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Method and apparatus for removing residual hydrogen from a purified gas 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-053/04
출원번호 US-0862399 (1992-04-02)
발명자 / 주소
  • Briesacher Jeffrey L. (Pismo Beach CA) Applegarth Charles H. (San Luis Obispo CA) Lorimer D\Arcy H. (Pismo Beach CA)
출원인 / 주소
  • SAES Pure Gas, Inc. (San Luis Obispo CA 02)
인용정보 피인용 횟수 : 68  인용 특허 : 0

초록 ▼

The invention relates generally to a gas purification system for the purification of noble gasses and nitrogen. An improved method of purification generally includes the following steps: (a) heating an impure gas; (b) contacting the impure gas with an impurity sorbing material to produce a purified

대표청구항 ▼

A method for removing residual hydrogen from a purified gas comprising the steps of: (a) heating an impure gas; (b) contacting the heated impure gas with an impurity sorbing material to produce a purified gas having trace amounts of residual hydrogen; (c) cooling the purified gas to a temperature le

이 특허를 인용한 특허 (68)

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