이 특허를 인용한 특허 (54)

1. Bhatnagar Yashraj K., Apparatus and method for efficient and compact remote microwave plasma generation.

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2. Tanaka Tsutomu ; Kelkar Mukul ; Fairbairn Kevin ; Ponnekanti Hari ; Cheung David, Apparatus and methods for upgraded substrate processing system with microwave plasma source.

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3. Tanaka Tsutomu ; Kelkar Mukul ; Fairbairn Kevin ; Ponnekanti Hari ; Cheung David, Apparatus and methods for upgraded substrate processing system with microwave plasma source.

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4. Tsutomu Tanaka ; Mukul Kelkar ; Kevin Fairbairn ; Hari Ponnekanti ; David Cheung, Apparatus and methods for upgraded substrate processing system with microwave plasma source.

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5. David B. Noble ; Ravi Jallepally ; Nathan D'Astici ; Gary Miner ; Turgut Sahin ; Guangcai Xing ; Yashraj Bhatnagar, Apparatus for exposing a substrate to plasma radicals.

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6. Kao Chien-Teh ; Tsai Kenneth ; Pham Quyen ; Rose Ronald L. ; Augason Calvin R. ; Yudovsky Joseph, Apparatus for improved remote microwave plasma source for use with substrate processing systems.

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7. Takeuchi Koichiro,JPX ; Ueda Hirokazu,JPX ; Narai Akira,JPX, Chemical vapor deposition using inductively coupled plasma and system therefor.

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8. Raaijmakers, Ivo; Van Bilsen, Franciscus B., Cleaning of semiconductor processing chambers.

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9. Raaijmakers, Ivo; Van Bilsen, Franciscus B., Cleaning of semiconductor processing chambers.

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10. Kamarehi, Mohammad; Wang, Ing Yann Albert, Corrugated plasma trap arrangement for creating a highly efficient downstream microwave plasma system.

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11. Wartski Louis (Montrouge FRX) Aubert Jean (Saint-Remy-les-Chevreuse FRX), Device and method for forming a plasma by application of microwaves.

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12. Winters Toby J., Downstream plasma reactor system incorporating a plasma-resistant blocking member.

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13. Gorin Georges J., Downstream plasma using oxygen gas mixtures.

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14. Mohammad Kamarehi ; Gerald M. Cox, Downstream sapphire elbow joint for remote plasma generator.

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15. Moslehi, Mehrdad M.; Davis, Cecil J., Edge sealing structure for substrate in low-pressure processing environment.

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16. Verdeyen, Joseph T.; Johnson, Wayne L.; Sirkis, Murray D., Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma.

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17. Verdeyen, Joseph T.; Johnson, Wayne L.; Sirkis, Murray D., Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma.

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18. McGuire, Gary Elder, Electronic amplifier device.

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19. Huseinovic, Armin; Berry, Ivan L., Fluid distribution members and/or assemblies.

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20. Ettinger Gary C. ; Shang Quanyuan ; Law Kam S., High power microwave plasma applicator.

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21. Wang, Ing-Yann Albert; Kamarehi, Mohammad, Highly efficient gas distribution arrangement for plasma tube of a plasma processing chamber.

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22. Sandhu Gurtej S. ; Buley Todd W., Low-pressure chemical vapor deposition process for depositing high-density highly-conformal, titanium nitride films of.

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23. Zhu, Zhen-Dong; Li, Qun-Qing; Zhang, Li-Hui; Chen, Mo; Fan, Shou-Shan, Manufacturing method of grating.

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24. Iseda, Seiji, Method and apparatus for etching a structure in a plasma chamber.

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25. Powell, Gary, Method and device utilizing real-time gas sampling.

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26. McDonald, R. Mike, Method and system for operating a mass flow controller.

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27. Gevelber Michael A. ; Toledo-Quinones Manuel, Method for closed loop control of chemical vapor deposition process.

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28. Kao Chien-Teh ; Tsai Kenneth ; Pham Quyen ; Rose Ronald L. ; Augason Calvin R. ; Yudovsky Joseph, Method for improved remote microwave plasma source for use with substrate processing system.

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29. Eriguchi Koji,JPX, Method of monitoring deposit in chamber, method of plasma processing, method of dry-cleaning chamber, and semiconductor.

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30. M'Saad Hichem,FRX, Methods and apparatus for forming HDP-CVD PSG film used for advanced pre-metal dielectric layer applications.

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31. Fong Gary ; Chang Fong ; Nguyen Long, Methods and apparatus for pre-stabilized plasma generation for microwave clean applications.

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32. Kamarehi, Mohammad; Wang, Ing Yann Albert, Methods and arrangement for implementing highly efficient plasma traps.

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33. Kamarehi, Mohammad; Wang, Ing-Yann Albert, Methods for implementing highly efficient plasma traps.

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34. Kamarehi Mohammad ; Cox Gerald M., Microwave choke for remote plasma generator.

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35. Tanaka Tsutomu ; Nowak Thomas ; Nguyen Chau ; Ponnekanti Hari ; Fairbairn Kevin, Microwave plasma generating apparatus with improved heat protection of sealing O-rings.

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36. Srivastava Aseem K. ; Pingree Richard E. ; Pellicier Victor, Plasma discharge device with dynamic tuning by a movable microwave trap.

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37. Yanagisawa Michihiko,JPX ; Iida Shinya,JPX, Plasma etching apparatus.

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38. Yorozuya, Shunichi, Plasma film forming apparatus.

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39. Reder,Steven E.; Pillow,Preston E., Reactor system.

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40. Roth, J. Reece, Remote exposure of workpieces using a plasma.

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41. J. Reece Roth, Remote exposure of workpieces using a recirculated plasma.

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42. Rajagopalan Ravi ; Liu Patricia M. ; Narwankar Pravin K. ; Tran Huyen ; Krishnaraj Padmanabhan ; Ablao Alan ; Casper Tim, Remote plasma cleaning method for processing chambers.

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43. Mohammad Kamarehi ; Gerald M. Cox, Remote plasma generator with sliding short tuner.

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44. Mohammad Kamarehi ; Gerald M. Cox, Remote plasma mixer.

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45. Huo David Datong, Restrictor shield having a variable effective throughout area.

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46. Turner Terry R. ; Belcher James F. ; Andrews Gary W., Retractable probe system with in situ fabrication environment process parameter sensing.

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47. Turner Terry R. ; Belcher James F. ; Andrews Gary W., Retractable probe system with in situ fabrication environment process parameter sensing.

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48. Sirkis, Murray D.; Verdeyen, Joseph T., Stabilized oscillator circuit for plasma density measurement.

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49. Sirkis, Murray D.; Verdeyen, Joseph T., Stabilized oscillator circuit for plasma density measurement.

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50. Shang Quanyuan ; Sun Sheng ; Law Kam S. ; Beer Emanuel, Surface-treated shower head for use in a substrate processing chamber.

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51. Mundt Randall S., Temperature mapping method.

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52. Linthorst, Eric J., Tunable ramp rate circuit for a mass flow controller.

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53. John V. Schmitt, Uniform heat trace and secondary containment for delivery lines for processing system.

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54. Schmitt John V., Uniform heat trace and secondary containment for delivery lines for processing system.

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