이 특허를 인용한 특허 (87)

1. Pacetti, Stephen Dirk; DesNoyer, Jessica; Chen, Yung Ming; Kleiner, Lothar; Hossainy, Syed F. A., Abluminal, multilayer coating constructs for drug-delivery stents.

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2. Ivanov, Igor C.; Zhang, Jonathan Weiguo; Kolics, Artur, Apparatus and method for electroless deposition of materials on semiconductor substrates.

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3. Ivanov, Igor C.; Zhang, Jonathan Weiguo; Kolics, Artur, Apparatus and method for electroless deposition of materials on semiconductor substrates.

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4. Ivanov, Igor; Zhang, Jonathan Weiguo; Kolics, Artur, Apparatus and method for electroless deposition of materials on semiconductor substrates.

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5. Chen, Yung Ming; Tang, Fuh Wei, Apparatus and method for electrostatic coating of an abluminal stent surface.

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6. Sayka Anthony, Apparatus for coating a workpiece with fluid contamination detection.

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7. Mathieu Gaetan L., Apparatus for controlling plating over a face of a substrate.

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8. Motoda Kimio,JPX ; Kawasaki Tetsu,JPX, Apparatus for forming coating film for semiconductor processing.

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9. Kikuchi Kenji,JPX ; Muramatsu Tomoaki,JPX, Apparatus for spin coating, a method for spin coating and a method for manufacturing semiconductor device.

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10. Pilch, Karl; Leitner, Hans; Kalin, Michael, Application of fluids to substrates.

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11. Pilch, Karl; Leitner, Hans; Kalin, Michael, Application of fluids to substrates.

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12. Englhardt, Eric A.; Rice, Michael R.; Hudgens, Jeffrey C.; Hongkham, Steve; Pinson, Jay D.; Salek, Mohsen; Carlson, Charles; Weaver, William T; Armer, Helen R., Cartesian cluster tool configuration for lithography type processes.

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13. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Katwyk, Kirk Van; Hoskins, Van; Shah, Vinay, Cartesian robot cluster tool architecture.

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14. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.

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15. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.

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16. Ishikawa, Tetsuya; Roberts, Rick J.; Armer, Helen R.; Volfovski, Leon; Pinson, Jay D.; Rice, Michael; Quach, David H.; Salek, Mohsen S.; Lowrance, Robert; Backer, John A.; Weaver, William Tyler; Carlson, Charles; Wang, Chongyang; Hudgens, Jeffrey; Herchen, Harald; Lue, Brian, Cluster tool architecture for processing a substrate.

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17. Ishikawa,Tetsuya; Roberts,Rick J.; Armer,Helen R.; Volfovski,Leon; Pinson,Jay D.; Rice,Michael; Quach,David H.; Salek,Mohsen S.; Lowrance,Robert; Backer,John A.; Weaver,William Tyler; Carlson,Charles; Wang,Chongyang; Hudgens,Jeffrey; Herchen,Harald; Lue,Brian, Cluster tool architecture for processing a substrate.

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18. Volfovski, Leon; Ishikawa, Tetsuya, Cluster tool substrate throughput optimization.

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19. Yoshiaki Nakamura JP; Toshimitsu Omine JP, Coated film forming apparatus.

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20. Hasbe, Keizo; Nishikido, Shuuichi; Konishi, Nobuo; Toshima, Takayuki; Yoshioka, Kazutoshi, Coating apparatus.

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21. Cooper,Samuel A.; Daggett,Joseph W., Coating methods and apparatus for coating.

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22. Fujimoto Akihiro,JPX, Coating unit.

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23. Park Geun-bok,KRX ; Kim Kil-yong,KRX ; Go Jae-seung,KRX ; Kim Dong-heyun,KRX, Developer flow check system and method thereof.

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24. Kazuo Sakamoto JP; Akira Nishiya JP, Developing method and developing apparatus.

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25. Mandal Robert P., Dispense nozzle design and dispense method.

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26. Hasebe, Keizo; Nishikido, Shuuichi; Konishi, Nobuo; Toshima, Takayuki; Yoshioka, Kazutoshi, Film forming method and film forming apparatus.

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27. Kitano, Takahiro; Kobayashi, Shinji; Esaki, Yukihiko; Morikawa, Masateru, Film forming unit.

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28. Daggett, Joseph W.; Williams, Daniel J.; Kemp, Kevin G.; Cayton, Joseph W., Liquid coating device with barometric pressure compensation.

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29. Daggett,Joseph W.; Williams,Daniel J.; Kemp,Kevin G.; Cayton,Joseph W., Liquid coating device with barometric pressure compensation.

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30. Mathieu, Gaetan L., Method and apparatus for controlling plating over a face of a substrate.

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31. Matsuda Naoko,JPX ; Naka Hiroyuki,JPX ; Kamihara Motoaki,JPX ; Hirota Osamu,JPX ; Kanashima Keinosuke,JPX ; Ogura Hiroshi,JPX, Method and apparatus for determining film thickness control conditions and discharging liquid to a rotating substrate.

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32. Rosenberger Mary Ellen ; Jones Donald B., Method and apparatus for spraying waterborne coatings under varying conditions.

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33. Rosenberger Mary Ellen ; Jones Donald B., Method and apparatus for spraying waterborne coatings under varying conditions.

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34. Becker, Wolfgang; Rueth, Edgar; Gerigk, Reinhard; Sichmann, Eggo, Method and device for controlling thickness during spin coating.

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35. Miyata, Akira, Method and device for processing substrate.

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36. Miyata,Akira, Method and device for processing substrate.

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37. Fox, Jason; Harold, Nathan; Templin, Barry; Tochterman, Andrew, Method for selectively coating surfaces of a stent.

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38. Gurer, Emir; Zhong, Tom; Lewellen, John W.; Lee, Eddie, Method for two dimensional adaptive process control of critical dimensions during spin coating process.

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39. Itoh Katsuyuki,JPX, Method of forming a resist pattern.

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40. Yan,John Y.; Chan,Randy, Method of reducing or eliminating thrombus formation.

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41. Chen, Yung-Ming; Bobson, Charles R.; LoPrete, John F., Method of regulating temperature of a composition for coating implantable medical devices.

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42. Emir,Gurer; Zhong,Tom; Lewellen,John; Lee,Edward C.; Mandal,Robert P.; Grambow,James C.; Bettes,Ted C.; Sauer,Donald R.; Ward,Edmond R., Method of uniformly coating a substrate.

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43. Gurer, Emir; Zhong, Tom; Lewellen, John; Lee, Ed; Mandal, Robert P.; Grambow, James C.; Bettes, Ted C.; Sauer, Donald R.; Ward, Edmond R., Method of uniformly coating a substrate.

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44. Gurer,Emir; Zhong,Tom; Lewellen,John; Lee,Edward C.; Mandal,Robert P.; Grambow,James C.; Bettes,Ted C.; Sauer,Donald R.; Ward,Edmond R.; Chun,Jung Hoon; Han,Sangjun, Method of uniformly coating a substrate.

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45. Bharath Rangarajan ; Bhanwar Singh ; Sanjay K. Yedur ; Michael K. Templeton, Multiple nozzles for dispensing resist.

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46. Craig, Charles H.; Papp, John E.; Jayasinghe, Dudley; Hines, Lionel G.; Orosa, Dennis, Nanobead releasing medical devices.

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47. Ludwig, Florian N., Nanoshell therapy.

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48. Ludwig, Florian Niklas, Nanoshell therapy.

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49. Ludwig, Florian N.; Pacetti, Stephen D.; Hossainy, Syed F. A.; Davalian, Dariush, Nanoshells for drug delivery.

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50. Ludwig, Florian Niklas; Pacetti, Stephen D.; Hossainy, Syed F. A.; Davalian, Dariush, Nanoshells on polymers.

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51. Ludwig, Florian Niklas; Pacetti, Stephen D.; Hossainy, Syed F. A.; Davalian, Dariush, Nanoshells on polymers.

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52. Ludwig, Florian Niklas; Pacetti, Stephen D.; Hossainy, Syed F. A.; Davalian, Dariush, Nanoshells on polymers.

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53. Moein, Mohammed E., Nozzle and method for use in coating a stent.

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54. Moein,Mohammed E., Nozzle and method for use in coating a stent.

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55. Chen,Yung Ming; Guittard,Stephen James; Broeckert,Joe, Nozzle for use in coating a stent.

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56. Yabe, Sachiko, Photoresist developing nozzle, photoresist developing apparatus, and photoresist developing method.

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57. Liu Jen Song,TWX ; Chang Bii Juno,TWX ; Fang Jen Shang,TWX ; Chang Hao Wei,TWX, Photoresist supply system with air venting.

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58. Liu Jen Song,TWX ; Chang Bii Junq,TWX ; Fang Jen Shang,TWX ; Chang Hao Wei,TWX, Photoresist supply system with air venting.

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59. Kawano Yukihiro,JPX ; Takekuma Takashi,JPX, Process liquid film forming apparatus.

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60. Moravec,Thomas J.; Hage,Martin L.; Boulineau,Michael S., Rapid, thermally cured, back side mar resistant and antireflective coating for ophthalmic lenses.

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61. Yoshihara, Kosuke, Resist film forming method and resist coating apparatus.

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62. Van Sciver, Jason, Rotatable support elements for stents.

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63. Van Sciver, Jason, Rotatable support elements for stents.

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64. Van Sciver, Jason, Rotatable support elements for stents.

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65. Van Sciver, Jason, Rotatable support elements for stents.

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66. Van Sciver, Jason, Rotatable support elements for stents.

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67. Hossainy,Syed F. A.; Mirzaee,Daryush, Selective coating of medical devices.

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68. Tochterman, Andrew J.; Fox, William J.; Harold, Nathan, Selectively coating luminal surfaces of stents.

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69. Reardon,Timothy J.; Oberlitner,Thomas H.; Meuchel,Craig P.; Owczarz,Aleksander; Thompson,Raymon F., Semiconductor processing apparatus.

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70. Reardon Timothy J. (Kalispell MT) Meuchel Craig P. (Kalispell MT) Oberlitner Thomas H. (Kalispell MT), Semiconductor processing spray coating apparatus.

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71. Reardon Timothy J. ; Meuchel Craig P. ; Oberlitner Thomas H., Semiconductor processing spray coating apparatus.

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72. Tajima, Yukitoshi, Spin coater, temperature controlling method of the same, optical disc production apparatus, and optical disc production method.

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73. Yen Daniel L. W.,TWX ; Jin Been Yih,TWX ; Wang Ming Hong,TWX, Spin-on-glass process with controlled environment.

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74. Yen Daniel L. W.,TWX ; Jin Been Yih,TWX ; Wang Ming Hong,TWX, Spin-on-glass process with controlled environment.

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75. Chen, Yung Ming; Guittard, Stephen James; Broeckert, Joe, Stent coating apparatus.

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76. Chen, Yung-Ming; Guittard, Stephen James; Broeckert, Joe, Stent coating method.

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77. Fox, Jason; Harold, Nathan; Templin, Barry; Tochterman, Andrew, Stent mandrel fixture and method for selectively coating surfaces of a stent.

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78. Fox,Jason; Harold,Nathan; Templin,Barry; Tochterman,Andrew, Stent mandrel fixture and method for selectively coating surfaces of a stent.

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79. Pacetti,Stephen D.; Villareal,Plaridel K., Stent mounting assembly and a method of using the same to coat a stent.

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80. Yamahira Yutaka,JPX, Substitute processing apparatus with power distribution control for reduced power consumption during apparatus start up.

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81. Omori, Tsutae, Substrate processing method.

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82. Takamori Hideyuki,JPX ; Nomura Masafumi,JPX ; Omori Tsutae,JPX, Substrate processing method.

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83. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Van Katwyk, Kirk; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a Cartesian robot cluster tool.

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84. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Katwyk, Kirk Van; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a cartesian robot cluster tool.

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85. Rice, Mike; Hudgens, Jeffrey; Carlson, Charles; Weaver, William Tyler; Lowrance, Robert; Englhardt, Eric; Hruzek, Dean C.; Silvetti, Dave; Kuchar, Michael; Van Katwyk, Kirk; Hoskins, Van; Shah, Vinay, Substrate processing sequence in a cartesian robot cluster tool.

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86. Chen, Yung Ming; Ho, Henjen, System and method for coating an implantable medical device.

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87. Anderson, Curtis W.; Dowland, Thomas W.; Reeves, Leonard W.; Heggli, Bjarne, Systems and methods for building tamper resistant coatings.

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