[특허]Method of making fused silica

Method of making fused silica 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C03B-019/06
출원번호	US-0750561 (1991-08-26)
발명자 / 주소	Blackwell Jeffery L. (Corning NY) Dobbins Michael S. (Wilmington NC) McLay Robert E. (Corning NY) Truesdale Carlton M. (Corning NY)
출원인 / 주소	Corning Incorporated (Corning NY 02)
인용정보	피인용 횟수 : 63 인용 특허 : 0

초록 ▼

This invention relates to the production of high purity fused silica glass through oxidation and/or flame hydrolysis of a halide-free, organosilicon-R compound in vapor form having the following properties: (a) producing a gas stream of a halide-free silicon-containing compound in vapor form capable of being converted through thermal decomposition with oxidation or flame hydrolysis to SiO2; (b) passing said gas stream into the flame of a combustion burner to form amorphous particles of fused SiO2; (c) depositing said amorphous particles onto a support; and (d) either essentially simultaneously with said deposition or subsequently thereto consolidating said deposit of amorphous particles into a virtually nonporous body; the improvement comprising utilizing a halide-free, organosilicon-R compound in vapor form having the following properties: (1) a Si－R bond dissociation energy that is no higher than the dissociation energy of the Si－O bond; (2) a boiling point no higher than 350°C.; and (3) which, upon pyrolysis and/or hydrolysis, will produce decomposition products beside SiO2 which are deemed to be environmentally safe or the emissions are below acceptable governmental standards.

대표청구항 ▼

In a method for making a virtually non-porous body of high purity fused silica glass which comprises the steps of: (a) producing a gas stream of a halide-free, silicon-containing compound in vapor form capable of being converted through thermal decomposition with oxidation or flame hydrolysis to SiO2; (b) passing said gas stream into the flame of a combustion burner to form amorphous particles of high purity fused silica; (c) depositing said amorphous particles onto a support; and (d) either essentially simultaneously with said deposition or subsequently thereto consolidating said deposit of amorphous particles into a virtually non-porous body of high purity fused silica; the improvement comprising utilizing as the halide-free, silicon-containing compound an organosilicon-R compound in vapor form selected from the group consisting of organosilicon-nitrogen compounds having a basic Si－N－Si structure, siloxasilazanes having a basic Si－N－Si－O－Si structure, and mixtures thereof having the following properties; (1) a Si－R bond dissociation energy that is no higher than the dissociation energy of the Si－O bond; (2) a boiling point no higher than 350°C., and (3) which, upon pyrolysis and/or hydrolysis, will produce decomposition products beside SiO2 which are non-toxic.

이 특허를 인용한 특허 (63)

Sayce Ian George,GBX ; Nicholson Robert,GBX ; Turnbull Paul Willikam,GBX ; Wells Peter John,GBX, Apparatus for manufacturing a vitreous silica article.
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Marley Floyd E. ; Misra Mahendra K. ; Sproul Merrill F., Apparatus for minimizing air infiltration in the production of fused silica glass.
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Zhou, Ligui; Spear, Richard A.; Leung, Roger Yu-Kwan; Fan, Wenya; Xu, Helen X.; Metin, Lea M.; Bhanap, Anil Shriram, Dopant ink compositions for forming doped regions in semiconductor substrates, and methods for fabricating dopant ink compositions.
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Davis, Jr., Claude L.; Hrdina, Kenneth E.; Sabia, Robert; Stevens, Harrie J., Extreme ultraviolet soft x-ray projection lithographic method and mask devices.
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Davis Jr., Claude L.; Hrdina, Kenneth E., Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements.
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Davis, Jr., Claude L.; Hrdina, Kenneth E., Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements.
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Bowden, Bradley F.; Hrdina, Kenneth E., Fabrication of inclusion free homogeneous glasses.
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Hunt Andrew T. ; Hwang Tzyy Jiuan ; Hornis Helmut G. ; Lin Wen-Yi, Formation of thin film capacitors.
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Hunt, Andrew T.; Hwang, Tzyy Jiuan; Hornis, Helmut G.; Lin, Wen-Yi, Formation of thin film capacitors.
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Kutsovsky, Yakov E., Fumed metal oxide particles and process for producing the same.
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Davis, Sheldon B.; Sanchez Garcia, Angelica M.; Matheu, David M.; Kutsovsky, Yakov E., Fumed silica of controlled aggregate size and processes for manufacturing the same.
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Davis, Sheldon B.; Sanchez Garcia, Angelica M.; Matheu, David; Kutsovsky, Yakov E., Fumed silica of controlled aggregate size and processes for manufacturing the same.
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Schermerhorn Paul M., Furnace for producing fused silica glass.
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Marley, Floyd E.; Sempolinski, Daniel R.; Sproul, Merrill F., Furnaces for fused silica production.
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Maxon John E. ; Pavlik ; Jr. Robert S. ; Sempolinski Daniel R. ; Wasilewski Michael H., Fused SiO.sub.2 -TiO.sub.2 glass method.
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Roger J. Araujo ; Nicholas F. Borrelli ; Robert E. McLay ; Daniel R. Sempolinski ; Charlene M. Smith, Fused silica with constant induced absorption.
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Jeffery Lynn Blackwell ; Lisa Anne Moore ; Carlton Maurice Truesdale, Germanium doped silica forming feedstock and method.
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Bowden, Bradley F.; Hrdina, Kenneth E.; Wight, Jr., John F.; Yu, Chunzhe C., High purity glass bodies formed by zero shrinkage casting.
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Pandelisev, Kiril A., Hot substrate deposition of fused silica.
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Kevin Bruce Albaugh ; Nitin Ramesh Keskar, Integration of ceramic membrane into a silicon oxide production plant.
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Morse, Theodore F., Liquid spray pyrolysis method for the fabrication of optical fiber preforms, with reactant mixing.
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Aronowitz,Sheldon; Zubkov,Vladimir, Low dielectric constant fluorine and carbon-containing silicon oxide dielectric material characterized by improved resistance to oxidation.
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Hawtof, Daniel W.; Henderson, Danny L.; Smith, Greg E.; Urruti, Eric H., Method and apparatus for forming fused silica by combustion of liquid reactants.
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Blackwell Jeffery L. ; Fu Xiaodong ; Hawtof Daniel W. ; Henderson Danny L., Method and apparatus for forming silica by combustion of liquid reactants using a heater.
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Floyd E. Marley ; Mahendra K. Misra ; Merrill F. Sproul, Method and apparatus for minimizing air infiltration in the production of fused silica glass.
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Henriksen, Knut; Vegge, Olaf Trygve, Method and apparatus for production of amorphous silica from silicon and silicon containing materials.
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Sempolinski Daniel R. ; Wasilewski Michael H. ; Yu C. Charles, Method and burner for forming silica-containing soot.
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Maxon John E. (Canton NY), Method and containment vessel for producing fused silica glass and the fused silica blank produced.
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Tennent, David L.; Whalen, Joseph M., Method and feedstock for making silica.
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Blackwell Jeffery Lynn ; Fu Xiaodong ; Hawtof Daniel Warren ; Powers Dale Robert, Method for forming silica by combustion of liquid reactants using oxygen.
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John T. Brown ; Michael S. Dobbins ; Christine E. Heckle ; Robert E. McLay ; Mahendra K. Misra ; Dale R. Powers ; Michael H. Wasilewski, Method for producing bulk fused silica.
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Hrdina, Kenneth E.; Russo, Nikki J.; Wasilewski, Michael H., Method for producing fused silica and doped fused silica glass.
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Badeke, Klaus-Uwe; Otto, Norbert; Trommer, Martin; Laudahn, Hilmar; Brueckel, Andreas, Method for producing synthetic quartz glass.
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Fabian, Heinz, Method for producing synthetic quartz glass.
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Fabian, Heinz; Roeper, Juergen, Method for producing synthetic quartz glass.
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Fabian, Heinz; Roeper, Juergen, Method for producing synthetic quartz glass.
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Ackerman, Bradford Giles; Hrdina, Kenneth Edward; Moore, Lisa Anne; Russo, Nikki Jo; Yu, C. Charles, Method for producing titania-doped fused silica glass.
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Fabian, Heinz; Thomas, Stephan, Method for producing titanium-doped synthetic quartz glass.
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Henderson Danny L. (Wilmington NC) Powers Dale R. (Painted Post NY), Method for purifying polyalkylsiloxanes and the resulting products.
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Henderson Danny L. ; Powers Dale R., Method for purifying polyalkylsiloxanes and the resulting products.
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Jeffrey L. Blackwell ; David Dasher ; A. Renee Sutton ; Carlton M. Truesdale, Method of making titania-doped fused silica.
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Drouart Alain,FRX ; Gouez Benoit,FRX ; Lumineau Yves,FRX ; Ripoche Pierre,FRX ; Campion Jean-Florent,FRX, Method of purifying silica and depositing on an optical fiber preform.
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Araujo Roger J. ; Borrelli Nicholas F. ; Hoaglin Christine L. ; Smith Charlene, Method of reducing laser-induced optical damage in silica.
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Risen ; Jr. William M. ; Wang Yong Zhong ; Bredall Scott, Methods and compositions for forming silica, germanosilicate and metal silicate films, patterns and multilayers.
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Marley, Floyd E.; Sempolinski, Daniel R.; Sproul, Merrill F., Methods and furnaces for fused silica production.
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Burke Gerald E. ; Hoaglin Christine L. ; Truesdale Carlton M., Optical waveguide attenuating device and method for producing the same.
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Borrelli Nicholas Francis ; Cook Thomas Allen ; DeLiso Evelyn McGee ; Modavis Robert Adam, Photoinduced grating in oxynitride glass.
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Borrelli, Nicholas Francis; Cook, Thomas Allen; DeLiso, Evelyn McGee; Modavis, Robert Adam, Photoinduced grating in oxynitride glass.
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Borrelli, Nicholas Francis; Cook, Thomas Allen; DeLiso, Evelyn McGee; Modavis, Robert Adam, Photoinduced grating in oxynitride glass.
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Aronowitz, Sheldon; Zubkov, Vladimir, Process for forming a low dielectric constant fluorine and carbon-containing silicon oxide dielectric material.
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Hiroyuki Nishimura JP; Akira Fujinoki JP; Hisatoshi Otsuka JP, Production method for making an optical member for excimer laser using synthetic quartz glass.
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Bussing Thomas R. A. ; Ting Joseph M., Pulse detonation synthesis.
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Adler, Meryle D. M.; Brown, John T.; Misra, Mahendra K., Sealed, nozzle-mix burners for silica deposition.
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Borrelli Nicholas F. ; Seward ; III Thomas P. ; Smith Charlene, Silica with low compaction under high energy irradiation.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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연합인증

Method of making fused silica 원문보기

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Method of making fused silica 원문보기

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