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Belt grinder 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F16H-007/00
  • B24B-021/00
출원번호 US-0075650 (1993-06-11)
발명자 / 주소
  • Dozier Robert L. (P.O. Box 1941 Springdale AK 72765)
인용정보 피인용 횟수 : 38  인용 특허 : 0

초록

A belt grinder includes a base plate mounting a drive motor, belt drive wheel, and belt tensioning idler wheel. A tension arm movably mounted on the base plate is biased to an extended position under a predetermined adjustable bias force to regulate belt tension. Air cylinder and weighted pivot arm

대표청구항

A belt grinder, comprising: a base plate; a plurality of horizontally extending parallel grooves in said base plate including fasteners for securing one of a plurality of different attachments to said base plate in repeatable positions; a drive motor operably connected for driving a belt drive wheel

이 특허를 인용한 특허 (38)

  1. Birang Manoocher ; Rosenberg Lawrence M. ; Somekh Sasson ; White John M, Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet.
  2. Manoocher Birang ; Lawrence M. Rosenberg ; Sasson Somekh ; John M. White, Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet.
  3. Birang, Manoocher; Scales, Martin; Robinson, Karl M., Apparatus and methods for chemical mechanical polishing with an incrementally advanceable polishing sheet.
  4. Brookins,Tracy A.; Knepper,Daniel F.; Smoker,David A.; O'Neil,Daniel S.; Miller,Steven P., Apparatus for processing a prosthetic component.
  5. Jarkko Sjoblom FI, Arrangement in connection with belt drive device.
  6. Taylor,Travis R.; Mehring,Carsten, Assembly and method for generating a hydrodynamic air bearing.
  7. Zhao, Yinchu; Liu, Haibin; Wang, Jinjun; Li, Xu; He, Zuoxiang; Zhu, Xinqing, Belt transmission device and grinding apparatus.
  8. Zemenchik, Robert A., Blade sharpening system for agricultural implements.
  9. Birang, Manoocher; Rosenberg, Lawrence M; Sandra L. Rosenberg,; Somekh, Sasson R; White, John M, Chemical mechanical polishing apparatus with rotating belt.
  10. Birang,Manoocher; Rosenberg, legal representative,Sandra L.; Somekh,Sasson; White,John M; Rosenberg, deceased,Lawrence M., Chemical mechanical polishing apparatus with rotating belt.
  11. Birang,Manoocher; Rosenberg,Lawrence M.; Somekh,Sasson; White,John M., Chemical mechanical polishing apparatus with rotating belt.
  12. John M. White, Chemical mechanical polishing with a moving polishing sheet.
  13. White John M., Chemical mechanical polishing with a plurality of polishing sheets.
  14. Tietz James V., Chemical mechanical polishing with a polishing sheet and a support sheet.
  15. Tietz James V., Chemical mechanical polishing with a polishing sheet and a support sheet.
  16. Fischler Richard (168-01 12th Ave. ; Apt. 7A Whitestone NY 11357) McCusker James D. (176 Williamson Rd. Bergenfield NJ 07621), Drive system having multi-drive plate.
  17. Seo, Sung Keun; Jeong, Dae Jin; Lee, Seung Bae; Lee, Jin Soo, Finishing apparatus.
  18. Franklin, Timothy J.; Marohl, Dan A., Integrated platen assembly for a chemical mechanical planarization system.
  19. Franklin, Timothy J.; Marohl, Dan A., Integrated platen assembly for a chemical mechanical planarization system.
  20. Talieh Homayoun (Santa Clara County CA) Weldon David Edwin (Santa Cruz County CA), Linear polisher and method for semiconductor wafer planarization.
  21. Talieh Homayoun ; Weldon David Edwin, Linear polisher and method for semiconductor wafer planarization.
  22. Krusell, Wilbur; Travis, Glenn; Engdahl, Erik; Bagley, James, Linear reciprocating disposable belt polishing method and apparatus.
  23. Wilbur Krusell ; Glenn Travis ; Erik Engdahl ; James Bagley, Linear reciprocating disposable belt polishing method and apparatus.
  24. Pineau Jean Claude,FRX ; Bonachera Richard,FRX ; Jeanne Patrick,FRX, Machine for machining internal surfaces of axisymmetric workpieces using an abrasive strip.
  25. Pecen, Jiri; Chadda, Saket; Jairath, Rahul; Krusell, Wilbur C., Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing.
  26. Schroeder James D. ; Hendrix George E., Oscillating belt/spindle sander.
  27. White, John M.; Sommer, Phillip R.; Fisher, Stephen, Planarization system with multiple polishing pads.
  28. Li, Shijian; Birang, Manoocher; Emami, Ramin; Nagengast, Andrew; Brown, Douglas Orcutt; Wang, Shi-Ping; Scales, Martin; White, John, Platen for retaining polishing material.
  29. Phillip R. Sommer ; Paul B. Butterfield, Polishing media stabilizer.
  30. Sommer,Phillip R.; Butterfield,Paul, Polishing media stabilizer.
  31. Sommer,Phillip R.; Butterfield,Paul D., Polishing media stabilizer.
  32. Owczarz,Aleksander, Process tape for cleaning or processing the edge of a semiconductor wafer.
  33. Stegmeier Bill, Roller alignment system.
  34. Talieh Homayoun, Substrate polishing apparatus.
  35. Talieh Homayoun, Substrate polishing apparatus.
  36. Jayakumar Gurusamy ; Gee Sun Hoey, Using a purge gas in a chemical mechanical polishing apparatus with an incrementally advanceable polishing sheet.
  37. Weldon David E. (Los Gatos CA) Nagorski Boguslaw A. (San Jose CA) Talieh Homayoun (San Jose CA), Wafer polishing machine with fluid bearings and drive systems.
  38. White,John M.; Sommer,Phillip R.; Somekh,Sasson, Web lift system for chemical mechanical planarization.
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