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Pressure vessel 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65D-051/16
  • B65D-041/06
출원번호 US-0743673 (1991-08-12)
발명자 / 주소
  • Morgan
  • Jr. H. William (P.O. Box 735 Michigan City IN 46360) Hall James D. (Cassopolis MI)
출원인 / 주소
  • Morgan, Jr.
  • H. William (Michigan City IN 04)
인용정보 피인용 횟수 : 39  인용 특허 : 0

초록

A pressure vessel including a lid with integral fixed lock tabs engageable with notches in the housing side wall to secure the lid to the housing. The housing includes a vent opening formed through the side wall. The lower edge of the lid is substantially bevelled and has a flattened portion to seal

대표청구항

A pressure vessel having a housing with an opening defined by a side wall and a lid, said lid spanning the opening of said housing, locking means associated with said lid and housing for securing said lid to said housing, said lid being rotatably shiftable relative to said housing between a closed p

이 특허를 인용한 특허 (39)

  1. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  3. Publ, Rudy; Gutkowski, Brian, Cleaning apparatus.
  4. Ortt, Earl M.; Doyle, Michael C.; Marcinkowski, Robert J., Combined fastenerless motor end cap and output device mounting.
  5. Nielsen Arne Bendix (Melbyvej 63 DK-3370 Melby DKX), Container having a child-proof, cup-shaped closure.
  6. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  7. Joffe, David L., Expanded polystyrene cooler with slide-locking lid.
  8. Booth Walter ; Gershenson Moshe ; Falcone Leonard, Filter bag and sealing ring therefor.
  9. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  10. Sutton, Thomas R.; Biberger, Maximilan A., High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism.
  11. Jones, William D., High pressure fourier transform infrared cell.
  12. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  13. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  14. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  15. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  16. Tseronis, James A.; Mortiz, Heiko D.; Chandra, Mohan; Farmer, Robert B.; Jafri, Ijaz H.; Talbott, Jonathan, Inverted pressure vessel with horizontal through loading.
  17. Robert B Farmer ; Jonathan A. Talbott ; Mohan Chandra ; James A. Tseronis ; Heiko D. Moritz, Inverted pressure vessel with shielded closure mechanism.
  18. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  19. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  20. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  21. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  22. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  23. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  24. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  25. Iwai, Makoto; Higashihara, Shuhei; Mori, Yusuke; Kitaoka, Yasuo; Miyoshi, Naoya, Method for growing single crystal of group III metal nitride and reaction vessel for use in same.
  26. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  27. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  28. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  29. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  30. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  31. Wuester,Christopher D., Process flow thermocouple.
  32. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  33. Heiko D Moritz ; Jonathan A. Talbott ; Mohan Chandra ; James A. Tseronis ; Ijaz Jafri, Supercritical fluid drying system and method of use.
  34. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  35. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  36. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  37. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
  38. Weissinger Peter G. ; Rosas Manuel D., Valve having multi-part valve housing.
  39. Rosas Manuel D. ; Weissinger Peter G., Valve having multi-piece valve housing.
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