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Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing p 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03F-007/30
  • G03F-007/021
출원번호 US-0101636 (1993-08-04)
발명자 / 주소
  • Haley Neil F. (Wellington CO) Corbiere Steven L. (Windsor CO)
출원인 / 주소
  • Eastman Kodak Company (Rochester NY 02)
인용정보 피인용 횟수 : 124  인용 특허 : 0

초록

A radiation-sensitive composition especially adapted to prepare a lithographic printing plate that is sensitive to both ultraviolet and infrared radiation and capable of functioning in either a positive-working or negative-working manner is comprised of (1) a resole resin, (2) a novolac resin, (3) a

대표청구항

A method of forming a lithographic printing surface comprising the following steps carried out in the following order: (a) providing a lithographic printing plate comprising a support and an imaging layer containing an admixture of (1) a resole resin, (2) a novolac resin, (3) a latent Bronsted acid

이 특허를 인용한 특허 (124)

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