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Method for patterning a mold 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B44C-001/22
  • C23F-001/00
출원번호 US-0055579 (1993-05-03)
발명자 / 주소
  • Hartman Davis H. (Phoenix AZ) Lebby Michael S. (Apache Junction AZ)
출원인 / 주소
  • Motorola, Inc. (Schaumburg IL 02)
인용정보 피인용 횟수 : 62  인용 특허 : 0

초록 ▼

A mold substrate having a major surface is provided. A patterned masking layer is formed on the major surface of the mold substrate that exposes portions of the major surface of the mold substrate while other portions are covered by the patterned masking layer. The major surface of the mold substrat

대표청구항 ▼

A method for patterning a mold comprising the steps of: providing a mold substrate having a major surface; applying a radiation sensitive film onto the major surface of the mold substrate; exposing the radiation sensitive film on the mold substrate to a pattern of light having areas of illumination

이 특허를 인용한 특허 (62)

  1. Sreenivasan, Sidlgata V; Watts, Michael P. C.; Choi, Byung J.; Voisin, Ronald D., Alignment methods for imprint lithography.
    상세보기
  2. Watts,Michael P. C.; Voisin,Ronald D.; Sreenivasan,Sidlgata V., Compliant hard template for UV imprinting.
    상세보기
  3. Xu,Frank Y.; Miller,Michael N.; Watts,Michael P. C., Composition for an etching mask comprising a silicon-containing material.
    상세보기
  4. Sreenivasan,Sidlgata V; Choi,Byung J.; Voisin,Ronald D., Conforming template for patterning liquids disposed on substrates.
    상세보기
  5. Komatsu, Toshifumi; Peterson, Jeremy W.; Gybin, Alexander S., Digital mold texturizing methods, materials, and substrates.
    상세보기
  6. Komatsu, Toshifumi; Peterson, Jeremy W.; Gybin, Alexander S., Digital mold texturizing methods, materials, and substrates.
    상세보기
  7. Nakagawa, Hideo; Sasago, Masaru; Murakami, Tomoyasu, Dry etching method, fine structure formation method, mold and mold fabrication method.
    상세보기
  8. Smith, Wayne A., Flexible coupling.
    상세보기
  9. Choi, Byung J.; Sreenivasan, Sidlgata V., Flexure based macro motion translation stage.
    상세보기
  10. Choi, Byung Jin; Meissl, Mario J.; Sreenivasan, Sidlagata V.; Watts, Michael P. C., Formation of discontinuous films during an imprint lithography process.
    상세보기
  11. Eldridge, Benjamin N.; Wenzel, Stuart W., Forming tool for forming a contoured microelectronic spring mold.
    상세보기
  12. Choi, Byung Jin; Sreenivasan, Sidlgata V.; Johnson, Stephen C., High precision orientation alignment and gap control stages for imprint lithography processes.
    상세보기
  13. Sreenivasan, Sidlgata V.; Choi, Byung J.; Colburn, Matthew; Bailey, Todd, High-resolution overlay alignment methods for imprint lithography.
    상세보기
  14. Voisin, Ronald D., Imprint alignment method, system and template.
    상세보기
  15. Voisin, Ronald D., Imprint alignment method, system, and template.
    상세보기
  16. Bailey,Todd C.; Choi,Byung Jin; Colburn,Matthew E.; Sreenivasan,Sidlgata V.; Willson,Carlton G.; Ekerdt,John G., Imprint lithography template having a feature size under 250 nm.
    상세보기
  17. Sreenivasan,Sidlgata V.; Schumaker,Philip D., Imprint lithography template having opaque alignment marks.
    상세보기
  18. Sreenivasan, Sidlgata V.; Choi, Byung-Jin, Imprinting of partial fields at the edge of the wafer.
    상세보기
  19. Chou,Stephen Y., Laser assisted direct imprint lithography.
    상세보기
  20. Chen, Ga-Lane, Laser system and method for patterning mold inserts.
    상세보기
  21. Hirsh Jeffrey I. ; Wen Xin, Mandrel for forming a nozzle plate having orifices of precise size and location and method of making the mandrel.
    상세보기
  22. J. Brett Rolfson, Mask, and method and apparatus for making it.
    상세보기
  23. Xu, Frank Y.; Watts, Michael P. C.; Stacey, Nicholas A., Materials for imprint lithography.
    상세보기
  24. Watts,Michael P. C.; Sreenivasan,Sidlgata V., Method for fabricating bulbous-shaped vias.
    상세보기
  25. Willson, Carlton Grant; Sreenivasan, Sidlgata V.; Bonnecaze, Roger T., Method for fabricating nanoscale patterns in light curable compositions using an electric field.
    상세보기
  26. Takahashi Ken M. (Warren NJ), Method for fabricating optical quality molds with precision microfeatures.
    상세보기
  27. Cho, Yong-Tae; Kim, Suk-Ki; Cho, Sang-Hoon, Method for fabricating semiconductor device with recess gate.
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  28. Lee, Hong Hie; Kim, Youn Sang; Kim, Tae Wan; Yoo, Pil Jin, Method for forming a mask pattern.
    상세보기
  29. Lee Chih-Kung,TWX ; Liao Hong-Zong,TWX ; Lu Shey-Shi,TWX ; Ho Nien-Show,TWX, Method for forming pattern on steel substrate by reactive ion etching.
    상세보기
  30. Donadio ; III James V., Method for making a tubular stent for use in medical applications.
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  31. Pawlowski, Edgar; Dzick, Juergen; Beier, Wolfram; Woelfing, Bernd, Method for manufacturing a master, master, method for manufacturing optical elements and optical element.
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  32. Donadio ; III James V., Method for manufacturing a tubular medical device.
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  33. Inoue Kenji,JPX ; Umetani Makoto,JPX ; Kataoka Hidenao,JPX ; Shimizu Yoshiyuki,JPX, Method for manufacturing an optical element.
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  34. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; Willson, Carlton Grant; Colburn, Mattherw E.; Bailey, Todd C.; Ekerdt, John G., Method of automatic fluid dispensing for imprint lithography processes.
    상세보기
  35. Sreenivasan,Sidlgata V., Method of forming a recessed structure employing a reverse tone process.
    상세보기
  36. Peter Lunn ; Nasser Rafiee ; Charles Daugherty, Method of making a medical catheter with grooved soft distal segment.
    상세보기
  37. Rubin, Daniel I., Method of reducing pattern distortions during imprint lithography processes.
    상세보기
  38. Sreenivasan, Sidlgata V.; Watts, Michael P. C., Method to arrange features on a substrate to replicate features having minimal dimensional variability.
    상세보기
  39. Choi,Byung Jin; Xu,Frank Y.; Stacey,Nicholas A.; Truskett,Van Xuan Hong; Watts,Michael P. C., Method to reduce adhesion between a conformable region and a pattern of a mold.
    상세보기
  40. Truskett,Van N.; Mackay,Christopher J.; Choi,B. Jin, Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer.
    상세보기
  41. Bullock David M., Methods and apparatus for etching a nitride layer in a variable-gap plasma processing chamber.
    상세보기
  42. Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Bailey, Todd; Ekerdt, John, Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography.
    상세보기
  43. Lessmollmann, Christoph; Eicher, Joachim; Reinecke, Holger, Microstructure elements and process for the production thereof.
    상세보기
  44. McMackin,Ian M.; Lad,Pankaj B., Moat system for an imprint lithography template.
    상세보기
  45. Hondo, Takaharu, Mold and manufacturing method therefor.
    상세보기
  46. Kosuga Hiroyuki,JPX ; Yokoo Yoshiatsu,JPX, Mold and method of producing the same.
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  47. Clark, Rodney L.; Rauseo, John P.; Borek, Gregg T., Mold apparatus and method.
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  48. Provost George A. ; Dowd Clinton ; Van Stumpf James ; Lacey Thomas G. ; Condon Mark Joseph ; Pollard Samuel White ; Jens Stephen C. ; Grulke Peter E., Molding methods, molds and products.
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  49. Lacey Thomas G. ; Provost George A. ; Filion Scott M. ; Kaparis Evangelos ; Dowd Clinton ; Van Stumpf James ; Condon Mark Joseph ; Pollard Samuel White ; Jens Stephen C. ; Grulke Peter E., Molding of fastening hooks and other devices.
    상세보기
  50. Lacey, Thomas G.; Provost, George A.; Dowd, Clinton; Stumpf, James Van; Condon, Mark Joseph; Pollard, Samuel White; Jens, Stephen C.; Grulke, Peter E., Molding of fastening hooks and other devices.
    상세보기
  51. Hofmann,James J., Molds configured to pattern masses associated with semiconductor constructions.
    상세보기
  52. Qian, Wei; Feng, Dazeng; Zheng, Dawei; Fong, Joan Yiqiong; Shao, Zhian; Chung, Lih-Jou; Yin, Xiaoming, Optical component having waveguides extending from a common region.
    상세보기
  53. Alan M. Dickey, Process for micro-texturing a mold.
    상세보기
  54. Wagner, Tina J.; Rausch, Werner A.; Deshpande, Sadanand V., Raised source drain mosfet with amorphous notched gate cap layer with notch sidewalls passivated and filled with dielectric plug.
    상세보기
  55. Schmid, Gerard M.; Stacey, Nicholas A; Resnick, Douglas J.; Voisin, Ronald D.; Myron, Lawrence J., Self-aligned process for fabricating imprint templates containing variously etched features.
    상세보기
  56. Hofmann,James J., Semiconductor processing methods.
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  57. Willson, Carlton Grant; Colburn, Matthew Earl, Step and flash imprint lithography.
    상세보기
  58. Sreenivasan,Sidlgata V.; Choi,Byung J.; Schumaker,Norman E.; Voisin,Ronald D.; Watts,Michael P. C.; Meissl,Mario J., Step and repeat imprint lithography processes.
    상세보기
  59. Choi,Byung J.; Sreenivasan,Sidlgata V., System for determining characteristics of substrates employing fluid geometries.
    상세보기
  60. Bailey, Todd; Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Ekerdt, John, Template for room temperature, low pressure micro-and nano-imprint lithography.
    상세보기
  61. Resnick, Douglas J.; Meissl, Mario Johannes; Choi, Byung-Jin; Sreenivasan, Sidlgata V., Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template.
    상세보기
  62. Selinidis, Kosta S.; Choi, Byung-Jin; Schmid, Gerard M.; Thompson, Ecron D.; McMackin, Ian Matthew, Template having alignment marks formed of contrast material.
    상세보기

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