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Formation of microstructures using a preformed photoresist sheet 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G03C-005/00
출원번호 US-0066988 (1993-05-24)
발명자 / 주소
  • Guckel Henry (Madison WI) Christenson Todd R. (Madison WI) Skrobis Kenneth (Madison WI)
출원인 / 주소
  • Wisconsin Alumni Research Foundation (Madison WI 02)
인용정보 피인용 횟수 : 106  인용 특허 : 0

초록

In the formation of microstructures, a preformed sheet of photoresist, such as polymethylmethacrylate (PMMA), which is strain free, may be milled down before or after adherence to a substrate to a desired thickness. The photoresist is patterned by exposure through a mask to radiation, such as X-rays

대표청구항

The method of claim 3 wherein the PMMA of the photoresist sheet is very high molecular weight linear PMMA.

이 특허를 인용한 특허 (106)

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