초록 ▼

An apparatus and method are described for depositing a coating onto a substrate using vacuum arc evaporation from a substantially cylindrical cathode. An axial magnetic field is disclosed to force the motion of the arc into an open helical trajectory on the cathode surface. Means are also provided f

An apparatus and method are described for depositing a coating onto a substrate using vacuum arc evaporation from a substantially cylindrical cathode. An axial magnetic field is disclosed to force the motion of the arc into an open helical trajectory on the cathode surface. Means are also provided for controlling the speed and direction of the arc along the cathode by varying the division of input current between the ends of the cathode. Improved uniformity of cathode erosion and coating thickness are thereby achieved, along with a reduction in the number and size of splattered droplets incorporated into the coating.

대표청구항 ▼

A vacuum arc discharge apparatus for vaporizing a material and for depositing a coating of said material onto a substrate, the apparatus comprising: a vacuum chamber; vacuum pump means coupled to said vacuum chamber for establishing a desired atmosphere within said vacuum chamber; a cylindrical cath

A vacuum arc discharge apparatus for vaporizing a material and for depositing a coating of said material onto a substrate, the apparatus comprising: a vacuum chamber; vacuum pump means coupled to said vacuum chamber for establishing a desired atmosphere within said vacuum chamber; a cylindrical cathode positioned within said vacuum chamber, said cylindrical cathode having an evaporable surface comprising said material, said evaporable surface facing a region in which the substrate to be coated is located; first magnetic field means for generating an axial magnetic field component over said evaporable surface of said cylindrical cathode, said axial magnetic field component having flux lines over all of said evaporable surface that are substantially parallel to the longitudinal axis of said cylindrical cathode; second magnetic field means for generating a circumferential magnetic field component over at least a portion of said evaporable surface of said cylindrical cathode, said second magnetic field means including means for controlling said circumferential magnetic field component independently of an arc current, said circumferential magnetic field component having flux lines that are substantially parallel to said evaporable surface and perpendicular to the longitudinal axis of said cylindrical cathode at a given location on said evaporable surface; anode means; arc power supply means for supplying said arc current; and striker means for striking a moving arc between said cylindrical cathode and said anode means, said moving arc moving in an open helical path over the evaporable surface of said cylindrical cathode, a direction and speed of said moving arc being determined by a vector combination of said axial and circumferential magnetic field components.