[특허]Substrate processing apparatus

Substrate processing apparatus 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	F28F-007/00 H01L-021/324
출원번호	US-0889288 (1992-05-28)
우선권정보	JP-0153885 (1991-05-28); JP-0153886 (1991-05-28)
발명자 / 주소	Wada Yuichi (Kofu JPX)
출원인 / 주소	Tokyo Electron Limited (Tokyo JPX 03)
인용정보	피인용 횟수 : 66 인용 특허 : 0

초록 ▼

A magnetron sputtering apparatus having a heating susceptor in a vacuum chamber to support a wafer. The wafer is fixed on a ring-shaped projection by clamps at wafer-mounted section on the top of the susceptor. A substantially closed space is formed between the underside of the wafer and that face on the top of the susceptor which is defined by the wafer-mounted section to oppose the underside of the wafer. Ar gas which serves as heat-medium gas is supplied into the closed space, flowing into it from its peripheral area. The Ar gas is exhausted at the center of the closed space by a vacuum pump. Heat is transmitted from the susceptor of the wafer through the Ar gas to set the wafer at a certain temperature.

대표청구항 ▼

An apparatus for processing a substrate in an atmospheric gas while controlling a temperature of the substrate, comprising: a process chamber; a susceptor arranged in the process chamber to support the substrate; a substrate support formed in the susceptor and made of a material having an excellent heat conductivity; a recessed and opposed face formed on the support and opposed to a back surface of the substrate; an endless ring-shaped projection formed on the support and surrounding the opposed face, the opposed face and the projection being formed integrally of said material, the projection being formed only along an outer rim of the substrate and having an endless ring-shaped contact surface in contact with the back surface of the substrate to form a substantially closed space between the back surface of the substrate and the opposed face; a heater located behind and heating the opposed face; means for pushing the substrate against the contact surface; means for supplying a heat-medium gas into the space between the back surface of the substrate and the opposed face; and means for exhausting the heat-medium gas from the space between the back surface and the opposed face; wherein said means for supplying the heat-medium gas has a plurality of gas inlets formed at the opposed face along the outer rim of the substrate at a certain interval; and said means for exhausting the heat-medium gas has an exhaust opening formed at the center of the opposed face and a mesh made of metal having an excellent heat conductivity is attached to the exhaust opening.

이 특허를 인용한 특허 (66)

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White Carl ; MacErnie Jon R. ; Hillman Joseph T., Method for isolating a susceptor heating element from a chemical vapor deposition environment.
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Halpin Michael W. ; Hawkins Mark R. ; Foster Derrick W. ; Vyne Robert M. ; Wengert John F. ; van der Jeugd Cornelius A. ; Jacobs Loren R., Wafer support system.
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Halpin, Michael W.; Hawkins, Mark R.; Foster, Derrick W.; Vyne, Robert M.; Wengert, John F.; van der Jeugd, Cornelius A.; Jacobs, Loren R., Wafer support system.
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Halpin, Michael W.; Hawkins, Mark R.; Foster, Derrick W.; Vyne, Robert M.; Wengert, John F.; van der Jeugd, Cornelius A.; Jacobs, Loren R.; Van Bilsen, Frank B. M.; Goodman, Matthew; Glenn, Hartmann; Layton, Jason M., Wafer support system.
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Halpin,Michael W.; Hawkins,Mark R.; Foster,Derrick W.; Vyne,Robert M.; Wengert,John F.; van der Jeugd,Cornelius A.; Jacobs,Loren R., Wafer support system.
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Michael W. Halpin ; Mark R. Hawkins ; Derrick W. Foster ; Robert M. Vyne ; John F. Wengert ; Cornelius A. van der Jeugd ; Loren R. Jacobs ; Frank B. M. Van Bilsen ; Matthew Goodman ; Hartman, Wafer support system.
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Michael W. Halpin ; Mark R. Hawkins ; Derrick W. Foster ; Robert M. Vyne ; John F. Wengert ; Cornelius A. van der Jeugd ; Loren R. Jacobs ; Frank B. M. Van Bilsen ; Matthew Goodman ; Hartman, Wafer support system.
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Michael W. Halpin ; Mark R. Hawkins ; Derrick W. Foster ; Robert M. Vyne ; John F. Wengert ; Cornelius A. van der Jeugd ; Loren R. Jacobs ; Frank B. M. Van Bilsen ; Matthew Goodman ; Hartman, Wafer support system.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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Substrate processing apparatus 원문보기

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Substrate processing apparatus 원문보기

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이 특허를 인용한 특허 (66)

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