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NTIS 바로가기국가/구분 | United States(US) Patent 등록 |
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국제특허분류(IPC7판) |
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출원번호 | US-0011630 (1993-02-01) |
발명자 / 주소 |
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출원인 / 주소 |
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인용정보 | 피인용 횟수 : 53 인용 특허 : 0 |
A wavelength of light is monitored for end-point detection during etching. Spectral data is collected during etching which characterizes variation of light emitted by discharge produced during etching. At least one principal component of the data is calculated. Each principal component has variables
A method of selecting a wavelength of light to monitor for end-point detection during etching, wherein the etching produces discharge which emits light, said method comprising the steps of: collecting data during etching, said data characterizing variation of light emitted by discharge produced duri
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