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Sealing device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F16J-015/02
  • F16J-015/48
출원번호 US-0661109 (1991-02-26)
우선권정보 JP-0045211 (1990-02-26); JP-0071562 (1990-03-20); JP-0222872 (1990-08-24)
발명자 / 주소
  • Hattori Hisashi (Tama JPX) Iwata Teruo (Nirasaki JPX) Sekizuka Hiroshi (Oome JPX) Kawauchi Yoichi (Ageo JPX) Fujisawa Hisao (Nakaminato JPX)
출원인 / 주소
  • Tokyo Electron Limited (Tokyo JPX 03) Tokyo Electron Sagami Limited (Kanagawa JPX 03) Kishikawa Special Valve Co., Ltd. (Tokyo JPX 03)
인용정보 피인용 횟수 : 32  인용 특허 : 0

초록

A sealing device of this invention is designed to prevent entering of the open air through a coupling of a process tube of a CVD apparatus. The sealing device includes a first flange having a mirror-finished face, a second flange having a face which is brought into contact with the face of the first

대표청구항

A sealing device for preventing a gas from leaking through a coupling of a member for separating a first gas atmosphere from a second gas atmosphere, comprising: a first sealing member having a first sealing face; a second sealing member having a second sealing face to contact with the first sealing

이 특허를 인용한 특허 (32)

  1. Yamaga Kenichi (Sagamihara JPX) Kobayashi Toshiki (Zama JPX), Apparatus for heat treating semiconductors at normal pressure and low pressure.
  2. Smick Theodore H. ; Farley Marvin ; Sakase Takao ; Ryding Geoffrey, Apparatus for reducing distortion in fluid bearing surfaces.
  3. Flitsch, Frederick A., Apparatus to support a cleanspace fabricator.
  4. Piechulla, Alexander; Rade, Claus; Hartung, Robert Michael, Device for doping, deposition or oxidation of semiconductor material at low pressure.
  5. Shinozaki,Hiroyuki, Differential pumping seal apparatus.
  6. Shimazu Tomohisa,JPX, Enveloping device and vertical heat-treating apparatus for semiconductor process system.
  7. Li, Yicheng, Exhaust system for a vacuum processing system.
  8. Nishikawa, Katsuhito; Moore, Gary M.; Ingles, Aaron David, Gas ring and method of processing substrates.
  9. Shinohara,Shinji; Tsuda,Takuma; Hayashida,Takeshi, Hydrostatic gas bearing, hydrostatic gas bearing device for use in vacuum environment, and gas recovering method for hydrostatic gas bearing device.
  10. Shinohara,Shinji; Tsuda,Takuma; Hayashida,Takeshi, Hydrostatic gas bearing, hydrostatic gas bearing device for use in vacuum environment, and gas recovering method for the hydrostatic gas bearing device.
  11. Schertler Roman,ATX, Intermediate metallic layer for flat packing and process for the production of a flat packing with such an intermediate layer.
  12. Schertler, Roman, Intermediate metallic layer for flat packing and process for the production of a flat packing with such an intermediate layer.
  13. Fosnight William J. ; Shenk Joshua W. ; Peterson Perry, Kinematic coupling compatible passive interface seal.
  14. Juranas David L. ; Munn Donald D. ; Anderson Harry A., Laboratory reactor apparatus.
  15. Katsuhito Nishikawa ; Thomas F. Carlos, Linear robot.
  16. Murota, Masahiro, Machine tool including sealing structure in rotation unit.
  17. Devitt, Andrew J., Method and a device for depositing a film of material or otherwise processing or inspecting, a substrate as it passes through a vacuum environment guided by a plurality of opposing and balanced air bearing lands and sealed by differentially pumped groves and sealing lands in a non-contact manner.
  18. Flitsch, Frederick A., Method and apparatus for an automated tool handling system for a multilevel cleanspace fabricator.
  19. Devitt, Andrew J., Method and apparatus for in-line processing and immediately sequential or simultaneous processing of flat and flexible substrates through viscous shear in thin cross section gaps for the manufacture of micro-electronic circuits or displays.
  20. Flitsch, Frederick, Method and apparatus to support a cleanspace fabricator.
  21. Flitsch, Frederick A., Method and apparatus to support process tool modules in a cleanspace fabricator.
  22. Li, Yicheng, Method and system for sealing a first assembly to a second assembly of a processing system.
  23. Flitsch, Frederick A., Method of forming a cleanspace fabricator.
  24. Flitsch, Frederick A., Methods and apparatus for vertically orienting substrate processing tools in a clean space.
  25. Katsuhito Nishikawa ; Thomas F. Carlos, Particulate free air bearing and seal.
  26. Gentille, Alain Cornut, Pipe connector production method.
  27. Juranas David L., Reactor flask.
  28. Li, Yicheng, Sealing device and method for a processing system.
  29. Genser, Hans Georg, Sealing device for sealing a cavity rotatable about a rotation axis.
  30. Yamaga Kenichi,JPX, Thermal processing apparatus.
  31. Travnicek, Roland; Weidgang, Peter; Wirtz, Ingo, Triple sealing seat for a conduit gate valve.
  32. Seeley, Andrew James, Vacuum system pipe couplings.
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