[특허]Apparatus for supercritical cleaning

Apparatus for supercritical cleaning 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B08B-003/10
출원번호	US-0967219 (1992-10-27)
발명자 / 주소	Mielnik Richard J. (Erie PA) Metalonis John A. (Erie PA) Reber Richard K. (Erie PA) Rosio Larry R. (Erie PA) Shore Stephen H. (Erie PA) Smith Charles W. (Erie PA)
출원인 / 주소	Autoclave Engineers, Ltd. (Erie PA 02)
인용정보	피인용 횟수 : 63 인용 특허 : 0

초록 ▼

An apparatus for precision cleaning with carbon dioxide includes a pressure vessel having a removable cleaning drum with a sanitized work zone, a separator for regenerating spent carbon dioxide, and pressure and temperature monitoring and control devices to maintain the carbon dioxide in a supercritical state while it is circulated in contact with a part to be cleaned. The sanitized work zone is defined by an impermeable drum body having removable entry and exit filters to ensure that circulating cleaning fluid does not redeposit contaminants on the parts. The separator includes distillation means. The pressure vessel and separator form part of an overall system, including a storage vessel for carbon dioxide, a pump, a preheater, a let-down valve in communication with the pressure vessel outlet, a condenser and a bypass. The carbon dioxide is maintained in liquid form in the storage vessel, raised above its critical temperature by the preheater, pumped into the pressure vessel to achieve critical pressure, circulated through the work zone for a predetermined period of time, and removed through the let-down valve. The separator regenerates the carbon dioxide and carbon dioxide gas is then condensed and sent to the storage vessel for reuse.

대표청구항 ▼

A system for cleaning a workpiece with a supercritical cleaning fluid, comprising: a pressure vessel, an open ended cleaning drum positioned in the vessel and defining a work zone for receiving the workpiece, said pressure vessel enclosing an annular space around said drum, said pressure vessel having an inlet in communication with said annular space and an outlet in communication with said work zone; a let-down valve in communication with said outlet; a heater for controlling the temperature of said cleaning fluid; a separator in communication with said let-down valve, said separator having a body with an inlet and an outlet and a contaminant drain at a lower end of the separator; a condenser in communication with said separator outlet for condensing gaseous cleaning fluid to a liquid state; a storage vessel for maintaining the liquid cleaning fluid; a pump for conveying cleaning fluid from the storage vessel to the cleaning vessel; and control means for monitoring temperatures and pressures and operating said let-down valve, said heater and said pump to maintain predetermined pressures, temperatures and flow rates throughout said system; such that liquid cleaning fluid may be pumped from the storage vessel to the pressure vessel and caused by temperature and pressure to achieve a supercritical state, with the cleaning fluid circulated through the annular space into said work zone during a cleaning cycle, said cleaning fluid removed from the work zone after said cleaning cycle when said let-down valve is opened, said removed portion passed to the separator where it is regenerated, with the cleaning fluid thereafter passing through the separator outlet to the condenser and from there back to the liquid storage vessel, with separated contaminants collecting in the lower end of the separator for removal through said drain.

이 특허를 인용한 특허 (63)

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Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
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Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
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Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
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Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
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Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
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Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
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Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
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Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
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Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
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Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
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Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
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Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
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Arai Kunio,JPX ; Inomata Hiroshi,JPX ; Smith Richard Lee,JPX, Method for using high density compressed liquefied gases in cleaning applications.
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Biberger, Maximilian A.; Schilling, Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
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Biberger,Maximilian A.; Schilling,Paul E., Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module.
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Yates, Donald L., Method of reducing water spotting and oxide growth on a semiconductor structure.
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Yates,Donald L., Method of reducing water spotting and oxide growth on a semiconductor structure.
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Yates,Donald L., Method of reducing water spotting and oxide growth on a semiconductor structure.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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Apparatus for supercritical cleaning 원문보기

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Apparatus for supercritical cleaning 원문보기

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이 특허를 인용한 특허 (63)

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