[특허]Separation of gas mixtures including hydrogen

Separation of gas mixtures including hydrogen 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B01D-053/04
출원번호	US-0849261 (1992-03-11)
발명자 / 주소	Krishnamurthy Ramachandran (Piscataway NJ) Lerner Steven L. (Berkeley Heights NJ) Shukla Yagya (Roselle Park NJ) Stokley Alan G. (Wokingham GB2)
출원인 / 주소	The BOC Group plc (Surrey GB2 03)
인용정보	피인용 횟수 : 49 인용 특허 : 0

초록 ▼

A process for separation of a gas mixture containing three components, e.g. a mixture comprising hydrogen, carbon monoxide and carbon dioxide produced by steam reforming a hydrocarbon, by pressure swing adsorption is disclosed. In one embodiment of the process, the gas mixture is sequentially passed through first and second adsorptive regions each of which adsorbs a second component more strongly than a first component but less strongly than a third component, a first fraction enriched in the first component is withdrawn from the downstream end of the second region, introduction of gas mixture to the first region is stopped and the second region is closed to the first region, a second fraction enriched in the second component is withdrawn first from the upstream end of the second adsorptive region while passing gas mixture enriched in the third component into the first region from its upstream end and then from the downstream end of the first region, and withdrawing a third fraction enriched in the third component from the upstream end of the first region. The separation process is also applicable to other gas mixtures such as a mixture of hydrogen, argon, methane and nitrogen commonly available as ammonia plant purge gas from which ammonia has been removed.

대표청구항 ▼

A process of separating a gas mixture comprising at least three components into three different fractions by pressure swing adsorption, comprising repeatedly performing a cycle including: passing said gas mixture sequentially through first and second adsorptive regions on each of which a second component of the mixture is more strongly adsorbed than a first component, but less strongly adsorbed than a third component; withdrawing a first fraction enriched in said first component from the downstream end of the second adsorptive region; stopping admission of the said gas mixture to the first adsorptive region; withdrawing a second fraction enriched in the second component from the downstream end of the first adsorptive region and from the upstream end of the second adsorptive region into a common pipeline; and withdrawing a third fraction enriched in the third component from the upstream end of the first adsorptive region.

이 특허를 인용한 특허 (49)

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