[특허]Low cost equipment for cleaning using liquefiable gases

Low cost equipment for cleaning using liquefiable gases 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B08B-003/02 B08B-013/00
출원번호	US-0082866 (1993-09-07)
발명자 / 주소	Stanford,Jr. Thomas B. (San Pedro CA) Chao Sidney C. (Manhattan Beach CA)
출원인 / 주소	Hughes Aircraft Company (Los Angeles CA 02)
인용정보	피인용 횟수 : 110 인용 특허 : 0

초록 ▼

Precision cleaning of parts is performed with liquefiable gases, such as CO2, without the use of a complex and costly processor system. Rather, simplified and reliable performance for small scale and “low end”cleaning applications is accomplished without the use of pumps and condensers. The apparatus for removing undesired material from a chosen substrate comprises: (a) an enclosed cleaning chamber in a walled vessel for containing a liquid derived from a liquefiable gas and the substrate containing the undesired particulates and contaminants, the walled vessel adapted to withstand a maximum pressure of about 1,500 pounds per square inch (105.4 kg/cm2) at ambient temperature; (b) means for supporting the substrate in the cleaning chamber; (c) ultrasonic energy-producing transducer means attached to the walled vessel within the cleaning chamber; (d) inlet means attached to the walled vessel for introducing the liquefiable gas into the cleaning chamber under a pressure less than about 900 pounds per square inch (63.3 kg/cm2); (e) temperature control means connected to the cleaning chamber for controlling the temperature within the chamber up to about 50°C.; (f) reservoir means for providing the liquefiable gas to the inlet means; (g) means for changing the liquefiable gas to the liquid; and (h) outlet means in the chamber for removing the liquid from the cleaning chamber. The liquid may then be further treated to remove particulates and organic contaminants and either recycled to the cleaning chamber or vented to the atmosphere. The process is especially applicable for general degreasing and particulate removal processes, when high precision cleaning is not required.

대표청구항 ▼

Apparatus for removing undesired particulates and contaminants from a major surface of a chosen substrate comprising: (a) an enclosed cleaning chamber in a walled vessel for containing a liquid derived from a liquefiable gas and said substrate containing said undesired particulates and contaminants, said walled vessel adapted to withstand a maximum pressure of about 1,500 pounds per square inch (105.4 kg/cm2) at ambient temperature; (b) means for supporting said substrate in said cleaning chamber; (c) ultrasonic energy-producing transducer means attached to said walled vessel within said cleaning chamber; (d) inlet means attached to said walled vessel for introducing said liquefiable gas into said cleaning chamber under a pressure less than about 900 pounds per square inch (63.3 kg/cm2); (e) temperature control means connected to said cleaning chamber for controlling the temperature within said chamber up to about 50°C.; (f) reservoir means for providing said liquefiable gas to said inlet means; (g) means for changing said liquefiable gas to said liquid; and (h) outlet means in said cleaning chamber for removing said liquid from said cleaning chamber.

이 특허를 인용한 특허 (110)

Bohnert,George W.; Hand,Thomas E.; DeLaurentiis,Gary M., Apparatus and method for removing solvent from carbon dioxide in resin recycling system.
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Brainard, David E.; McClain, James B.; Cole, Michael E.; Worm, Steve L., Apparatus and methods for conserving vapor in a carbon dioxide dry cleaning system.
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Brainard, David E.; McClain, James B.; Cole, Michael E.; Worm, Steve L., Apparatus for conserving vapor in a carbon dioxide dry cleaning system.
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Carr Robert B., Dry cleaning process using rotating basket agitation.
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Stucker John F., Method for rejuvenating pressurized fluid solvent used in cleaning a fabric article.
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Kim Jae-Jeong,KRX, Method for removing etch residue material.
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Jureller Sharon Harriott (Haworth NJ) Kerschner Judith Lynne (Ridgewood NJ) Bae-Lee Myongsuk (Montville NJ) Del Pizzo Lisa (Bloomfield NJ) Harris Rosemarie (Yonkers NY) Resch Carol (Rutherford NJ) Wa, Method of dry cleaning fabrics using densified carbon dioxide.
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Worm, Steve Lee; McClain, James B., Methods of coating articles using a densified coating system.
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Zorich, Robert Sam; Roberts, David Allen; Voloshin, George Oleg, Multiple contents container assembly for ultrapure solvent purging.
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Zorich, Robert Sam; Roberts, David Allen; Voloshin, George Oleg, Multiple contents container assembly for ultrapure solvent purging.
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Zorich, Robert Sam; Roberts, David Allen; Voloshin, George Oleg, Multiple contents container assembly for ultrapure solvent purging.
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Voloshin George Oleg ; Zorich Robert Sam, Solvent purge mechanism.
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Chao Sidney C. ; Purer Edna M., Solvent resupply method for use with a carbon dioxide cleaning system.
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Stucker John F., System for rejuvenating pressurized fluid solvents used in cleaning substrates.
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Bohnert, George W.; Hand, Thomas E.; DeLaurentiis, Gary M., System for removing contaminants from plastic resin.
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Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
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Bawa Rajan S. ; Tasber Frank ; Hahn Dennis, Treatment of contact lenses with supercritical fluid.
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Bawa Rajan S. ; Tasber Frank ; Hahn Dennis, Treatment of contact lenses with supercritical fluid.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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연합인증

Low cost equipment for cleaning using liquefiable gases 원문보기

초록 ▼

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연구과제 타임라인

이 특허를 인용한 특허 (110)

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연합인증

Low cost equipment for cleaning using liquefiable gases 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

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이 특허를 인용한 특허 (110)

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