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Hybrid valving system for varying fluid flow rate 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F16K-011/20
출원번호 US-0100596 (1993-07-30)
발명자 / 주소
  • Gordon Daniel J. (Newtown CT)
출원인 / 주소
  • The Perkin-Elmer Corporation (Norwalk CT 02)
인용정보 피인용 횟수 : 37  인용 특허 : 0

초록

In a fluid valving system, binary fluid control lines are connected in parallel between a common fluid inlet and a common fluid outlet. Each line has a binary valve and a metering orifice for passing a predetermined rate of fluid flow. The rates are in a geometric progression in factors of two. An a

대표청구항

A valving system for varying fluid rate, comprising: a common fluid inlet receptive of fluid input, and a common fluid outlet for discharging a total fluid flow; a plurality of binary fluid control lines having predetermined rates of flow and being connected in parallel between the common fluid inle

이 특허를 인용한 특허 (37)

  1. Satake, Keigo, Apparatus and method for controlling flow rate of liquid, and storage medium.
  2. Takahashi, Eiji; Sasaki, Norikazu; Sawachi, Atsushi; Sawada, Yohei; Ikeda, Nobukazu; Dohi, Ryousuke; Nishino, Kouji, Apparatus for dividing and supplying gas and method for dividing and supplying gas.
  3. Schwaiger, Michael; Goller, Alois; Miggitsch, Christopher, Apparatus for liquid treatment of work pieces and flow control system for use in same.
  4. Parsons, Natan E.; Guler, Fatih; Herbert, Kay, Automated water delivery systems with feedback control.
  5. Herbert, Kay; Mo, Xiaoxiong; Krull, Jeff; Daher, Jean F.; Chen, Qiaohong; Vish, Ronald J.; Guler, Fatih; Wang, Xu; Thompson, Stanley O; Carpenter, David L., Automatic faucets.
  6. Rogalski, Markus; Wirtl, Hannes; Frisch, Herbert, Choke valve.
  7. Parsons, Natan E.; Hadley, David; Shamitz, Robert, Device and method for operating at least two valves.
  8. Parsons, Natan E.; Hadley, David; Shamitz, Robert; Herbert, Kay, Device and method for operating at least two valves.
  9. Carter Stephen,CAX, Digital gas metering system using tri-stable and bi-stable solenoids.
  10. Mehling, Hermann; Weiler, Daniel, Digital hydraulics valve stage.
  11. Parsons, Natan E.; Guler, Fatih; Herbert, Kay; Mo, Xiaoxiong; Greene, Gregory P., Electronic faucets for long-term operation.
  12. Parsons, Natan E.; Guler, Fatih; Herbert, Kay; Mo, Xiaoxiong; Greene, Gregory P., Electronic faucets for long-term operation.
  13. Parsons,Natan E.; Guler,Fatih; Herbert,Kay; Mo,Xiaoxiong; Greene,Gregory P., Electronic faucets for long-term operation.
  14. van den Wildenberg Adrianus Martinus,NLX, Flow control valve.
  15. Ohmi, Tadahiro; Saito, Masahito; Hino, Shoichi; Shimazu, Tsuyoshi; Miura, Kazuyuki; Nishino, Kouji; Nagase, Masaaki; Sugita, Katsuyuki; Hirata, Kaoru; Dohi, Ryousuke; Hirose, Takashi; Shinohara, Tsutomu; Ikeda, Nobukazu; Imai, Tomokazu; Yoshida, Toshihide; Tanaka, Hisashi, Flow rate range variable type flow rate control apparatus.
  16. Ohmi, Tadahiro; Saito, Masahito; Hino, Shoichi; Shimazu, Tsuyoshi; Miura, Kazuyuki; Nishino, Kouji; Nagase, Masaaki; Sugita, Katsuyuki; Hirata, Kaoru; Dohi, Ryousuke; Hirose, Takashi; Shinohara, Tsutomu; Ikeda, Nobukazu; Imai, Tomokazu; Yoshida, Toshihide; Tanaka, Hisashi, Flow rate range variable type flow rate control apparatus.
  17. Ohmi, Tadahiro; Saito, Masahito; Hino, Shoichi; Shimazu, Tsuyoshi; Miura, Kazuyuki; Nishino, Kouji; Nagase, Masaaki; Sugita, Katsuyuki; Hirata, Kaoru; Dohi, Ryousuke; Hirose, Takashi; Shinohara, Tsutomu; Ikeda, Nobukazu; Imai, Tomokazu; Yoshida, Toshihide; Tanaka, Hisashi, Flow rate range variable type flow rate control apparatus.
  18. Hirata, Kaoru; Sawada, Yohei; Dohi, Ryousuke; Nishino, Kouji; Ikeda, Nobukazu, Flow rate ratio variable type fluid supply apparatus.
  19. Solberg, David Pierce Whitten; Sanders, Earl Orel, Fluid flow measurement and control.
  20. Ding, Junhua; Zarkar, Kaveh H., Gas delivery method and system including a flow ratio controller using a multiple antisymmetric optimal control arrangement.
  21. Ding, Junhua; Smith, John A.; Zarkar, Kaveh H., Gas delivery method and system including a flow ratio controller using antisymmetric optimal control.
  22. Olander,W. Karl, Gas storage and dispensing system for variable conductance dispensing of gas at constant flow rate.
  23. Olander,W. Karl, Gas storage and dispensing system for variable conductance dispensing of gas at constant flow rate.
  24. Okabe, Tsuneyuki, Gas supply apparatus for semiconductor manufacturing apparatus.
  25. Ohmi, Tadahiro; Nishino, Kouji; Dohi, Ryousuke; Ikeda, Nobukazu; Nagase, Masaaki; Hirata, Kaoru; Sugita, Katsuyuki; Shinohara, Tsutomu; Hirose, Takashi; Imai, Tomokazu; Yoshida, Toshihide; Tanaka, Hisashi, Gasket type orifice and pressure type flow rate control apparatus for which the orifice is employed.
  26. Klingel Hans (Moglingen DEX) Weick Juergen Michael (Asperg DEX), Laser cutting machine with focus maintaining beam delivery.
  27. Parsons,Natan E.; Guler,Fatih; Herbert,Kay, Leak Detector.
  28. Koeckemann, Albert; Mehling, Hermann, Method for actuating a hydraulic valve arrangement, and hydraulic valve arrangement.
  29. Strecker, Holger; Hecker, Manfred; Karer, Rainer; Hamann, Axel; De Lange, Paulus-Petrus Maria, Method for cooling a gas-phase reactor for the polymerization of olefins.
  30. Goody, Brian Arthur, Method of and system for calibrating gas flow dilutors.
  31. Reinicke Robert H., Microvalve and microthruster for satellites and methods of making and using the same.
  32. Mullally, Michael J., Non-sliding solenoid valve.
  33. Blair ; Jr. Howard ; Dickert John Michael ; Mahoney ; Jr. Clarence Bernard, Precision volumetric measuring and mixing apparatus.
  34. Eason, Kwame; Caron, James Eugene; Angelov, Ivelin; Park, Joon Hong; Yang, Dengliang, System and method for increasing electron density levels in a plasma of a substrate processing system.
  35. Yang, Dengliang; Yaqoob, Faisal; Park, Pilyeon; Zhu, Helen H.; Park, Joon Hong, Systems and methods for ultrahigh selective nitride etch.
  36. Larson, Dean J.; Kadkhodayan, Babak; Wu, Di; Takeshita, Kenji; Yen, Bi-Ming; Su, Xingcai; Denty, Jr., William M.; Loewenhardt, Peter, Uniform etch system.
  37. Gammon, James H., Valve system.
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