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Processes for cleaning, sterilizing, and implanting materials using high energy dense fluids 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-003/12
출원번호 US-0443471 (1989-11-30)
발명자 / 주소
  • Jackson David P. (22328 W. Barcotta Dr. Santa Clarita CA 91350) Lepp Michael A. (22334 W. Barcotta Dr. Santa Clarita CA 91350)
인용정보 피인용 횟수 : 79  인용 특허 : 0

초록

An environmentally safe process for pre-cleaning, sterilizing, preserving, and enhancing performance characteristics of materials used in critical environments with stringent end-product cleanliness and sterilization requirements in a single process using high energy dense fluids. One or more dense

대표청구항

A process for removing two or more contaminants from a substrate surface comprising the steps of: a) placing said substrate containing said contaminants in a cleaning, sterilization, and implant chamber; and b) contacting said substrate containing said contaminants with a dense fluid at a pressure e

이 특허를 인용한 특허 (79)

  1. Feine, James, Ablation method and device.
  2. Takenaka, Naofumi; Wakamoto, Shinichi; Yamashita, Koji; Morimoto, Hiroyuki; Shimazu, Yusuke, Air conditioning apparatus with primary and secondary heat exchange cycles.
  3. Takenaka, Naofumi; Wakamoto, Shinichi; Yamashita, Koji; Morimoto, Hiroyuki; Shimazu, Yusuke, Air-conditioning apparatus with primary and secondary heat exchange cycles.
  4. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  5. Bianchi, John R.; Mills, C. Randal; Gorham, P. J.; Esch, Michael; Carter, Kevin C.; Coleman, Pat; Ross, Kevin; Rambo, Harry W.; Jones, Darren G.; Buskirk, Dayna, Assembled implant.
  6. Hopple George B. ; Crane Scott J. ; Mackey Bob L. ; Porter John D., Cleaning of flat-panel display.
  7. Adler Robert,ATX, Cleaning of workpieces having organic residues.
  8. DeSimone Joseph M. ; Romack Timothy ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.
  9. DeSimone Joseph M. ; Romack Timothy J. ; Betts Douglas E. ; McClain James B., Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants.
  10. Ben Kim, Cleaning with liquified gas and megasonics.
  11. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  12. Mills, C. Randal; Wironen, John F.; Hanstke, Sean, Cyclic implant perfusion, cleaning and passivation process and implant produced thereby.
  13. Mills, C. Randal; Wironen, John F.; Hanstke, Sean, Cyclic implant perfusion, cleaning and passivation process and implant produced thereby.
  14. DeYoung, James P.; Romack, Timothy J.; McClain, James B., Detergent injection methods for carbon dioxide cleaning apparatus.
  15. DeYoung,James P.; McClain,James B.; Gross,Stephen M., Detergent injection systems and methods for carbon dioxide microelectronic substrate processing systems.
  16. DeYoung James P. ; Romack Timothy J. ; McClain James B., Detergent injection systems for carbon dioxide cleaning apparatus.
  17. James P. DeYoung ; Timothy J. Romack ; James B. McClain, Detergent injection systems for carbon dioxide cleaning apparatus.
  18. Arena Foster,Chantal J.; Awtrey,Allan Wendell; Ryza,Nicholas Alan; Schilling,Paul, Developing photoresist with supercritical fluid and developer.
  19. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Developing photoresist with supercritical fluid and developer.
  20. Areal Guerra,Rogelio, Device and method for mass deacidification, elimination of free acidity and disinfestation of cellulosic materials.
  21. Arena-Foster, Chantal J.; Awtrey, Allan Wendell; Ryza, Nicholas Alan; Schilling, Paul, Drying resist with a solvent bath and supercritical CO2.
  22. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  23. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  24. Christensen, Tim W., Inactivating organisms using carbon dioxide at or near its supercritical pressure and temperature conditions.
  25. Chao Sidney C. ; Purer Edna M. ; Sorbo Nelson W., Liquid carbon dioxide cleaning using jet edge sonic whistles at low temperature.
  26. Moisan, Michel; Moreau, Stephane; Tabrizian, Maryam; Pelletier, Jacques; Barbeau, Jean; Yahia, L'Hocine, Low temperature plasma sterilising system and method.
  27. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  28. Burns, David C.; Eisenhut, Anthony R.; Christopher, Renee; Christensen, Tim W., Method and apparatus for cleaning of viable donor soft tissue.
  29. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  30. Eriksson,Johannes; Ulsteen,Erik, Method and apparatus for use in enhancing fuels.
  31. Eriksson,Johannes; Ulsteen,Erik; Rahe,Richard, Method and apparatus for use in enhancing fuels.
  32. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  33. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  34. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  35. Stucker John F., Method and system for rejuvenating pressurized fluid solvents used in cleaning substrates.
  36. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  37. Stucker John F., Method for rejuvenating pressurized fluid solvent used in cleaning a fabric article.
  38. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  39. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  40. Arai Kunio,JPX ; Inomata Hiroshi,JPX ; Smith Richard Lee,JPX, Method for using high density compressed liquefied gases in cleaning applications.
  41. Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
  42. Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
  43. Hillman,Joseph, Method of inhibiting copper corrosion during supercritical COcleaning.
  44. Smith, Leif, Method of making a guide wire based assembly and reusing an energy source.
  45. Toma,Dorel Ioan; Schilling,Paul, Method of passivating of low dielectric materials in wafer processing.
  46. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  47. Schilling,Paul, Method of treating a composite spin-on glass/anti-reflective material prior to cleaning.
  48. Schilling,Paul, Method of treatment of porous dielectric films to reduce damage during cleaning.
  49. Brahmbhatt, Sudhir R.; Masi, Richard R., Methods and systems for sanitizing or sterilizing a medical device using ultrasonic energy and liquid nitrogen.
  50. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  51. Sauer Richard A. ; Hubert Jean-Luc ; Connors Robert W., Pressure-swing absorption based cleaning methods and systems.
  52. Mills, C. Randal; Bianchi, John R.; Roberts, Michael R.; Nataraj, Chandrasekaran, Process and apparatus for treating implants comprising soft tissue.
  53. Chao Sidney C. ; Beach Robert W. ; Sorbo Nelson W. ; Purer Edna M., Process for cleaning, disinfecting, and sterilizing materials using the combination of dense phase gas and ultraviolet radiation.
  54. Burns, David C.; Eisenhut, Anthony R.; Christopher, Renee, Process for creating acellular viable donor soft tissue.
  55. McDermott,Wayne Thomas; Subawalla,Hoshang; Johnson,Andrew David; Schwarz,Alexander, Processing of semiconductor components with dense processing fluids and ultrasonic energy.
  56. Smith, Leif, Removable energy source for sensor guidewire.
  57. Mullee,William H.; de Leeuwe,Marc; Roberson, Jr.,Glenn A.; Palmer,Bentley J., Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process.
  58. Mullee, William H.; de Leeuwe, Marc; Roberson, Jr., Glenn A., Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process.
  59. Mullee William H. ; de Leeuwe Marc ; Roberson ; Jr. Glenn A., Removal of CMP residue from semiconductors using supercritical carbon dioxide process.
  60. Bertram, Ronald Thomas; Scott, Douglas Michael, Removal of contaminants from a fluid.
  61. McCullough Kenneth John ; Purtell Robert Joseph ; Rothman Laura Beth ; Wu Jin-Jwang, Removal of fluorine or chlorine residue by liquid CO.sub.2.
  62. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  63. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  64. William H. Mullee ; Maximilian A. Biberger ; Paul E. Schilling, Removal of photoresist and residue from substrate using supercritical carbon dioxide process.
  65. Koch Robert, Removal of polishing residue from substrate using supercritical fluid process.
  66. Mullee William H., Removal of resist or residue from semiconductors using supercritical carbon dioxide.
  67. McCullough Kenneth John ; Purtell Robert Joseph ; Rothman Laura Beth ; Wu Jin-Jwang, Residue removal by supercritical fluids.
  68. Krone-Schmidt Wilfried, Spectrophotometric supercritical fluid contamination monitor.
  69. Christensen,Timothy Wayne; Burns,David Carroll; White,Angela Lydia; Ganem,Bruce; Eisenhut,Anthony Romey, Sterialization methods and apparatus which employ additive-containing supercritical carbon dioxide sterilant.
  70. Malchesky, Paul S., Sub-critical fluid cleaning and antimicrobial decontamination system and process.
  71. Ching, Gil; Perrut, Vincent; Ruch, Vincent; Fresquet, Gilles, Substrate processing apparatus for processing substrates using dense phase gas and sonic waves.
  72. Joyce, Patrick C.; Tipton, Adrianne; Shrinivasan, Krishnan; Hess, Dennis W.; Myneni, Satyanarayana; Levitin, Galit, Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials.
  73. Zhang, Tian Xuan; Chapin, David Michael; Taylor, Robert Warren; Moyeda, David Kelly; Maly, Peter Martin, System and method for controlling emissions in a combustion system.
  74. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  75. Stucker John F., System for rejuvenating pressurized fluid solvents used in cleaning substrates.
  76. Qing-Qing, Qiu; Connor, Jerome, Systems and methods for sterilization of bone or bone components.
  77. Mills, C. Randal; Wironen, John F.; Hanstke, Sean; Donda, Russell S.; Grooms, Jamie M.; Bianchi, John, Tissue pooling process.
  78. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  79. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
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