IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0181013
(1988-04-13)
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발명자
/ 주소 |
- Sheppard Clyde H. (Bellevue WA) Lubowitz Hyman R. (Rolling Hills Estates CA)
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출원인 / 주소 |
- The Boeing Company (Seattle WA 02)
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인용정보 |
피인용 횟수 :
26 인용 특허 :
0 |
초록
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The solvent-resistance and thermal stability of polyamideimides of the general formulae: [Figure] [Figure] is improved by capping the amideimides with a crosslinking functionality (Y) containing a residue selected from the group of: [Figure] [Figure] [Figure] wherein R1=lower alkyl, lower alkoxy, ar
The solvent-resistance and thermal stability of polyamideimides of the general formulae: [Figure] [Figure] is improved by capping the amideimides with a crosslinking functionality (Y) containing a residue selected from the group of: [Figure] [Figure] [Figure] wherein R1=lower alkyl, lower alkoxy, aryl, aryloxy, substituted alkyl, substituted aryl (either including hydroxyl or halo-substituents), halogen, or mixtures thereof; j=0, 1, or 2; G=-CH2-, -O-, -S-, -SO2-, -SO-, -CO-, -CHR-, or -CR2-; R=hydrogen, lower alkyl, or phenyl; T=methallyl or allyl; Me=methyl; R2=a trivalent organic radical; and R3=a divalent organic radical. The amideimide oligomers may be linear or multidimensional, and can be processed into blends, prepregs, or composites. Methods of making these amideimides and intermediates useful in the syntheses are also described.
대표청구항
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A polyamideimide oligomer, comprising an oligomer selected from the group consisting of: [Figure] (a) [Figure] (b) [Figure] (c) [Figure] (d) [Figure] (e) [Figure] (f) [Figure] (g) [Figure] (h) [Figure] (i) [Figure] (j) [Figure] (k) [Figure] (l) [Figure] (m) [Figure] (n) [Figure] (o) [Figure] (p) [Fi
A polyamideimide oligomer, comprising an oligomer selected from the group consisting of: [Figure] (a) [Figure] (b) [Figure] (c) [Figure] (d) [Figure] (e) [Figure] (f) [Figure] (g) [Figure] (h) [Figure] (i) [Figure] (j) [Figure] (k) [Figure] (l) [Figure] (m) [Figure] (n) [Figure] (o) [Figure] (p) [Figure] (q) [Figure] (r) [Figure] (s) [Figure] (t) wherein Y= [Figure] [Figure] [Figure] wherein R1=lower alkyl, lower alkoxy, aryl, aryloxy, substituted alkyl, substituted aryl, halogen, or mixtures thereof; j=0, 1, or 2; G=-CH2-, -O-, -S-, -SO2-, -SO-, -CO-, -CHR-, or -CR2-; T=methallyl or allyl; Me=methyl; R=hydrogen, lower alkyl, or phenyl; R2=a trivalen organic radical; R3=a divalent organic radical; R4=a divalent organic radical; m=a small integer; i=1 or 2; Ar=an aromatic radical of valency w; and w=3 or 4.
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