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특허 상세정보

Low pressure drop filter

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B01J-020/00    B01J-020/30   
미국특허분류(USC) 502/60 ; 502/401 ; 502/411 ; 502/413
출원번호 US-0658248 (1991-02-20)
발명자 / 주소
출원인 / 주소
인용정보 피인용 횟수 : 57  인용 특허 : 0
초록

A filter for removing contaminants from a gas contains a support material and, deposited on the support material, a first component which is an oxide, a hydroxide or a mixture of an oxide and hydroxide of Al, Si, Ti, Fe or Zn, containing at least about 0.5% by weight of water. The first component is deposited onto the filter preferably from a colloidal sol solution of a compound of the metal of that component. The first component acts as an adsorbent to remove contaminants from a gas, such as air. The filter may contain a second component, such as an alk...

대표
청구항

A filter for removing contaminants from a gas comprising a support material and, deposited on the support material: (i) a first component which is an oxide, a hydroxide or a mixture of an oxide an a hydroxide of Al, Si, Ti, Fe, Zn or a mixture thereof, the oxide, the hydroxide or the mixture of the oxide and the hydroxide comprising at least about 0.5% by weight of water; and, (ii) a second component which is an alkali metal, an alkaline earth metal, a compound of the alkali metal, a compound of the alkaline earth metal, a salt of permanganic acid, or a ...

이 특허를 인용한 특허 피인용횟수: 57

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