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Method for preparing vaporized reactants for chemical vapor deposition 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C03C-017/245
출원번호 US-0591121 (1990-10-04)
발명자 / 주소
  • Soubeyrand Michel J. (Perrysburg OH) McCurdy Richard J. (Toledo OH)
출원인 / 주소
  • Libbey-Owens-Ford Co. (Toledo OH 02)
인용정보 피인용 횟수 : 60  인용 특허 : 0

초록

Vaporized reactants, useful for chemical vapor deposition of a coating on the surface of a hot substrate, are prepared by initially heating a liquid coating precursor, injecting the liquid coating precursor into a vaporization chamber, simultaneously admitting a blend gas into the vaporization chamb

대표청구항

A process for preparing vaporized reactants, comprising the steps of: A) providing a coating precursor selected from metal or silicon compounds at a temperature above its melting point but substantially below its standard vaporization temperature, thereby causing the coating precursor to be in the f

이 특허를 인용한 특허 (60)

  1. Gealy, Dan; Weimer, Ronald A., Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers.
  2. Carpenter,Craig M.; Mardian,Allen P.; Dando,Ross S.; Tschepen,Kimberly R.; Derderian,Garo J., Apparatus and method for depositing materials onto microelectronic workpieces.
  3. Mardian, Allen P.; Rodriguez, Santiago R., Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes.
  4. Derderian,Garo J., Apparatus and methods for plasma vapor deposition processes.
  5. Carpenter,Craig M.; Dando,Ross S.; Mardian,Allen P., Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces.
  6. Tasaki Yuzo,JPX ; Sato Mamoru,JPX ; Yoshizawa Shuji,JPX, CVD precursors and film preparation method using the same.
  7. Tasaki Yuzo,JPX ; Sato Mamoru,JPX ; Yoshizawa Shuji,JPX, CVD precursors and film preparation method using the same.
  8. Donald L. Westmoreland ; Gurtej S. Sandhu, Chemical vapor deposition apparatus with liquid feed.
  9. Dye,David Forrest; Ackerman,John Frederick; Gupta,Bhupendra Kumar; Pinson,Jennifer Ann; Pothier,Brian Thomas; Reynolds,Anthony Wayne, Coating system and process and apparatus for depositing a coating system.
  10. Krisko,Annette J.; Hartig,Klaus, Graded photocatalytic coatings.
  11. Westmoreland,Donald L.; Sandhu,Gurtej S., High efficiency method for performing a chemical vapordeposition utilizing a nonvolatile precursor.
  12. O'Shaughnessy, Roger D.; Krisko, Annette J.; Hartig, Klaus, Hydrophilic surfaces carrying temporary protective covers.
  13. O'Shaughnessy,Roger D.; Krisko,Annette J.; Hartig,Klaus, Hydrophilic surfaces carrying temporary protective covers.
  14. Larkin William Albert, Liquid methyltin halide compositions.
  15. Abrams, Michael B.; Korotkov, Roman Y.; Silverman, Gary S.; Smith, Ryan C.; Stricker, Jeffery L., Low temperature method of making a zinc oxide coated article and the coated article made thereby.
  16. Krisko, Annette J.; Bond, Bob; Stanek, Roger; Pfaff, Gary; Hartig, Klaus, Low-emissivity, soil-resistant coating for glass surfaces.
  17. Myli, Kari B.; Krisko, Annette J.; German, John R.; Hartig, Klaus, Low-maintenance coating technology.
  18. Krisko, Annette J.; Myli, Kari B.; Pfaff, Gary L.; Brownlee, James E., Low-maintenance coatings.
  19. Krisko, Annette J.; Myli, Kari B.; Pfaff, Gary L.; Brownlee, James E., Low-maintenance coatings.
  20. Krisko, Annette J.; Myli, Kari; Pfaff, Gary L.; Brownlee, James, Low-maintenance coatings.
  21. Krisko, Annette J.; Myli, Kari; Pfaff, Gary L.; Brownlee, James, Low-maintenance coatings.
  22. Myli, Kari B.; Krisko, Annette J.; Brownlee, James E.; Pfaff, Gary L., Low-maintenance coatings, and methods for producing low-maintenance coatings.
  23. Hidetoshi Saitoh JP; Shigeo Ohshio JP; Norio Tanaka JP; Hideki Sunayama JP, Material having titanium dioxide crystalline orientation film and method for producing the same.
  24. Nelson, Douglas M., Method and apparatus for preparing vaporized reactants for chemical vapor deposition.
  25. Senateur Jean-Pierre,FRX ; Madar Roland,FRX ; Weiss Francois,FRX ; Thomas Olivier,FRX ; Abrutis Adulfas,FRX, Method and device for introducing precursors into chamber for chemical vapor deposition.
  26. Baumann, Peter; Lindner, Johannes, Method for self-limiting deposition of one or more monolayers.
  27. Alasti Perry, Method for the concentration and separation of sterols.
  28. Galante, Marco; Arimondi, Marco; Roba, Giacomo Stefano; Santi, Ilenia, Method for vaporizing a liquid reactant in manufacturing a glass preform.
  29. McCurdy Richard J. ; Strickler David A. ; Sanderson Kevin D.,GBX, Method of coating flat glass with indium oxide.
  30. Williams Richard R. (Wilmington NC), Method of providing vaporized halide-free, silicon-containing compounds.
  31. Kyu Hong Lee KR, Method of vaporizing liquid sources and apparatus therefor.
  32. Zheng,Lingyi A.; Doan,Trung T.; Breiner,Lyle D.; Ping,Er Xuan; Beaman,Kevin L.; Weimer,Ronald A.; Kubista,David J.; Basceri,Cem, Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces.
  33. Beaman,Kevin L.; Weimer,Ronald A.; Breiner,Lyle D.; Ping,Er Xuan; Doan,Trung T.; Basceri,Cem; Kubista,David J.; Zheng,Lingyi A., Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers.
  34. Carpenter,Craig M.; Dando,Ross S.; Gealy,Dan; Derderian,Garo J.; Mardian,Allen P., Methods and apparatus for vapor processing of micro-device workpieces.
  35. Krisko,Annette J.; Bond,Bob; Stanek,Roger; Pfaff,Gary; Hartig,Klaus, Methods and apparatuses for depositing film on both sides of a pane.
  36. Myli, Kari; Pfaff, Gary; Brownlee, James; German, John; Krisko, Annette; Hartig, Klaus, Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films.
  37. Beaman, Kevin L.; Doan, Trung T.; Breiner, Lyle D.; Weimer, Ronald A.; Ping, Er-Xuan; Kubista, David J.; Basceri, Cem; Zheng, Lingyi A., Methods and systems for controlling temperature during microfeature workpiece processing, E.G. CVD deposition.
  38. Beaman, Kevin L.; Doan, Trung T.; Breiner, Lyle D.; Weimer, Ronald A.; Ping, Er-Xuan; Kubista, David J.; Basceri, Cem; Zheng, Lingyi A., Methods and systems for controlling temperature during microfeature workpiece processing, E.G., CVD deposition.
  39. Beaman,Kevin L.; Doan,Trung T.; Breiner,Lyle D.; Weimer,Ronald A.; Ping,Er Xuan; Kubista,David J.; Basceri,Cem; Zheng,Lingyi A., Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition.
  40. Carpenter,Craig M.; Dynka,Danny, Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers.
  41. Dando, Ross S.; Gealy, Dan, Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces.
  42. Dando, Ross S.; Gealy, Dan, Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces.
  43. Basceri,Cem; Doan,Trung T.; Weimer,Ronald A.; Beaman,Kevin L.; Breiner,Lyle D.; Zheng,Lingyi A.; Ping,Er Xuan; Sarigiannis,Demetrius; Kubista,David J., Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces.
  44. Krisko, Annette J.; Myli, Kari B.; Pfaff, Gary L.; Brownlee, James, Opposed functional coatings having comparable single surface reflectances.
  45. Carpenter,Craig M.; Dando,Ross S.; Dynka,Danny, Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.
  46. Dando, Ross S., Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces.
  47. Miller, Matthew W.; Basceri, Cem, Reactors, systems and methods for depositing thin films onto microfeature workpieces.
  48. Krisko, Annette J.; Bond, Bob; Stanek, Roger; Pfaff, Gary; Hartig, Klaus, Soil-resistant coating for glass surfaces.
  49. Krisko, Annette J.; Hartig, Klaus; O'Shaughnessy, Roger D., Soil-resistant coating for glass surfaces.
  50. Krisko, Annette; Hartig, Klaus; O'Shaughnessy, Roger D., Soil-resistant coating for glass surfaces.
  51. Krisko,Annette J.; Bond,Bob; Stanek,Roger; Pfaff,Gary; Hartig,Klaus, Soil-resistant coating for glass surfaces.
  52. Brabender, Dennis M; Kokoschke, Jeffrey L, Sputtering apparatus including target mounting and control.
  53. Sarigiannis,Demetrius; Meng,Shuang; Derderian,Garo J., Systems and methods for depositing material onto microfeature workpieces in reaction chambers.
  54. Lyons, Christopher S.; Engle, Kent T.; Vanhoose, Steven R.; Spawn, Terence D.; Pieper, Joseph M.; Anderson, Edward J.; Stoss, Walter, Systems and methods for processing vapor.
  55. O'Shaughnessy, Roger D.; Krisko, Annette J.; Hartig, Klaus, Temporary protective covers.
  56. Poshusta, Joseph C.; Bruinsma, Douwe, Thin film vaporizer.
  57. Lyons Christopher S. ; Ruta Constantin I. ; Fleming Robert J. ; Blette Russell E., Vapor coating apparatus.
  58. Lyons Christopher S. ; Ruta Constantin I. ; Fleming Robert J. ; Blette Russell E. ; Wright Robin E. ; Tokie Jeffrey H., Vapor coating method.
  59. Gahan, Richard E.; Choi, Wai Ming, Vapor deposition treated electret filter media.
  60. Wang Yuchun, Vapor phase deposition.
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