$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Electrically-conductive, light-attenuating antireflection coating 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C03C-017/34
출원번호 US-0566052 (1990-08-10)
발명자 / 주소
  • Biornard Erik J. (Northfield MN)
출원인 / 주소
  • Viratec Thin Films, Inc. (Faribault MN 02)
인용정보 피인용 횟수 : 85  인용 특허 : 0

초록

A coating for an article comprising layers of nitrides of certain transition metals to provide an electrically-conductive, light-attenuating, antireflection surface.

대표청구항

A coating for an article, comprising: a group of three layers wherein two of said layers substantially include a transition metal nitride, each of said two layers having a thickness between about 5 nm and 40 nm, and a third layer between said two layers, said third layer including a material substan

이 특허를 인용한 특허 (85)

  1. Klinger Robert E. ; Solberg Scott E., Absorbing anti-reflection coatings for computer displays.
  2. Chang, Cheng-Chieh, Anti-reflection coating with low resistivity function and transparent conductive coating as outermost layer.
  3. Chu, Jau-Jier, Anti-reflection coating with transparent surface conductive layer.
  4. Dannenberg, Rand David, Anti-reflection coatings and associated methods.
  5. Lippey Barret,JPX ; Ishikawa Hiroichi,JPX, Anti-reflection film.
  6. Tsujita Kouichirou,JPX, Anti-reflection film and method of manufacturing.
  7. Jau-Jier Chu TW; Chao-Sung Li TW; Cheng Chen Shih TW; Shao Chi Chang TW, Anti-reflection high conductivity multi-layer coating for flat CRT products.
  8. Jau-Jier Chu TW; Jau-Sung Lee TW, Anti-reflection high conductivity multi-layer coating on CRT surface made by vacuum sputtering and wet coating.
  9. Bjornard Erik J. (Northfield MN) Meredith ; Jr. William A. (Faribault MN), Antireflection coating for a temperature sensitive substrate.
  10. Bjornard,Erik J.; Meredith, Jr.,William A., Antireflection coating for a temperature sensitive substrate.
  11. Kawashima, Toshitaka; Kubota, Shigeo; Eguchi, Naoya; Tatsuki, Koichi; Ohsako, Junichi, Antireflection film.
  12. Jacobs, Simon Joshua; Dewald, Duane Scott; Files, Leigh A.; Bartlett, Terry A., Antireflective coating.
  13. Jacobs, Simon Joshua; Dewald, Duane Scott; Files, Leigh A.; Bartlett, Terry A., Antireflective coating.
  14. Invie Judith M. ; Pellerite Mark J., Antisoiling coatings for antireflective surfaces and methods of preparation.
  15. Pellerite Mark J. ; Invie Judith M. ; Zhu Dong-Wei, Antisoiling coatings for antireflective surfaces and methods of preparation.
  16. Laird Ronald E. ; Carniglia Charles K., Broad-band antireflection coating having four sputtered layers.
  17. Sanduja Mohan L. ; Horowitz Carl ; Thomas Abraham ; Thottathil Paul, Coating for glass substrate for anti-reflective properties with abrasion, chemical and UV resistance.
  18. Jau-Jier Chu TW; Jau-Sung Lee TW; Cheng-Chen Shih TW; Shao-Chi Chang TW, Combination process of vacuum sputtering and wet coating for high conductivity and light attenuation anti-reflection coating on CRT surface.
  19. Stollenwerk, Johannes; Kl?ppel, Andreas; Bender, Marcus, Conductive transparent layers and method for their production.
  20. Dickey Eric R. (18155 NW. Cambray St Beaverton OR 97006), D.C. reactively sputtered antireflection coatings.
  21. Floyd Eugene Woodard ; Yisheng Dai SG, Dual titanium nitride layers for solar control.
  22. Woodard Floyd Eugene ; Dai Yisheng,SGX, Dual titanium nitride layers for solar control.
  23. Wolfe Jesse D. (San Ramon CA) Belkind Abraham I. (North Plainfield NJ) Laird Ronald E. (Benecia CA), Durable low-emissivity solar control thin film coating.
  24. Miller, Steven A.; Gaydos, Mark; Shekhter, Leonid N.; Gulsoy, Gokce, Dynamic dehydriding of refractory metal powders.
  25. Miller, Steven A.; Gaydos, Mark; Shekhter, Leonid N.; Gulsoy, Gokce, Dynamic dehydriding of refractory metal powders.
  26. Miller, Steven A.; Gaydos, Mark; Shekhter, Leonid N.; Gulsoy, Gokce, Dynamic dehydriding of refractory metal powders.
  27. Okaniwa Masayuki (Ohmiya JPX), Electroconductive antireflection film.
  28. Fleming,Robert James, Enhanced heat mirror films.
  29. Fleming, Robert James; Bright, Clark Ivan; Lyons, Christopher Stewart, Extensible, visible light-transmissive and infrared-reflective film and methods of making and using the film.
  30. Miller, Steven A.; Kumar, Prabhat; Wu, Richard; Sun, Shuwei; Zimmermann, Stefan; Schmidt-Park, Olaf, Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefrom.
  31. Fleming, Robert James; Lyons, Christopher Stewart; Bright, Clark Ivan; Anderson, Edward John; Koster, Brian Leroy; Zelinsky, Maria Lenni, Flexible electrically conductive film.
  32. Fleming,Robert James; Lyons,Christopher Stewart; Bright,Clark Ivan; Anderson,Edward John; Koster,Brian Leroy; Zelinsky,Maria Lenni, Flexible electrically conductive film.
  33. Tsuruoka, Kazuyuki, Grid polarizing element and apparatus for emitting polarized UV light.
  34. Stachowiak, Grzegorz, Heat treatable coated article with niobium zirconium inclusive IR reflecting layer and method of making same.
  35. Kelly, James J.; Vo, Tuan Anh, Hybrid hard mask for damascene and dual damascene.
  36. Dary, Francois-Charles; Gaydos, Mark; Loewenthal, William; Miller, Steven A.; Rozak, Gary; Volchko, Scott Jeffrey; Zimmermann, Stefan; Stawovy, Michael Thomas, Large-area sputtering targets.
  37. Koulikov, Serguei, Laser beam stop elements and spectroscopy systems including the same.
  38. Oyama Takuji (Yokohama JPX) Katayama Yoshihito (Funabashi JPX), Light absorptive antireflector.
  39. Oyama Takuji,JPX ; Katayama Yoshihito,JPX, Light absorptive antireflector.
  40. Ueki,Nobuaki, Light intensity ratio adjustment filter for an interferometer, interferometer, and light interference measurement method.
  41. Edelstein, Daniel C.; Morris, Bryan G.; Vo, Tuan A.; Waskiewicz, Christopher J.; Yin, Yunpeng, Lithographic material stack including a metal-compound hard mask.
  42. Lugg Paul S. ; Budd Kenton D. ; Bailey John E. ; Frey Matthew H. ; Theirl Scott G., Low reflectivity contrast enhancement filter.
  43. Miller, Steven A.; Kumar, Prabhat, Low-energy method of manufacturing bulk metallic structures with submicron grain sizes.
  44. Zimmermann, Stefan; Papp, Uwe; Kreye, Heinrich; Schmidt, Tobias, Method for coating a substrate surface and coated product.
  45. Bright Clark I. ; Woodard F. Eugene ; Pace Steven J. ; Kozak Julius G., Method of making antireflective coatings.
  46. Lee Kan-Yuan,TWX ; Horng Weiching,TWX ; Ko Joe,TWX ; Hong Gary,TWX, Method of stabilizing anti-reflection coating layer.
  47. Adair Robert W. ; Le Febvre Paul M. ; Kurman Eric W., Methods and apparatus for providing an absorbing, broad band, low brightness, antireflection coating.
  48. Miller, Steven A.; Schmidt-Park, Olaf; Kumar, Prabhat; Wu, Richard; Sun, Shuwei; Zimmermann, Stefan, Methods of forming sputtering targets.
  49. Miller, Steven A.; Shekhter, Leonid N.; Zimmerman, Stefan, Methods of joining metallic protective layers.
  50. Miller, Steven A.; Shekhter, Leonid N.; Zimmermann, Stefan, Methods of joining metallic protective layers.
  51. Miller, Steven A.; Shekhter, Leonid N.; Zimmermann, Stefan, Methods of joining metallic protective layers.
  52. Miller, Steven A.; Shekhter, Leonid N.; Zimmerman, Stefan, Methods of joining protective metal-clad structures.
  53. Volchko, Scott Jeffrey; Zimmermann, Stefan; Miller, Steven A.; Stawovy, Michael Thomas, Methods of manufacturing high-strength large-area sputtering targets.
  54. Loewenthal, William; Miller, Steven Alfred, Methods of manufacturing large-area sputtering targets.
  55. Miller, Steven A.; Dary, Francois-Charles; Gaydos, Mark; Rozak, Gary, Methods of manufacturing large-area sputtering targets by cold spray.
  56. Volchko, Scott Jeffrey; Loewenthal, William; Zimmermann, Stefan; Gaydos, Mark; Miller, Steven Alfred, Methods of manufacturing large-area sputtering targets using interlocking joints.
  57. Volchko, Scott Jeffrey; Loewenthal, William; Zimmermann, Stefan; Gaydos, Mark; Miller, Steven Alfred, Methods of manufacturing large-area sputtering targets using interlocking joints.
  58. Miller, Steven A.; Kumar, Prabhat; Wu, Rong-chein Richard; Sun, Shuwei; Zimmermann, Stefan; Schmidt-Park, Olaf, Methods of rejuvenating sputtering targets.
  59. Miller, Steven A.; Schmidt-Park, Olaf; Kumar, Prabhat; Wu, Richard; Sun, Shuwei; Zimmerman, Stefan, Methods of rejuvenating sputtering targets.
  60. Woodard Floyd Eugene ; Bright Clark I., Multilayer absorbing antireflective coating.
  61. Kumagai Hiroshi,JPX ; Toyoda Kouichi,JPX, Multilayer film structure for soft X-ray optical elements.
  62. Stoss, Walter; Bright, Clark I., Nucleation layer for thin film metal layer formation.
  63. Lage Craig S. ; Bhat Mousumi ; Lii Yeong-Jyh Tom ; Nagy Andrew G. ; Frisa Larry E.,DEX ; Filipiak Stanley M. ; O'Meara David L. ; Ong T. P. ; Woo Michael P. ; Sparks Terry G. ; Gelatos Carol M., Process for forming a semiconductor device having an interconnect or conductive film electrically insulated from a conductive member or region.
  64. Filipiak Stanley M. ; White Ted R. ; Ong T. P. ; Lin Jung-Hui ; Paulson Wayne M. ; Roman Bernard J., Process for forming a semiconductor device with an antireflective layer.
  65. Shekhter, Leonid N.; Miller, Steven A.; Haywiser, Leah F.; Wu, Rong-Chein R., Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof.
  66. Shekhter, Leonid N.; Miller, Steven A.; Haywiser, Leah F.; Wu, Rong-Chein Richard, Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof.
  67. Miller, Steven A.; Shekhter, Leonid N.; Zimmerman, Stefan, Protective metal-clad structures.
  68. Wysocki, Paul F.; Heaney, Alan; Kreger, Stephen; Froggatt, Mark; Walker, Ken, Reducing reflection at termination of optical fiber in a small volume.
  69. Lage, Craig S.; Bhat, Mousumi; Lii, Yeong-Jyh Tom; Nagy, Andrew G.; Frisa, Larry E.; Filipiak, Stanley M.; O'Meara, David L.; Ong, T. P.; Woo, Michael P.; Sparks, Terry G.; Gelatos, Carol M., Semiconductor device, memory cell, and processes for forming them.
  70. Ngan Kenny King-tai ; Ramaswami Seshadri, Smooth titanium nitride films having low resistivity.
  71. Chrobak, Christopher P.; Fomenkov, Igor V., Systems and methods for collector mirror temperature control using direct contact heat transfer.
  72. Chavez, Juan Armando; Bowering, Norbert R., Systems and methods for heating an EUV collector mirror.
  73. Bond, Robert; Stanek, Roger P.; Hoffman, Wayne, Transparent article having protective silicon nitride film.
  74. Bond, Robert; Stanek, Roger P.; Hoffman, Wayne, Transparent article having protective silicon nitride film.
  75. Bond,Robert; Stanek,Roger P.; Hoffman,Wayne L., Transparent article having protective silicon nitride film.
  76. Bright, Clark I., Transparent conductive articles and methods of making same.
  77. Bright, Clark I., Transparent conductive articles and methods of making same.
  78. Bright,Clark I., Transparent conductive articles and methods of making same.
  79. Bright,Clark I., Transparent conductive oxides for plastic flat panel displays.
  80. Georgson,Mikael; Staaf,횜rjan, Transparent pane with radar-reflecting properties.
  81. Andreani Fabrizio,ITX ; Barbieri Lino,ITX, Transparent photochromic article including an anti-reflection surface coating.
  82. Bright, Clark I.; Le, John D.; Fitzer, Robert C.; Maki, Stephen P., Ultrathin transparent EMI shielding film comprising a polymer basecoat and crosslinked polymer transparent dielectric layer.
  83. Lechman John N. (Effingham IL), Underdesk computer desk structure with antireflecting viewing window.
  84. Bandettini Steven P. ; Brown Lindsey ; Hichwa Bryant P. ; Cumbo Michael J. ; Mathew J. Gordon H. ; O'Brien Nada A., Variably adjustable contrast enhancement electrochromic panel adapted for curved display screens and methods of making.
  85. Fisher Donald S., Window that transmits light energy and selectively absorbs microwave energy.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로