3)2C-, -S-, or -O-; Y is selected from the group consisting of -OH, -SH, and -NH2; and n is an integer selected so that the oligomer has an average formula weight greater than about 500.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.