Resin composition curable with an active energy ray containing epoxy resin containing at least a compound having one or
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C08L-051/00
C08L-033/04
C08L-047/00
C08G-063/48
출원번호
US-0244339
(1988-09-15)
우선권정보
JP-0229492 (1987-09-16); JP-0159074 (1988-06-29)
발명자
/ 주소
Noguchi Hiromichi (Atsugi JPX)
출원인 / 주소
Canon Kabushiki Kaisha (Tokyo JPX 03)
인용정보
피인용 횟수 :
4인용 특허 :
0
초록▼
An improved active energy ray-curing resin composition comprising (i) a graft copolymerized polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 50,000 or less; (ii) a linear polymer having a number average molecular weight of 5,000 or more and a
An improved active energy ray-curing resin composition comprising (i) a graft copolymerized polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 50,000 or less; (ii) a linear polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 350,000 or less and having a glass transition temperature of 60°C. or more: (iii) an epoxy resin containing at least one compound having one or more epoxy groups in one molecule: and (iv) a polymerization initiator capable of generating a Lewis acid by irradiation of an active energy ray. The resin composition can be desirably cured with an active energy ray such as ultraviolet ray or electron beam and it is capable of being laminated in a desired pattern on a copper-coated laminate for use as a printed board or on a plate of metal, glass, ceramics or plastic.
대표청구항▼
A resin composition curable with an active energy ray comprising: (i) a graft copolymerized polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 50,000 or less which comprises a trunk chain composed mainly of structural units derived from at leas
A resin composition curable with an active energy ray comprising: (i) a graft copolymerized polymer having a number average molecular weight of 5,000 or more and a weight average molecular weight of 50,000 or less which comprises a trunk chain composed mainly of structural units derived from at least one monomer selected from the group consisting of alkyl methacrylates, acrylonitrile and styrene and has graft chains having structural units derived from at least one monomer selected from the group consisting of the monomers represented by the following formula I and other monomers presented by the formula II: [Figure] (I) [Figure] (II) (wherein R1 is hydrogen or an alkyl or hydroxyalkyl group having 1 to 3 carbon atoms, R2 is hydrogen or an alkyl or acyl group having 1 to 4 carbon atoms which may have hydroxy group, R3 is an alkyl group having 2 to 6 carbon atoms, a halogen-substituted alkyl group having 2 to 6 carbon atoms, an alkylether group represented by the formula: -CH2)nO-CH2)m (wherein 2≤m+n≤6, n≠0 and m≠0), or a phenylalkyl group represented by the formula: [Figure] (wherein 2≤m+n≤4, or the case where n=0 or m=0 is contained), added to said trunk chain; (ii) a linear polymer having a number average molecular weight of 50,000 or more and a weight average molecular weight of 350,000 or less and having a glass transition temperature of 60°C. or more which comprises structural units derived from at least one monomer selected from the group consisting of methyl methacrylate, ethyl methacrylate, isobutyl methacrylate, t-butyl methacrylate, benzyl methacrylate, acrylonitile, isobornyl methacrylate, isobornyl acrylate, tricyclodecaneacrylate, tricyclodecane methacrylate, tricyclodecaneoxyethyl methacrylate, styrene, dimethylaminoethyl methacrylate and cyclohexyl methacrylate and other structural units derived from at least one monomer in amounts from 5 to 30 mole percent selected from the group consisting of the monomers represented by said formula (I) and the monomers represented by said formula (II); (iii) an epoxy resin containing at least one compound having one or more epoxy groups in one molecule: and (iv) a polymerization initiator capable of generating a Lewis acid by irradiation of an active energy ray.
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이 특허를 인용한 특허 (4)
Kobayashi, Hironori; Uno, Yusuke, Method for manufacturing pattern formed structure.
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