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Positive and negative working radiation sensitive mixtures and production of relief patterns

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03C-007/039
  • G03C-007/038
출원번호 US-0352459 (1989-05-16)
우선권정보 DE-3817012 (1988-05-19)
발명자 / 주소
  • Schwalm Reinhold (Wachenheim DEX) Binder Horst (Lampertheim DEX)
출원인 / 주소
  • Keil & Weinkauf (Ludwigshafen DEX 03)
인용정보 피인용 횟수 : 41  인용 특허 : 0

초록 ▼

Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group

대표청구항 ▼

A radiation sensitive mixture containing (a) a polymeric binder and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, whe

이 특허를 인용한 특허 (41)

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  17. Pavelchek Edward K. ; DoCanto Manuel ; Adams Timothy G., High conformality antireflective coating compositions.
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  18. Pavelchek, Edward K.; DoCanto, Manuel; Adams, Timothy G., High conformality antireflective coating compositions.
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  20. Ishizuka, Keita; Wakiya, Kazumasa; Endo, Kotaro; Yoshida, Masaaki, Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective film.
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  21. Hozumi Shigeo,JPX ; Nakagawa Hiroya,JPX, Photoresist composition comprising a polyfunctional vinyl ether compound.
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  35. Houlihan,Francis M.; Dammel,Ralph R.; Romano,Andrew R.; Sakamuri,Raj, Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof.
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  36. Malik Sanjay ; Blakeney Andrew J. ; Ferreira Lawrence ; Sizensky Joseph J. ; Maxwell Brian E., Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations.
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  40. Binder Horst,DEX ; Schwalm Reinhold,DEX ; Funhoff Dirk,DEX, Radiation-sensitive mixture.
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  41. Kim Son Nguyen,DEX, Radiation-sensitive mixture.
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