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Apparatus for coating a photo-resist film and/or developing it after being exposed

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03D-005/04
  • B65G-025/00
출원번호 US-0627357 (1990-12-14)
우선권정보 JP-0030219 (1988-02-12)
발명자 / 주소
  • Ushijima Mitsuru (Tama JPX) Akimoto Masami (Kikuyo JPX)
출원인 / 주소
  • Tokyo Electron Limited (Tokyo JPX 03)
인용정보 피인용 횟수 : 47  인용 특허 : 0

초록

The resist-processing system according to the present invention includes at least one processing sections having a plurality of treatment units for performing various kinds of treatments on a semiconductor wafer such as the coating process and baking process, a loading section connected to the proce

대표청구항

A processing system for resist processing an object, comprising: at least one processing section having a plurality of treatment units for performing various kinds of treatments on the objects; a loading section connected to said processing section for supplying the object to said processing section

이 특허를 인용한 특허 (47)

  1. Jones Oliver David, Apparatus for cleaning robot end effector.
  2. Park, Jae Heon, Apparatus for processing wafers.
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  10. Nguyen, Binh Quoc; Phillips, Alton, Device for handling wafers in microelectronic manufacturing.
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  12. Jones Oliver David, Method of drying a wafer.
  13. Davis Shawn D., Methods of treating a semiconductor wafer.
  14. Shawn D. Davis, Methods of treating a semiconductor wafer.
  15. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Multi-story substrate treating apparatus with flexible transport mechanisms and vertically divided treating units.
  16. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Multi-story substrate treating apparatus with flexible transport mechanisms and vertically divided treating units.
  17. Fukutomi, Yoshiteru; Mitsuhashi, Tsuyoshi; Ogura, Hiroyuki; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Parallel substrate treatment for a plurality of substrate treatment lines.
  18. Sasada Shigeru (Kyoto JPX) Aoki Kaoru (Kyoto JPX) Kodama Mitsumasa (Kyoto JPX) Sugimoto Kenji (Kyoto JPX) Fukutomi Yoshiteru (Kyoto JPX) Inoue Hidekazu (Kyoto JPX), Processing apparatus having parts for thermal and non-thermal treatment of substrates.
  19. 5 ; 19961000 ; Schmitt et al., Resist-processing apparatus.
  20. Hofmeister Christopher A., Robot arm relocation system.
  21. Jones Oliver David, Robot end-effector cleaner and dryer.
  22. Nichols, Michael J.; Guarracina, Louis J., Self-sterilizing automated incubator.
  23. Thompson, Raymon F.; Berner, Robert W.; Curtis, Gary L.; Culliton, Stephen P.; Wright, Blaine G.; Byle, Darryl S., Semiconductor processing system with wafer container docking and loading station.
  24. Davis Shawn D., Substrate coating apparatus.
  25. Tateyama Kiyohisa,JPX, Substrate conveying device and substrate conveying method.
  26. Tateyama Kiyohisa,JPX, Substrate conveying device and substrate conveying method.
  27. Tateyama Kiyohisa,JPX ; Iwasaki Tatsuya,JPX, Substrate conveying device and substrate conveying method.
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  29. Kuriki Yasuyuki,JPX ; Takamori Hideyuki,JPX ; Hara Kozo,JPX, Substrate processing apparatus.
  30. Ueda Issei,JPX, Substrate processing apparatus.
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  35. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus with inter-unit buffers.
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  37. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus with parallel substrate treatment lines simultaneously treating a plurality of substrates.
  38. Ogura, Hiroyuki; Mitsuhashi, Tsuyoshi; Fukutomi, Yoshiteru; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus with substrate reordering.
  39. Fukutomi, Yoshiteru; Mitsuhashi, Tsuyoshi; Ogura, Hiroyuki; Morinishi, Kenya; Kawamatsu, Yasuo; Nagashima, Hiromichi, Substrate treating apparatus with vertical treatment arrangement including vertical blowout and exhaust units.
  40. Davis Shawn D., Substrate treatment apparatus.
  41. Kimura Yoshio (Kumamoto-ken JPX), System for applying process liquid.
  42. Yamazaki Takashi (Katsuta JPX) Sakai Hiroyuki (Ibaraki JPX) Sugano Hiroshi (Katsuta JPX) Moriyama Shigeo (Tama JPX), Transfer apparatus.
  43. Adachi Hideki,JPX ; Inada Tatsuhiko,JPX, Transfer apparatus for and method of transferring substrate.
  44. Park, Il Ryong, Unified strip/cleaning apparatus.
  45. Soraoka, Minoru; Yoshioka, Ken; Kawasaki, Yoshinao, Vacuum processing apparatus and semiconductor manufacturing line using the same.
  46. Soraoka,Minoru; Yoshioka,Ken; Kawasaki,Yoshinao, Vacuum processing apparatus and semiconductor manufacturing line using the same.
  47. Ichikawa Masahiro,JPX ; Shimizu Toshikuni,JPX, Washing apparatus for disc-like workpieces.
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