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Alkaline free electroless deposition 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-018/40
출원번호 US-0773188 (1991-10-08)
발명자 / 주소
  • Shacham Yosef Y. (Ithaca NY) Bielski Roman (Ithaca NY)
출원인 / 주소
  • Cornell Research Foundation, Inc. (Ithaca NY 02)
인용정보 피인용 횟수 : 175  인용 특허 : 0

초록 ▼

Alkali-free layers of pure metals such as copper, nickel and cobalt were deposited on noble metal or noble metal sensitized substrates by electroless deposition using pure quaternary ammonium hydroxides or quaternary phosphonium hydroxides to generate the hydroxyl ion (OH-) needed to produce electro

대표청구항 ▼

An electroless deposition composition, free of alkali metal and suitable for depositing a metal layer on a noble metal or noble metal sensitized substrate, comprising: a) a source of metal ions; said metal selected from the group consisting of copper, cobalt, nickel and silver; b) a quaternary onium

이 특허를 인용한 특허 (175)

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