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Single wafer processor 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-003/04
출원번호 US-0922578 (1992-07-30)
발명자 / 주소
  • Thompson Raymon F. (Kalispell MT) Gordon Robert W. (Seattle WA) Durado Daniel (Kalispell MT)
출원인 / 주소
  • Semitool, Inc. (Kalispell MT 02)
인용정보 피인용 횟수 : 122  인용 특허 : 0

초록 ▼

A single wafer processor supports a semiconductor wafer having at least one surface that is to be subjected to contact with a fluid. The equipment includes a portable module including a gripper assembly that is rotatable about the axis of a portable housing and is capable of mechanically engaging or

대표청구항 ▼

A single wafer processor for subjecting at least one surface of a semiconductor wafer to contact with a fluid, comprising: a support surface; a bowl mounted to the support surface, the bowl interior having an open dished surface centered about a bowl axis; closable drain means in fluid communication

이 특허를 인용한 특허 (122)

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  76. Curtis Gary L. ; Thompson Raymon F., Micro-environment chamber and system for rinsing and drying a semiconductor workpiece.
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  77. Gary L. Curtis ; Raymon F. Thompson, Micro-environment chamber and system for rinsing and drying a semiconductor workpiece.
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  78. Gary L Curtis ; Raymon F. Thompson, Micro-environment reactor for processing a workpiece.
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  79. Yang,Michael X.; Xi,Ming; Ellwanger,Russell C.; Britcher,Eric B.; Donoso,Bernardo; Pang,Lily L.; Sherman,Svetlana; Ho,Henry; Nguyen,Anh N.; Lerner,Alexander N.; D'Ambra,Allen L.; Shanmugasundram,Arul, Multi-chemistry plating system.
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  85. Curtis Gary L. ; Thompson Raymon F., Reactor for processing a microelectronic workpiece.
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  86. Curtis, Gary L.; Thompson, Raymon F., Reactor for processing a microelectronic workpiece.
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  94. Hey, H. Peter W.; Sugarman, Michael N.; Denome, Mark, Segmenting of processing system into wet and dry areas.
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  105. Goodman, Daniel; Keigler, Arthur; Fisher, Freeman, Substrate loader and unloader.
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  106. Lubomirsky,Dmitry, Substrate support with fluid retention band.
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  113. Curtis, Gary L; Thompson, Raymon F., System for processing a workpiece.
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  115. Curtis,Gary L.; Thompson,Raymon F., System for processing a workpiece.
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  116. Gary L. Curtis ; Raymon F. Thompson, System for processing a workpiece.
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  117. Hanson,Kyle M., System for processing a workpiece.
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