[특허]Charged particle beam exposure system and charged particle beam exposure method

Charged particle beam exposure system and charged particle beam exposure method 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	H01J-037/302
출원번호	US-0851400 (1992-03-13)
우선권정보	JP-0048037 (1991-03-13); JP-0097321 (1991-04-26)
발명자 / 주소	Yasuda Hiroshi (Kawasaki JPX) Takahashi Yasushi (Kawasaki JPX) Sakamoto Kiichi (Kawasaki JPX) Yamada Akio (Kawasaki JPX) Oae Yoshihisa (Kawasaki JPX) Kai Junichi (Kawasaki JPX) Fueki Shunsuke (Kawasa
출원인 / 주소	Fujitsu Limited (Kawasaki JPX 03)
인용정보	피인용 횟수 : 90 인용 특허 : 0

초록 ▼

A charged particle beam exposure system is directed to an exposure process of an electron beam for sequentially scanning an electron beam employing a blanking aperture array including a plurality of blanking apertures. The system facilitates re-focusing for compensation of focus error due to Coulumb effect and makes wiring the blanking aperture array easier. The system further allows exposure without an irradiation gap. The blanking aperture array 6 is formed with a plurality of said blanking apertures 62 arranged in a two-dimensional configuration. A control system 24 controls the blanking aperture array 62 to set the blanking aperture to the ON state where the charged particle beams pass through the blanking aperture and reach the object 19 to be exposed or the OFF state where the charged particle beams cannot reach the object 19 to be exposed. The other control system of the control means performs a control so that a plurality of said charged particle beams that have passed through different blanking apertures of said blanking aperture array overlaps and is irradiated a plurality of times onto the specified position or the peripheral position in the vicinity of the specified position of the object to be exposed to the charged particle beams.

대표청구항 ▼

A charged particle beam exposure system comprising: a charged particle beam generating means for generating a charged particle beam; a blanking aperture array means for shaping said charged particle beam generated by said charged particle beam generating means and having a plurality of blanking apertures arranged in two dimensional form; a stage means for holding an object to be exposed; a deflection means for deflecting the charged particle beam passing through said blanking aperture array means by a specified amount in order to irradiate the charged particle beams onto the specified position of said object to be exposed; wherein said system further comprising; a first means for irradiating a pattern formed by said charged particle beams arranged in two dimensional configuration on a first region specified on said object to be exposed; a second means for successively irradiating the pattern formed by said charged particle beams arranged in two dimensional configuration on a second region having an overlapping region to the first region; and wherein said first and second means are constructed so that when said charged particle beams are irradiated to said object to be exposed, a first charged particle beam passing through a first blanking aperture irradiates a specified first region on said object to be exposed by said first means and a second charged particle beam passing through a second blanking aperture arranged next to said first blanking aperture irradiates a region closely arranged to said specified first region by said second means, and thus said specified position in said overlapping region is irradiated a plurality of times by respective charged particle beams, each having a certain irradiation amount set by, dividing a total irradiation amount.

이 특허를 인용한 특허 (90)

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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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Charged particle beam exposure system and charged particle beam exposure method 원문보기

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Charged particle beam exposure system and charged particle beam exposure method 원문보기

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