이 특허를 인용한 특허 (51)

1. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.

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2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.

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3. Mahood Michael A. (Ontario CAX), Circuit and method for controlling electrical heater in a distiller.

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4. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.

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5. Kerpels, Fred; Luckman, Joel A.; Overdevest, Pieter E.; Wright, Tremitchell, Dry cleaning method.

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6. Luckman, Joel A.; Leitert, Andrew; Sunshine, Richard A.; Wright, Tremitchell L., Fabric laundering apparatus adapted for using a select rinse fluid.

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7. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.

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8. Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.

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9. Jones, William D., High pressure fourier transform infrared cell.

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10. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.

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11. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.

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12. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.

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13. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.

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14. Jacobson, Peter M., Leadless cardiac pacemaker system for usage in combination with an implantable cardioverter-defibrillator.

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15. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.

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16. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.

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17. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.

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18. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.

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19. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.

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20. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.

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21. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.

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22. Luckman, Joel A.; Wright, Tremitchell L., Method for fluid recovery in a semi-aqueous wash process.

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23. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.

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24. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.

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25. Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.

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26. Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.

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27. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.

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28. Wright, Tremitchell L.; Luckman, Joel A., Methods and apparatus to accelerate the drying of aqueous working fluids.

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29. Wright,Tremitchell L.; Luckman,Joel A., Multifunctioning method utilizing a two phase non-aqueous extraction process.

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30. Estes, Kurt A.; Conrad, Daniel C.; Kovich, Mark Bradley; Wright, Tremitchell L., Non-aqueous washing apparatus and method.

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31. Conrad, Daniel C.; Wright, Tremitchell; Dalton, Michael T.; Estes, Kurt; Kovich, Mark B.; Leitert, Andrew J.; Lau, Brooke Lindsay Steel; Brown Green, Cinnamon S.; Krumbein, Holli; Maki, Kenyata Joi; Luckman, Joel A.; McAllister, Karl David; Wyatt Smith, Vicki Lyn, Non-aqueous washing machine and methods.

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32. Wright, Tremitchell; Conrad, Daniel C.; Deboer, Christopher C.; Dalton, Michael Thomas; Luckman, Joel A.; Leitert, Andrew J.; Lau, Brooke Lindsay-Steel; McAllister, Karl David, Non-aqueous washing machine and methods.

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33. Wright, Tremitchell L.; Conrad, Daniel C.; Krefman, Stephen David; Luckman, Joel A.; Sunshine, Richard A.; Leitert, Andrew, Non-aqueous washing machine with modular construction.

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34. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.

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35. Fong,Jon Jody; Soliz,Raymond M., Post processor for three-dimensional objects.

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36. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.

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37. Wuester,Christopher D., Process flow thermocouple.

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38. Cash Alan B., Process for regenerating spent solvent.

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39. Mullee, William H.; de Leeuwe, Marc; Roberson, Jr., Glenn A., Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process.

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40. Mullee William H. ; de Leeuwe Marc ; Roberson ; Jr. Glenn A., Removal of CMP residue from semiconductors using supercritical carbon dioxide process.

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41. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.

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42. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.

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43. William H. Mullee ; Maximilian A. Biberger ; Paul E. Schilling, Removal of photoresist and residue from substrate using supercritical carbon dioxide process.

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44. Koch Robert, Removal of polishing residue from substrate using supercritical fluid process.

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45. Mullee William H., Removal of resist or residue from semiconductors using supercritical carbon dioxide.

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46. DePalma, Philip W.; Sherman, Robert, System and method for controlling humidity in a cryogenic aerosol spray cleaning system.

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47. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.

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48. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.

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49. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.

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50. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.

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51. Ohba Takayuki,JPX ; Suzuki Toshiya,JPX ; Murakami Seishi,JPX, Vacuum treatment apparatus and a method for manufacturing semiconductor device therein.

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