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Oxide particles and method for producing them 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C01F-017/00
출원번호 US-0095749 (1993-07-21)
발명자 / 주소
  • Wang Jiun-Fang (Piscataway NJ)
출원인 / 주소
  • Rodel, Inc. (Newark DE 02)
인용정보 피인용 횟수 : 57  인용 특허 : 0

초록 ▼

The invention is a process for preparing chemically active solid oxide particles useful for polishing, composed primarily of CeO2, or CeO2 together with other oxides, comprising: (a) forming an aqueous solution comprised of a water soluble trivalent cerium salt and an oxidizing agent and (b) aging s

대표청구항 ▼

A process for preparing chemically active solid CeO2 particles useful for polishing comprising: (a) forming an aqueous solution comprised of a water soluble trivalent cerium salt and an oxidizing agent and (b) aging said solution as a liquid phase for a time not less than 4 hours at which time said

이 특허를 인용한 특허 (57)

  1. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Ootuki, Yuuto; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  2. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Ootuki, Yuuto; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  3. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Ootuki, Yuuto; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  4. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Ootuki, Yuuto; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  5. Yoshida,Masato; Ashizawa,Toranosuke; Terazaki,Hiroki; Ootuki,Yuuto; Kurata,Yasushi; Matsuzawa,Jun; Tanno,Kiyohito, Abrasive, method of polishing target member and process for producing semiconductor device.
    상세보기
  6. Tjaden Kevin ; Urbina G. Hugo, Apparatus and method for semiconductor planarization.
    상세보기
  7. Burba, III, John L.; Hassler, Carl R.; O'Kelley, C. Brock; Lupo, Joseph A.; Pascoe, Joseph R., Apparatus for treating a flow of an aqueous solution containing arsenic.
    상세보기
  8. Paul J. Yancey, CMP polishing slurry dewatering and reconstitution.
    상세보기
  9. Paul J. Yancey, CMP polishing slurry dewatering and reconstitution.
    상세보기
  10. Yancey Paul J., CMP polishing slurry dewatering and reconstitution.
    상세보기
  11. Yoshida Masato,JPX ; Ashizawa Toranosuke,JPX ; Terazaki Hiroki,JPX ; Kurata Yasushi,JPX ; Matsuzawa Jun,JPX ; Tanno Kiyohito,JPX ; Ootuki Yuuto,JPX, Cerium oxide abrasive and method of polishing substrates.
    상세보기
  12. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito; Ootuki, Yuuto, Cerium oxide abrasive and method of polishing substrates.
    상세보기
  13. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito; Ootuki, Yuuto, Cerium oxide abrasive and method of polishing substrates.
    상세보기
  14. Yoshida, Masato; Ashizawa, Toranosuke; Terazaki, Hiroki; Kurata, Yasushi; Matsuzawa, Jun; Tanno, Kiyohito; Ootuki, Yuuto, Cerium oxide abrasive and method of polishing substrates.
    상세보기
  15. Jun Matsuzawa JP; Yasushi Kurata JP; Kiyohito Tanno JP; Yoshio Honma JP, Cerium oxide abrasive for polishing insulating films formed on substrate and methods for using the same.
    상세보기
  16. Bonneau Lionel,FRX ; Ferlin Patrick,FRX ; Zing Christophe,FRX, Cerium oxide with pores having a lamellar structure, preparation method therefor and use thereof in catalysis.
    상세보기
  17. DiFrancesco, Albert Gary; Hailstone, Richard K.; Reed, Kenneth J.; Prok, Gary R., Cerium-containing nanoparticles.
    상세보기
  18. Hampden Smith,Mark J.; Kodas,Toivo T.; Caruso,James; Skamser,Daniel J.; Powell,Quint H., Chemical-mechanical planarization slurries and powders and methods for using same.
    상세보기
  19. Hampden-Smith, Mark J.; Kodas, Toivo T.; Caruso, James; Skamser, Daniel J.; Powell, Quint H., Chemical-mechanical planarization slurries and powders and methods for using same.
    상세보기
  20. Hampden-Smith, Mark J.; Kodas, Toivo T.; Caruso, James; Skamser, Daniel J.; Powell, Quint H., Chemical-mechanical planarization slurries and powders and methods for using same.
    상세보기
  21. Burba, John, Composition and process for making the composition.
    상세보기
  22. Grover Gautam S. ; Mueller Brian L., Composition for oxide CMP.
    상세보기
  23. Grover, Gautam S.; Mueller, Brian L.; Wang, Shumin, Composition for oxide CMP.
    상세보기
  24. Witham, Richard Donald; McNew, Edward Bayer; Burba, III, John Leslie, Composition for removing arsenic from aqueous streams.
    상세보기
  25. Burba, III, John L., Composition for treating a fluid.
    상세보기
  26. Grover,Gautam S.; Mueller,Brian L.; Wang,Shumin, Compositions for oxide CMP.
    상세보기
  27. Ota, Isao; Nishimura, Tohru; Tanimoto, Kenji, Crystalline ceric oxide sol and process for producing the same.
    상세보기
  28. Rhoades, Robert L.; Yancey, Paul J., Dewatered CMP polishing compositions and methods for using same.
    상세보기
  29. Feng, Xiangdong; Her, Yie-Shein; Yang, Yi, Hydrothermal synthesis of cerium-titanium oxide for use in CMP.
    상세보기
  30. Sandford, David Wallace, Malic acid stabilized nanoceria particles.
    상세보기
  31. Yabe, Sinryo; Tofukuji, Kota; Momose, Shigeyoshi; Yoshida, Sakae; Tahira, Kazuyuki; Sato, Tsugio, Metal oxide doped cerium oxides, method for the preparation thereof, resin composition and cosmetic composition therewith.
    상세보기
  32. Tjaden Kevin ; Urbina G. Hugo, Method and system to increase delivery of slurry to the surface of large substrates during polishing operations.
    상세보기
  33. Blohowiak Kay Y. ; Newquist Charles W., Method for protecting a die.
    상세보기
  34. Feng, Xiangdong; Her, Yie-Shein, Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process.
    상세보기
  35. DiFrancesco, Albert Gary; Hailstone, Richard K.; Reed, Kenneth J.; Prok, Gary R., Method of making cerium oxide nanoparticles.
    상세보기
  36. Difrancesco, Albert Gary; Hailstone, Richard K.; Reed, Kenneth J.; Prok, Gary R., Method of making cerium oxide nanoparticles.
    상세보기
  37. Difrancesco, Albert Gary; Hailstone, Richard K.; Langner, Andreas; Reed, Kenneth J., Method of preparing cerium dioxide nanoparticles.
    상세보기
  38. Wang,Yuhu, Nanoporous ultrafine α-alumina powders and sol-gel process of preparing same.
    상세보기
  39. Brewer Richard ; Grebinski Thomas J. ; Currie James E. ; Jones Michael ; Mullee William ; Nguyen Ann, Planarization compositions and methods for removing interlayer dielectric films.
    상세보기
  40. Homma,Yoshio; Kusukawa,Kikuo; Moriyama,Shigeo; Nagasawa,Masayuki, Polishing agent and polishing method.
    상세보기
  41. Aihara Ryohei,JPX ; Endoh Kazuaki,JPX ; Tsugita Katsuyuki,JPX, Polishing agent for semiconductor and method for its production.
    상세보기
  42. Bunyan,Michael H.; Clement,Thomas A.; Hannafin,John J.; LaRosee,Marc E.; Young,Kent M., Polishing article for electro-chemical mechanical polishing.
    상세보기
  43. Carter, Phillip W.; Johns, Timothy, Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios.
    상세보기
  44. Carter,Phillip W.; Johns,Timothy P., Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios.
    상세보기
  45. Dysard, Jeffrey M.; Johns, Timothy P., Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios.
    상세보기
  46. Dysard, Jeffrey M.; Johns, Timothy P., Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios.
    상세보기
  47. Allman Derryl D. J. ; Crosby William J. ; Maiolo James A., Polishing composition for CMP operations.
    상세보기
  48. Nakamura,Kenro; Kubota,Takeo; Minamihaba,Gaku, Polishing method and polishing liquid.
    상세보기
  49. Paul J. Yancey ; Robert L. Rhoades, Polishing method using a reconstituted dry particulate polishing composition.
    상세보기
  50. Burba, III, John L.; Oriard, Tim L., Process and apparatus for treating a gas containing a contaminant.
    상세보기
  51. Reed, Kenneth; DiFrancesco, Albert Gary, Process for making cerium dioxide nanoparticles.
    상세보기
  52. Feng, Xiangdong; Her, Yie-Shein, Process for producing abrasive particles and abrasive particles produced by the process.
    상세보기
  53. Cable, Robert; Hassler, Carl; Burba, John, Rare earth removal of hydrated and hydroxyl species.
    상세보기
  54. Psaras, Dimitrios; Gao, Yuan; Haneline, Mason; Lupo, Joseph; Landi, Carol, Removal of arsenic from aqueous streams with cerium (IV) oxide compositions.
    상세보기
  55. Park, Tai-su; Park, Kyung-won; Kim, Sung-jin, Semiconductor device having a Y-shaped isolation layer and simplified method for manufacturing the Y-shaped isolation layer to prevent divot formation.
    상세보기
  56. Brezny Rasto ; Koranne Manoj M., Thermally stable support material and method for making the same.
    상세보기
  57. Witham, Richard Donald; McNew, Edward Bayer; Burba, III, John Leslie, Water purification device for arsenic removal.
    상세보기

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