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Cluster tool dry cleaning system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F26B-003/28
출원번호 US-0820985 (1992-01-15)
발명자 / 주소
  • Grant Robert W. (Excelsior MN) Novak Richard E. (Plymouth MN)
출원인 / 주소
  • SubMicron Systems, Inc. (Allentown PA 02)
인용정보 피인용 횟수 : 64  인용 특허 : 0

초록 ▼

A cluster tool module for dry process cleaning of substrates. A substrate process reactor body assembly includes a gas inlet and gas outlet on opposing sides of a ceramic reactor body. A linear xenon flash lamp in a light bar provides a UV source for uniform distribution over a substrate by use of a

대표청구항

Cluster tool dry cleaning system comprising: a. a ceramic reactor body including a gas inlet, a gas outlet and wafer orifice; b. a light box over said ceramic reactor body; c. a light source means in said light box; and, d. means for supporting and rotating a wafer or substrate in said body.

이 특허를 인용한 특허 (64)

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  5. Rocha-Alvarez, Juan Carlos; Nowak, Thomas; Du Bois, Dale R.; Baluja, Sanjeev; Hendrickson, Scott A.; Ho, Dustin W.; Kaszuba, Andrzei; Cho, Tom K., Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation.
    상세보기
  6. Rocha-Alvarez, Juan Carlos; Nowak, Thomas; Du Bois, Dale R.; Baluja, Sanjeev; Hendrickson, Scott A.; Ho, Dustin W.; Kaszuba, Andrzei; Cho, Tom K., Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation.
    상세보기
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