IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0878569
(1992-05-05)
|
우선권정보 |
JP-0135359 (1991-05-13) |
발명자
/ 주소 |
- Yamaguchi Toshio (Chiba JPX) Kobayashi Yasushi (Chiba JPX)
|
출원인 / 주소 |
- Toyo Engineering Corporation (Tokyo JPX 03)
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인용정보 |
피인용 횟수 :
12 인용 특허 :
0 |
초록
▼
A process for obtaining highly-purified gas by selectively separating at least one gaseous impurity from a gaseous mixture by the known pressure swing adsorption method uses a holding column of the feed-in/feed-out sequence retaining type and at least three adsorption columns containing adsorbents.
A process for obtaining highly-purified gas by selectively separating at least one gaseous impurity from a gaseous mixture by the known pressure swing adsorption method uses a holding column of the feed-in/feed-out sequence retaining type and at least three adsorption columns containing adsorbents. Each adsorption column is pressurized and depressurized in cycle to repeat adsorption and desorption steps. During this, the holding column is used as an intermediate gas reservoir to improve the efficiency of the separation. In this invention, the capacity of the holding column is insufficient to hold the whole amount of purge gas.
대표청구항
▼
A process for separating gaseous impurities from a gaseous mixture by using at least three adsorption columns containing adsorbents and a holding column of the feed-in/feed-out sequence retaining type having a capacity insufficient to hold a purged gas in its entirety, said process including repeati
A process for separating gaseous impurities from a gaseous mixture by using at least three adsorption columns containing adsorbents and a holding column of the feed-in/feed-out sequence retaining type having a capacity insufficient to hold a purged gas in its entirety, said process including repeating alternate, cyclic adsorption and desorption steps with said at least three adsorption columns and comprising the following steps: a) feeding the gaseous mixture into a first adsorption column through an inlet thereof, discharging the purified gas through an outlet of the first adsorption column, and terminating the feeding and discharging before the adsorbent in the first adsorption column becomes spent and the purity of the purified gas falls below a target level; b) communicating an outlet of another adsorption column, whose adsorbent has been regenerated, with the outlet of the first adsorption column already subjected to step a, so that both adsorption columns equalize in pressure, and then eliminating the communication; c) communicating the outlet of the first adsorption column, which has been subjected to step b, with a first end of the holding column, which contains a gas received as a result of communication of a second end of the holding column with at least one outlet of other adsorption columns having been subjected to steps a and b, so that the gas inside the first adsorption column is allowed to enter the holding column and, during the entrance of the gas from the first adsorption column into the holding column, maintaining the second end of the holding column in communication with an outlet of a second adsorption column already subjected to steps a, b and c and also to the below-described step d, so that the second adsorption column is purged with gas forced out of the holding column by the gas flow into the holding column and, until the breakthrough of at least one gaseous impurity adsorbed on the adsorbent bed of the first adsorption column begins to occur in the gas flow from the first adsorption column, the gas in the first adsorption column being allowed to enter the second adsorption column through the outlet thereof, either by way of the holding column or directly, to purge the second adsorption column; d) closing a purge valve of the second adsorption column so that the second adsorption column and the first adsorption column communicate with each other and equalize in pressure, and then eliminating the communication; e) closing the outlet of the first adsorption column already subjected to step c or d and depressurizing the first adsorption column to a lowest pressure by a purge valve provided on the side of the inlet of the first adsorption column so that the at least one gaseous impurity adsorbed on the adsorbent bed of the first adsorption column is desorbed and eliminated; f) communicating an outlet of a third adsorption column, which has been subjected to steps a and b, with the first end of the holding column so that the gas inside the third adsorption column is allowed to enter the holding column until the breakthrough of at least one gaseous impurity adsorbed on the adsorbent bed of the third adsorption column begins to occur in the gas flow from the third adsorption column, said gas entering the holding column optionally containing a portion of the purified gas and, during the entrance of the gas from the first adsorption column into the holding column, maintaining the second end of the holding column in communication with the outlet of the first adsorption column already subjected to step e, whereby the first adsorption column is purged with gas forced out of the holding column by the gas flow into the holding column, the gas flow into the holding column optionally containing a portion of the purified gas and, until the breakthrough of the at least one gaseous impurity adsorbed on the adsorbent bed of the third adsorption column begins to occur in the gas, the gas in the third adsorption column being allowed to enter the first adsorption column by way of the holding column or directly, to purge the first adsorption column; g) closing the purge valve of the first adsorption column, so that the first adsorption column and the third adsorption column communicate with each other and equalize in pressure, and then eliminating the communication; h) communicating the outlet of at least one other adsorption column, which has been subjected to step a or steps a and b, with the outlet of the first adsorption column, which has been subjected to step f or g, while closing both an inlet of said at least one other adsorption column and the inlet of the first adsorption column, so that the gas inside said at least one other adsorption column is allowed to enter the first adsorption column, said gas entering the first adsorption column optionally containing a portion of the purified gas, to subject said at least one other adsorption column and the first adsorption column to at least one pressure equalizing operation, and then eliminating the communication; and i) causing a gas of the same quality as the purified gas to flow into the first adsorption column, which has been subjected to step h, through the outlet thereof, while closing the inlet thereof, so that the pressure of the first adsorption column equalizes with that of the gas of the same quality as the purified gas, and then closing the outlet of the first adsorption column.
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