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Surface pit and mound detection and discrimination system and method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-021/88
출원번호 US-0981745 (1992-11-25)
발명자 / 주소
  • Allen Nicholas C. (Bedford MA) Broude Sergey V. (Newton Centre MA) Chase Eric T. (Nashua NH) Miller Pascal (North Chelmsford MA) Ormsby Jay L. (Salem NH) Rostaing Bruno (Medford MA) Quackenbos Lloyd
출원인 / 주소
  • QC Optics, Inc. (Burlington MA 02)
인용정보 피인용 횟수 : 45  인용 특허 : 0

초록

A surface pit and mound detection and discrimination system including a device for scanning a beam of radiation over a surface, and a mechanism for detecting a local slope on the surface for differentiating between whether the beam of radiation is scanning a pit or a mound on the surface.

대표청구항 ▼

A surface defect pit and mound detection and discrimination system comprising: means for scanning a beam of radiation over a surface; means for separately sensing radiation scattered from the surface in the near-specular region and in the far specular region for differentiating between pits and moun

이 특허를 인용한 특허 (45)

  1. Jann Peter C. ; Li Wayne W. ; Iosilevsky Igor ; Womack Kenneth H. ; Cejna Vlastimil ; Burt ; Jr. George A., Apparatus and method for surface inspection by specular interferometric and diffuse light detection.
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  2. Berman Michael J., Automated endpoint detection system during chemical-mechanical polishing.
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  3. Berman Michael J., Automated inspection system for residual metal after chemical-mechanical polishing.
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  4. Fairley,Christopher R.; Fu,Tao Yi; Tsai,Bin Ming Benjamin; Young,Scott A., Confocal wafer depth scanning inspection method.
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  5. Fairley, Christopher R.; Fu, Tao-Yi; Tsai, Bin-Ming Benjamin; Young, Scott A., Confocal wafer inspection method and apparatus using fly lens arrangement.
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  6. Fairley,Christopher R.; Fu,Tao Yi; Tsai,Bin Ming Benjamin; Young,Scott A., Confocal wafer inspection method and apparatus using fly lens arrangement.
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  7. Fairley, Christopher R.; Fu, Tao-Yi; Tsai, Bin-Ming Benjanim; Young, Scott A., Confocal wafer inspection system and method.
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  8. Vaez-Iravani, Mehdi; Rzepiela, Jeffrey Alan; Treadwell, Carl; Zeng, Andrew; Fiordalice, Robert, Defect detection system.
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  9. Vaez-Iravani, Mehdi; Rzepiela, Jeffrey Alan; Treadwell, Carl; Zeng, Andrew; Fiordalice, Robert, Defect detection system.
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  10. Xu,James J.; Lee,Ken K., Defect review system with 2D scanning and a ring detector.
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  11. Tohyama,Keiichi; Noji,Nobuharu; Yoshikawa,Shoji, Information recording medium examining apparatus and method.
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  12. Vaez Iravani,Mehdi, Inspection system for integrated applications.
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  13. Pressesky Jason L., Method and apparatus for detecting surface discontinuities based on changes in an optical path length during beam scanni.
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  14. Eremin Yuri A.,RUX ; Stover John C. ; Scheer Craig A., Method and apparatus for distinguishing particles from subsurface defects on a substrate using polarized light.
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  15. Treves, David; O'Dell, Thomas A., Method and apparatus for inspecting substrates.
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  16. Treves, David; O'Dell, Thomas A.; Hsieh, Yung-Chieh, Method and apparatus for inspecting substrates.
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  17. Iwata Tetsuya,JPX ; Tsuchida Shigeru,JPX, Method and apparatus of surface inspection of a disk.
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  18. John C. Stover ; Yuri A. Eremin RU, Method for discriminating between holes in and particles on a film covering a substrate.
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  19. Bareket, Noah; Desplat, Christian G.; Glasser, Lance A., Method for inspecting a reticle.
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  20. Shortt, David; Biellak, Stephen; Belyaev, Alexander, Methods and systems for inspection of a wafer.
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  21. Sopori,Bhushan L.; Hambarian,Artak, Optic probe for semiconductor characterization.
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  22. Broude Sergey V. (Newton Centre MA) Allen Nicholas (Bedford MA) Boudour Abdu (West Newton MA) Chase Eric (Carlisle MA) Johnson Carl (Tewksbury MA) Miller Pascal (North Chelmsford MA) Ormsby Jay (Sale, Optical inspection system and method for detecting flaws on a diffractive surface.
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  23. Guetta, Avishay, Optical inspection system with dual detection heads.
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  24. Marxer Norbert,LIX ; Gross Kenneth P. ; Altendorfer Hubert ; Kren George, Process and assembly for non-destructive surface inspections.
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  25. Marxer, Norbert; Gross, Kenneth P.; Altendorfer, Hubert; Kren, George, Process and assembly for non-destructive surface inspections.
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  26. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
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  27. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
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  28. Mehdi Vaez-Iravani ; Stanley Stokowski ; Guoheng Zhao, Sample inspection system.
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  29. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
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  30. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
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  31. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
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  32. Vaez-Iravani Mehdi ; Stokowski Stanley ; Zhao Guoheng, Sample inspection system.
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  33. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
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  34. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
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  35. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
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  36. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
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  37. Xu,James J.; Lee,Ken K., Surface inspection system.
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  38. Keshavmurthy Shyam P., System and method for detecting defects in a surface of a workpiece.
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  39. Green, Paul M.; Robinson, Bob C.; O'Brien, Eric Christian; York, Elmer Tyree, System and method for detecting manufacturing marks on sputtered disks.
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  40. Biellak, Steve; Stokowski, Stanley E.; Vaez-Iravani, Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
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  41. Biellak,Steve; Stokowski,Stanley E.; Vaez Iravani,Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
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  42. Green Paul M. ; Leung Wai C., Thin film disk media using optimum surface orientation to written data tracks.
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  43. Fossey Michael E. ; Stover John C., Wafer inspection system for distinguishing pits and particles.
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  44. Fossey Michael E. ; Stover John C. ; Clementi Lee D., Wafer inspection system for distinguishing pits and particles.
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  45. Fossey, Michael E.; Stover, John C.; Clementi, Lee D., Wafer inspection system for distinguishing pits and particles.
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