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Control valve

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F16K-017/02
  • F16K-031/42
출원번호 US-0839560 (1992-02-24)
발명자 / 주소
  • Novakovi Mili (KOD(c/o) Mrs. Mare Vucak
  • UL.Trg Pobede Broj 16 11080 Zemun YUX)
인용정보 피인용 횟수 : 45  인용 특허 : 0

초록

The valve has a casing with inlet and outlet ports, and a valve opening bordered by a valve seat communicating the ports. A flexible diaphragm defines a control chamber and a pressure chamber on opposite sides thereof and moves between an open position clear of the seat, and a closed position agains

대표청구항

A control valve comprising: (a) casing means having an inlet port, an outlet port and an opening having a nominal opening area bordered by a valve seat and being disposed between the inlet and outlet ports to provide communication therebetween, (b) a flexible diaphragm secured to the casing means to

이 특허를 인용한 특허 (45)

  1. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  3. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  4. Hertzler,Benjamin Lee; Shay,Robert Harrison; Botelho,Alexandre de Almeida, Assembly and method for containing, receiving and storing fluids and for dispensing gas from a fluid control and gas delivery assembly having an integrated fluid flow restrictor.
  5. Macalello Frank ; Macalello Christine ; Sapigao Ed, Automatic shut-off safety device.
  6. Liantonio, Vito M., Bi-directional piloted solenoid-operated valve.
  7. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  8. Bachnak, Nouhad, Control valve.
  9. Matsumoto, Michio; Sendo, Isao; Tonegawa, Masaaki, Control valve.
  10. Morris, Georgina E.; Shorey, Christopher W., Diaphragm and diaphragm valve.
  11. Smith, Zachary Spencer; Conner, Darren Edward, Diaphragm valve with dual point seal and floating diaphragm web.
  12. Kingsford Kenji A. ; Nguyen Hy Ba, Diaphragm valve with leak detection.
  13. Walton Herbert H. ; Pfantz Douglas C. ; Scott Gary L. ; Bonzer William J., Elastomeric element valve.
  14. Walton Herbert H. ; Pfantz Douglas C. ; Scott Gary L. ; Bonzer William J. ; Griffin ; Jr. James L. ; Cornu Bernard,FRX ; Day Donald K. ; Adams Paul R., Elastomeric element valve.
  15. Older, John, Flow control/shut-off valve assembly.
  16. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  17. Jones, William D., High pressure fourier transform infrared cell.
  18. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  19. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  20. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  21. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  22. Weingarten, Zvi, Hydraulic torrent control valve.
  23. Saeki Hiroaki,JPX ; Hokari Tomio,JPX, Idle speed control device for internal combustion engine.
  24. Duelli, Bernhard, Linear motion leadthrough.
  25. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  26. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  27. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  28. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  29. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  30. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  31. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  32. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  33. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  34. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  35. Matsui,Hideyuki; Tokunaga,Osamu, Opening and closing valve.
  36. Donovan,Ryan, Piston for reverse flow diaphragm valve.
  37. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  38. Wuester,Christopher D., Process flow thermocouple.
  39. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  40. Pearlstein,Ronald Martin; Langan,John Giles; Zheng,Dao Hong; Irven,John; Hertzler,Benjamin Lee, Sub-atmospheric gas delivery method and apparatus.
  41. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  42. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  43. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  44. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
  45. Zanga,Francesco, Valve unit for filling machines.
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